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1. 发明授权

US5459104A Process for production of semiconductor substrate 失效
标题翻译：半导体基板的制造方法
公开(公告)号：US5459104A
公开(公告)日：1995-10-17
申请号：US307620
申请日：1994-09-19
申请人： Shinsuke Sakai
发明人： Shinsuke Sakai
IPC分类号： H01L21/20 , H01L21/302
CPC分类号： H01L21/2007 , Y10S148/012 , Y10S148/135 , Y10S438/959
摘要： The invention relates to a process of production of a semiconductor substrate by binding etc. involving the direct polishing of an oxide film with step differences. A silicon oxide film (3) having step differences is formed on at least one surface of an active layer substrate (A). This silicon oxide film (3) is polished by a rigid platen using a polishing agent comprised primarily of cerium oxide. A support substrate (B) is laminated to the bonding face (3a) this obtained to obtain a wafer of a SOI structure. This enables elimination of the polycrystalline silicon layer on the silicon oxide film which had been formed only for bonding purposes.
摘要翻译： PCT No.PCT / JP94 / 00058 Sec。 371日期1994年9月19日 102（e）1994年9月19日PCT 1994年1月18日提交PCT本发明涉及通过结合等生产半导体衬底的方法，其涉及具有阶梯差的氧化膜的直接抛光。在有源层衬底（A）的至少一个表面上形成具有阶梯差的氧化硅膜（3）。使用主要由氧化铈组成的抛光剂，通过刚性压板抛光该氧化硅膜（3）。将支撑基板（B）层压到获得SOI结构的晶片的接合面（3a）上。由此，能够消除已形成的用于接合目的的氧化硅膜上的多晶硅层。

2. 发明授权

US4699118A Apparatus for dressing cutting edge 失效
标题翻译：切割边缘的设备
公开(公告)号：US4699118A
公开(公告)日：1987-10-13
申请号：US841094
申请日：1986-03-18
申请人： Shoji Tsuruta , Hideaki Minami , Yoshinori Ohhata , Shinsuke Sakai
发明人： Shoji Tsuruta , Hideaki Minami , Yoshinori Ohhata , Shinsuke Sakai
IPC分类号： B24B27/06 , B24B53/00 , B24B53/12
CPC分类号： B24B27/0616 , B24B53/00
摘要： A dressing apparatus comprises a head movably mounted on a tip portion of a body, the head having a tip having formed therein a cut-out which opens in the direction of the movement of the head and into which one of outer and inner peripheral cutting edges formed on a cut-off wheel in the form of a disc is adapted to be inserted, a tape traveling device mounted on the head and the body for causing a tape having a layer of abrasive grain on a side thereof to travel across the cut-out in the head, and an actuator disposed between the head and the body for moving the head. The dressing apparatus and a dressing method are arranged such that the one peripheral cutting edge is inserted into the cut-out in the head, and the one peripheral cutting edge and the side of the tape are brought into contact with each other while causing the tape to travel by the tape traveling device, to apply the dressing to the one peripheral cutting edge.
摘要翻译：一种修整装置，包括可移动地安装在主体的尖端部分上的头部，所述头部具有尖端，所述尖端形成有沿所述头部的运动方向开口的切口，并且所述切口沿所述头部的外周和内周切削刃形成在盘形式的切断轮上的插入件适于插入;安装在头部和主体上的带状行进装置，用于使具有一侧磨粒的带在其一侧上行进穿过切口，以及设置在头部和主体之间用于移动头部的致动器。敷料装置和修整方法被布置成使得一个外围切割刃插入到头部的切口中，并且使一个外围切割边缘和带的侧面彼此接触，同时使带通过带移动装置行进，将敷料施加到一个周边切割边缘。

3. 发明授权

US09181557B2 Uracil-requiring moorella bacteria and transforming-gene-introduced moorella bacteria 有权
标题翻译：需要尿嘧啶的细菌和转化基因导入的moorella细菌
公开(公告)号：US09181557B2
公开(公告)日：2015-11-10
申请号：US14123301
申请日：2012-06-01
申请人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
发明人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
IPC分类号： C12N1/21 , C12N15/74 , C12N9/88 , C12P7/06
CPC分类号： C12N15/74 , C12N9/88 , C12N2510/00 , C12N2510/02 , C12P7/065 , C12Y401/01023 , Y02E50/17
摘要： The present invention provides uracil-requiring Moorella bacteria obtained by destroying a gene coding for orotidine-5-phosphate decarboxylase; and transforming-gene-introduced Moorella bacteria obtained by introducing a gene coding for orotidine-5-phosphate decarboxylase and a transforming-gene to a chromosome of the uracil-requiring Moorella bacteria. The present invention was accomplished by uracil-requiring Moorella bacteria, comprising an MTA-D-pF strain that is obtained by destroying a gene coding for orotidine-5-phosphate decarboxylase on a chromosome of Moorella bacteria.
摘要翻译：本发明提供了通过破坏编码乳清苷-5-磷酸脱羧酶的基因而获得的尿嘧啶需要的毛细菌; 以及通过将编码乳清苷-5-磷酸脱羧酶的基因和转化基因引入到需要尿嘧啶的Moorella细菌的染色体而获得的转化基因导入的Moorella细菌。本发明通过需要尿嘧啶的Moorella细菌实现，其包含通过在Moorella细菌的染色体上破坏编码乳清苷-5-磷酸脱羧酶的基因获得的MTA-D-pF株。

