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    • 1. 发明申请
    • Processing apparatus
    • 处理装置
    • US20050042881A1
    • 2005-02-24
    • US10843295
    • 2004-05-12
    • Shinya NishimotoMasakazu HigumaShinji MutoHisashi FujiwaraHiroyuki NakayamaYoshinori Shimanuki
    • Shinya NishimotoMasakazu HigumaShinji MutoHisashi FujiwaraHiroyuki NakayamaYoshinori Shimanuki
    • H01L21/00H01L21/683H01L21/68
    • H01L21/67248H01L21/6833
    • The time period during which a wafer is stabilized to a predetermined temperature by increasing a thermal conductivity of a junction layer for bonding an electrostatic chuck layer and a support together, and the deterioration of the junction layer that is caused by active species generated by plasma is suppressed. Between the electrostatic chuck layer formed by sintering together a chuck electrode made of tungsten and an insulating layer made of alumina and the support, made of aluminum, for supporting the electrostatic chuck layer, the junction layer is provided to bond the electrostatic chuck layer and the support together. The junction layer is formed by impregnating a porous ceramic with a silicone-based adhesive resin. Further, rubber or a heat shrink tube made of a fluoric resin such as PFA is provided as a soft coating member so as to coat a side circumferential surface of the junction layer and the side circumferential surfaces of the electrostatic chuck layer and the support come into a tight contact with the heat shrink tube or rubber.
    • 通过增加用于将静电卡盘层和支撑体接合在一起的接合层的热导率,并且由等离子体产生的活性物质引起的接合层的劣化,晶片稳定在预定温度的时间段是 被压制 在通过烧结在由钨制成的卡盘电极和由氧化铝制成的绝缘层上形成的静电卡盘层和由铝制成的用于支撑静电卡盘层的支撑件之间设置接合层以将静电卡盘层和 一起支持 接合层通过用硅氧烷基粘合剂树脂浸渍多孔陶瓷而形成。 此外,作为软涂层,设置橡胶或由诸如PFA的氟树脂制成的热收缩管,以覆盖接合层的侧周面,并且静电卡盘层和支撑体的侧周面进入 与热缩管或橡胶紧密接触。
    • 2. 发明授权
    • Plasma processing apparatus and structure therein
    • 等离子体处理装置及其结构
    • US08636873B2
    • 2014-01-28
    • US12046723
    • 2008-03-12
    • Masakazu HigumaShinji Muto
    • Masakazu HigumaShinji Muto
    • C23F1/00H01L21/306C23C16/00
    • C23C16/4581C23C16/5096
    • A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface.
    • 一种在目标基板上进行等离子体处理的等离子体处理装置的处理室中使用的结构,具有至少具有第一面和第二面的基材, 以及覆盖所述第一表面的热喷涂绝缘膜。 此外,该结构包括覆盖第二表面并由具有不同于基底构件的线性膨胀系数的材料制成的绝缘保护构件; 以及插入在所述热喷镀绝缘膜和所述绝缘保护构件之间以防止它们之间接触的绝缘层。 绝热保护部件和绝缘层的热喷镀绝缘膜构成覆盖第一面和第二面的绝缘面。
    • 3. 发明申请
    • PLASMA PROCESSING APPARATUS AND STRUCTURE THEREIN
    • 等离子体加工设备及其结构
    • US20080230181A1
    • 2008-09-25
    • US12046723
    • 2008-03-12
    • Masakazu HIGUMAShinji Muto
    • Masakazu HIGUMAShinji Muto
    • H01L21/3065C23C16/452
    • C23C16/4581C23C16/5096
    • A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and a buffing surface covered with an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface.
    • 一种在目标基板上进行等离子体处理的等离子体处理装置的处理室中使用的结构,具有至少具有第一面和第二面的基材, 以及覆盖所述第一表面的热喷涂绝缘膜。 此外,该结构包括覆盖第二表面并由具有不同于基底构件的线性膨胀系数的材料制成的绝缘保护构件; 以及抛光表面,覆盖有插入在所述热喷镀绝缘膜和所述绝缘保护构件之间的绝缘层,以防止其间的接触。 绝热保护部件和绝缘层的热喷镀绝缘膜构成覆盖第一面和第二面的绝缘面。
    • 4. 发明授权
    • Foam filling member
    • 泡沫填充件
    • US08225569B2
    • 2012-07-24
    • US12805998
    • 2010-08-27
    • Kazuhiko KinparaShinji MutoShinpei NishikawaTakehiro Ui
    • Kazuhiko KinparaShinji MutoShinpei NishikawaTakehiro Ui
    • B28B7/28B29C33/40
    • B62D29/002B29C44/18B60R13/0815Y10T403/604Y10T428/24215
    • A foam filling member that can hold a foam sheet in a looped shape stably, without increasing the number of components, to provide improved vibration suppression and sound insulation. The strip-like foam sheet is formed in a looped shape by bending round it, so that both end portions of the foam sheet are overlapped with each other in a thickness direction thereof to form an overlapped portion therein. Then, insertion shafts of a clip are inserted through the overlapped portion, so that the overlapped portion is held in sandwich relation between a base portion and a head portion to form a foam filling member. Then, a supporting portion of the fixing portion of the clip is inserted in a fixing hole of an inner panel and fixed to the inner panel. After the inner panel and an outer panel are welded, the foam filling member is foamed, cross-linked, and cured by heating in a drying line process at the baking finish, to thereby produce the foam, whereby the interior space of the pillar is filled up with the foam, leaving no space therein.
