会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明授权
    • Process for preparation of ceramic film
    • 陶瓷膜的制备工艺
    • US4654228A
    • 1987-03-31
    • US813102
    • 1985-12-24
    • Hiroshi Komiyama
    • Hiroshi Komiyama
    • C04B38/00B01D39/20B01J35/02C23C16/30C23C16/40C23C16/46B05D1/00
    • C23C16/405C23C16/303C23C16/46
    • A process for preparing a ceramic film wherein ultrafine particles of ceramics are produced in a vapor phase, a substrate is kept at a temperature lower than the temperature where the ultrafine particles are produced but high enough to allow the vapor phase reaction to proceed, forming a temperature gradient between the vapor phase and the substrate and thereby to deposit the ultrafine particles onto the substrate by utilizing a thermophoretic phenomenon, and the vapor phase reaction is allowed to continue on the ultrafine particles deposited on the substrate. After the formation of the film, the deposition of the ultrafine particles onto the substrate may be stopped while continuing the vapor reaction in the formed film to prepare a more dense film having reduced voids.
    • 一种制备陶瓷膜的方法,其中在气相中制备陶瓷的超细颗粒,将基材保持在低于制造超细颗粒的温度的温度,但高到足以允许气相反应进行,形成 气相和基底之间的温度梯度,从而通过利用热泳现象将超细颗粒沉积到基底上,允许气相反应在沉积在基底上的超微粒子上继续。 在形成膜之后,可以在继续形成的膜中的蒸汽反应的同时停止超微粒子沉积到基板上,以制备具有减小的空隙的更致密的膜。