4. 发明申请

US20140206065A1 Uracil-Requiring Moorella Bacteria and Transforming-Gene-Introduced Moorella Bacteria 有权
标题翻译：尿嘧啶需要Moorella细菌和转化基因引入的Moorella细菌
公开(公告)号：US20140206065A1
公开(公告)日：2014-07-24
申请号：US14123301
申请日：2012-06-01
申请人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
发明人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
IPC分类号： C12N15/74
CPC分类号： C12N15/74 , C12N9/88 , C12N2510/00 , C12N2510/02 , C12P7/065 , C12Y401/01023 , Y02E50/17
摘要： The present invention provides uracil-requiring Moorella bacteria obtained by destroying a gene coding for orotidine-5-phosphate decarboxylase; and transforming-gene-introduced Moorella bacteria obtained by introducing a gene coding for orotidine-5-phosphate decarboxylase and a transforming-gene to a chromosome of the uracil-requiring Moorella bacteria. The present invention was accomplished by uracil-requiring Moorella bacteria, comprising an MTA-D-pF strain that is obtained by destroying a gene coding for orotidine-5-phosphate decarboxylase on a chromosome of Moorella bacteria.
摘要翻译：本发明提供了通过破坏编码乳清苷-5-磷酸脱羧酶的基因而获得的尿嘧啶需要的毛细菌; 以及通过将编码乳清苷-5-磷酸脱羧酶的基因和转化基因引入到需要尿嘧啶的Moorella细菌的染色体而获得的转化基因导入的Moorella细菌。本发明通过需要尿嘧啶的Moorella细菌实现，其包含通过在Moorella细菌的染色体上破坏编码乳清苷-5-磷酸脱羧酶的基因获得的MTA-D-pF株。

5. 发明授权

US5337232A Morpheme analysis device 失效
标题翻译：语素分析装置
公开(公告)号：US5337232A
公开(公告)日：1994-08-09
申请号：US853601
申请日：1992-03-18
申请人： Shinsuke Sakai , Takao Miyabe
发明人： Shinsuke Sakai , Takao Miyabe
IPC分类号： G06F17/22 , G06F17/27 , G06F17/28 , G06F15/38
CPC分类号： G06F17/2755 , G06F17/2775
摘要： In breaking a syntagm, such as a phrase, a clause, a sentence, or sentences, into a succession of analyzed morphemes, use is made of at least one group of morphemes included in the syntagm which includes two or more morphemes in a customary order. These two or more morphemes of each group are stored in a dictionary together with a descriptor, such as TIME or ANGLE, descriptive of the group, and an identifier or number indicative of the customary order. Selected by a separating unit, candidate morphemes for the analyzed morphemes are stored, together with, if any, the descriptor and at least one of the identifier or a mark, in a memory as memorized morphemes. An output unit selects those memorized morphemes which are accompanied by a common descriptor descriptive of a single group and either the identifier or the mark indicative of the customary order of morphemes in the group, and outputs these as the analyzed morphemes.
摘要翻译：在将一个句子，一个句子，一个句子或句子中的一个语法分解成一系列分析的语素时，使用包括在语法中的至少一组语素，其包括习惯命令中的两个或多个语素。每个组的这两个或多个语素与描述符一起存储在字典中，诸如描述该组的描述符，例如TIME或ANGLE，以及指示常规订单的标识符或数字。由分离单元选择，用于所分析的语素的候选词素与存储器中的描述符和标识符或标记中的至少一个一起存储为存储的语素。输出单元选择伴随有描述单个组的公共描述符的记忆语素，以及表示该组中语素习惯顺序的标识符或标记，并将其输出为分析的语素。