    • 一种泡沫填充构件,其可以稳定地将发泡片材保持在环形状态,而不增加部件的数量,以提供改进的振动抑制和隔音。 带状发泡片通过弯曲形成为环状,使得发泡片的两个端部在其厚度方向上彼此重叠以在其中形成重叠部分。 然后,夹子的插入轴穿过重叠部分,使得重叠部分在基部和头部之间保持夹层关系,以形成泡沫填充构件。 然后,夹子的固定部分的支撑部分插入到内板的固定孔中并固定到内板上。 在内面板和外板被焊接之后,泡沫填充构件通过在烘烤完成时的干燥线工艺中加热而发泡,交联和固化,从而产生泡沫,由此柱的内部空间是 充满泡沫,不留空间。
    • 6. 发明授权
    • Foam filling member
    • 泡沫填充件
    • US07527850B2
    • 2009-05-05
    • US11119747
    • 2005-05-03
    • Shinji MutoKazuhiko KinparaTakehiro Ui
    • Shinji MutoKazuhiko KinparaTakehiro Ui
    • B32B3/24
    • B62D29/002Y10T428/24273Y10T428/24314
    • A foam filling member having a foaming base material in sheet form which is simplified in structure so that it can be formed into a predetermined shape corresponding to a shape of a space of a structure with an improved working efficiency and can also be placed in a space of the structure with an improved working efficiency, without any need of the sticking to a wall surface of a partition wall defining the space of the structure. Incisions 4, 5, 6, 7, cut in partway along a thickness direction of the foaming base material 2 along a bending portion and cuts 9, 10 passing through in the thickness direction are formed in the foaming base material 2. By simply bending or folding the foaming base material 2 along the incisions 4, 5, 6, 7 and the cuts 9, 10, the foam filling member 1 can be formed in a three-dimensional shape corresponding to an interior space of a pillar and thus can be set in place in the interior space. By foaming the foaming base material 2 thus placed in the interior space, the foam can be filled up in the interior space, leaving no space therein.
    • 一种泡沫填充构件,其具有片状的发泡基材,其结构简化,使得其可以形成为对应于具有改善的工作效率的结构的空间形状的预定形状,并且也可以放置在空间 的结构,具有改进的工作效率,而不需要粘附到限定结构空间的隔壁的壁表面。 切口4,5,6,7沿着弯曲部沿着发泡基材2的厚度方向中途切割,并且在发泡基材2中形成有沿厚度方向穿过的切口9,10。通过简单的弯曲或 沿着切口4,5,6,7和切口9,10折叠发泡基材2,泡沫填充构件1可以形成为对应于柱的内部空间的三维形状,因此可以设定 在内部空间。 通过将由此放置在内部空间中的发泡基材2发泡,可以在内部空间中填充泡沫,在其中不留下空间。
    • 9. 发明授权
    • Foam filling member
    • 泡沫填充件
    • US07985459B2
    • 2011-07-26
    • US12382922
    • 2009-03-26
    • Shinji MutoKazuhiko KinparaTakehiro Ui
    • Shinji MutoKazuhiko KinparaTakehiro Ui
    • B32B3/24
    • B62D29/002Y10T428/24273Y10T428/24314
    • A foam filling member having a foaming base material in sheet form which is simplified in structure so that it can be formed into a predetermined shape corresponding to a shape of a space of a structure with an improved working efficiency and can also be placed in a space of the structure with an improved working efficiency, without any need of the sticking to a wall surface of a partition wall defining the space of the structure. Incisions 4, 5, 6, 7, cut in partway along a thickness direction of the foaming base material 2 along a bending portion and cuts 9, 10 passing through in the thickness direction are formed in the foaming base material 2. By simply bending or folding the foaming base material 2 along the incisions 4, 5, 6, 7 and the cuts 9, 10, the foam filling member 1 can be formed in a three-dimensional shape corresponding to an interior space of a pillar and thus can be set in place in the interior space. By foaming the foaming base material 2 thus placed in the interior space, the foam can be filled up in the interior space, leaving no space therein.
    • 一种泡沫填充构件,其具有片状的发泡基材,其结构简化,使得其可以形成为对应于具有改善的工作效率的结构的空间形状的预定形状,并且也可以放置在空间 的结构,具有改进的工作效率,而不需要粘附到限定结构空间的隔壁的壁表面。 切口4,5,6,7沿着弯曲部沿着发泡基材2的厚度方向中途切割,并且在发泡基材2中形成有沿厚度方向穿过的切口9,10。通过简单的弯曲或 沿着切口4,5,6,7和切口9,10折叠发泡基材2,泡沫填充构件1可以形成为对应于柱的内部空间的三维形状,因此可以设定 在内部空间。 通过将由此放置在内部空间中的发泡基材2发泡,可以在内部空间中填充泡沫,在其中不留下空间。