6. 发明申请

US20140206084A1 Primer Set and Method for Homologous Recombination 审中-公开
标题翻译：引物组和同源重组方法
公开(公告)号：US20140206084A1
公开(公告)日：2014-07-24
申请号：US14123351
申请日：2012-06-01
申请人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
发明人： Yutaka Nakashimada , Akihisa Kita , Tohru Suzuki , Shinsuke Sakai , Kazue Takaoka
IPC分类号： C12N15/90 , C12N15/74
CPC分类号： C12N15/902 , C12N9/88 , C12N15/74 , C12P7/065 , C12Y401/01023 , Y02E50/17
摘要： The present invention provides a primer set used for transformation that imparts a uracil requiring property by deleting or destroying a gene coding for orotidine-5-phosphate decarboxylase in Moorella bacteria. The present invention is accomplished by a primer set that is used for creating a uracil requiring strain obtained by deleting or destroying a gene coding for orotidine-5-phosphate decarboxylase in Moorella bacteria by homologous recombination and is represented by SEQ ID No. 1 and 2 that amplify an upstream region adjacent to said gene coding for orotidine-5-phosphate decarboxylase.
摘要翻译：本发明提供了一种用于转化的引物组，其通过在Moorella细菌中缺失或破坏编码乳清苷-5-磷酸脱羧酶的基因而赋予尿嘧啶需要性质。本发明通过引物组来实现，该引物组用于通过同源重组来产生通过在Moorella细菌中缺失或破坏编码乳清细胞中的乳清苷-5-磷酸脱羧酶的基因获得的尿嘧啶，并且由SEQ ID No.1和2 其扩增与编码乳清苷-5-磷酸脱羧酶的所述基因相邻的上游区域。

7. 发明授权

US06199680B1 Method and apparatus for bunching PTPs and for transferring the bunched-PTPs 有权
标题翻译：用于聚束PTP和转移聚束PTP的方法和设备
公开(公告)号：US06199680B1
公开(公告)日：2001-03-13
申请号：US09318989
申请日：1999-05-26
申请人： Shinsuke Sakai , Toshio Omori
发明人： Shinsuke Sakai , Toshio Omori
IPC分类号： B65G4726
CPC分类号： B65B35/58 , B65G17/32 , B65G47/907 , B65G2201/02
摘要： A method and apparatus adapted to bunch together a predetermined number of inverted PTPs and uninverted PTPs into a bundle, and then transfer each PTP bundle to a bucket conveyor which moves intermittently in parallel with a conveying passage. A multitude of PTPs, a portion of which are inverted with respect to the conveying direction and the rest of which are not inverted, are conveyed along a first conveying passage while maintaining the blistered surfaces of the inverted and uninverted PTPs in parallel with each other. A selected portion of the PTPs being conveyed in the first conveying passage is pinched and separated from the same passage. The separated PTPs are bunched together while the spacing between the separated PTPs is narrowed in the conveying direction. The bunched PTPs are transferred onto a second conveying passage across the first conveying passage. The bunched PTPs are loaded into a bucket provided on a bucket conveyor which intermittently travels along the second conveying passage.
摘要翻译：一种适于将预定数量的反向PTP和未反相PTP聚束到束中的方法和装置，然后将每个PTP束传送到与输送通道平行移动的斗式输送机。多个PTP，其一部分相对于输送方向反转，其余部分不反转，沿着第一输送通道输送，同时保持反相和未反转的PTP的起泡表面彼此平行。在第一输送通道中输送的PTP的选定部分被夹紧并与同一通道分离。分离的PTP聚集在一起，而分离的PTP之间的间隔在输送方向上变窄。聚束的PTP被转移到穿过第一输送通道的第二输送通道上。聚束的PTP被装载到设置在沿着第二输送通道间歇地行进的斗式输送机上的桶中。

8. 发明授权

US5096854A Method for polishing a silicon wafer using a ceramic polishing surface having a maximum surface roughness less than 0.02 microns 失效
标题翻译：使用陶瓷抛光表面抛光硅波的方法具有小于0.02微米的最大表面粗糙度
公开(公告)号：US5096854A
公开(公告)日：1992-03-17
申请号：US367637
申请日：1989-06-19
申请人： Yuichi Saito , Shinsuke Sakai , Hisao Hayashi , Takeshi Matsushita
发明人： Yuichi Saito , Shinsuke Sakai , Hisao Hayashi , Takeshi Matsushita
IPC分类号： B24B37/04 , H01L21/306
CPC分类号： H01L21/3212 , B24B37/042 , H01L21/02024 , Y10S148/051 , Y10S977/831 , Y10S977/888
摘要： The present invention relates to a method for polishing a silicon wafer. The method comprises the steps of: (a) supplying a polishing fluid to a polishing surface, the polishing fluid including an alkaline fluid and polishing particles of high-purity silica dispersed in the alkaline fluid, the polishing surface being planar; (b) bringing a silicon wafer in contact with the polishing surface; and (c) moving at least one of the silicon wafer and the polishing surface relative to the other, thereby polishing the silicon wafer. The method is characterized by the following: the polishing surface is made of a ceramic material harder than the silicon wafer and more resistant to mechanochemical polishing than silicon, and the maximum roughness of the ceramic is less than 0.02 .mu.m.

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