专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08845808B2 Vapor deposition device, vapor deposition method, and method of manufacturing organic electroluminescent display device 有权
标题翻译：气相沉积装置，气相沉积法和制造有机电致发光显示装置的方法
公开(公告)号：US08845808B2
公开(公告)日：2014-09-30
申请号：US13997173
申请日：2011-12-19
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： C23C14/26 , C23C16/448 , H05B33/10 , C23C14/24 , H01L21/02 , H01L51/00 , H01L51/56
CPC分类号： C23C16/45578 , C23C14/24 , C23C14/243 , H01L21/02263 , H01L51/001 , H01L51/56 , H05B33/10
摘要： A vapor deposition device (50) in accordance with the present invention is a vapor deposition device for forming a film on a film formation substrate (60), the vapor deposition device including a vapor deposition source (80) that has an injection hole (81) from which vapor deposition particles are injected, a vapor deposition particle crucible (82) for supplying the vapor deposition particles to the vapor deposition source (80), and a rotation motor (86) for changing a distribution of the injection amount of the vapor deposition particles by rotating the vapor deposition source (80).
摘要翻译：根据本发明的蒸镀装置（50）是在成膜基板（60）上形成膜的蒸镀装置，其特征在于，所述蒸镀装置具有：蒸镀源（80），具有喷射孔），用于将气相沉积粒子供给到气相沉积源（80）的气相沉积粒子坩埚（82）和用于改变蒸汽喷射量分布的旋转马达（86）通过旋转气相沉积源（80）来沉积颗粒。

2. 发明申请

US20140014036A1 DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE 审中-公开
标题翻译：沉积颗粒发射装置，沉积颗粒排放方法和沉积装置
公开(公告)号：US20140014036A1
公开(公告)日：2014-01-16
申请号：US14007956
申请日：2012-03-23
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L21/02 , B65D85/00
摘要： A vapor deposition particle emitting device of the present invention includes: a nozzle section (110) having emission holes (111) from which gaseous vapor deposition particles are emitted out; a heating plate unit (100), provided in the nozzle section (110), which is made up of heating plates (101) each having a surface on which a vapor deposition material remains as a result of adherence of vapor deposition particles to the surface; and a heating device (160) for heating the vapor deposition material, which is thus remaining on the surface of each of the heating plates (101), so that a temperature of the vapor deposition material is not less than a temperature at which to become transformed into gaseous form.
摘要翻译：本发明的气相沉积粒子发射装置包括：喷嘴部分（110），其具有从其中排出气态气相沉积颗粒的发射孔（111）; 设置在所述喷嘴部分（110）中的加热板单元（100），所述加热板单元由加热板（101）组成，所述加热板具有由于气相沉积颗粒粘附到所述表面而具有气相沉积材料的表面的表面 ; 以及用于加热蒸镀材料的加热装置（160），其被保持在每个加热板（101）的表面上，使得蒸镀材料的温度不低于成为转化成气态。

3. 发明申请

US20130319331A1 VAPOR DEPOSITION PARTICLE PROJECTION DEVICE AND VAPOR DEPOSITION DEVICE 审中-公开
标题翻译：蒸气沉积颗粒投影装置和蒸气沉积装置
公开(公告)号：US20130319331A1
公开(公告)日：2013-12-05
申请号：US13985854
申请日：2012-03-08
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/56
CPC分类号： H01L51/56 , C23C14/243 , C23C14/26 , C23C14/542 , C23C14/562 , H01L51/0008
摘要： A vapor deposition particle injection device (501) of the present invention includes: vapor deposition particle generating sections (110) and (120) for generating vapor deposition particles in the form of vapor by heating vapor deposition materials (114) and (124); and a nozzle section (170) which (i) is connected to the vapor deposition particle generating sections (110) and (120) and (ii) has an injection hole (171) from which the vapor deposition particles generated by the vapor deposition particle generating sections (110) and (120) are injected outward. The vapor deposition particle generating section (120) has a smaller capacity for the vapor deposition material than the vapor deposition particle generating section (110).
摘要翻译：本发明的气相沉积粒子注入装置（501）包括：通过加热气相沉积材料（114）和（124）产生汽相形式的气相沉积颗粒的气相沉积颗粒产生部分（110）和（120）和（i）连接到气相沉积颗粒产生部分（110）和（120）的喷嘴部分（170）和（ii）具有喷射孔（171），由气相沉积颗粒产生的气相沉积颗粒产生部分（110）和（120）向外注入。气相沉积粒子产生部分（120）具有比气相沉积粒子产生部分（110）更小的气相沉积材料的能力。

4. 发明申请

US20130302572A1 SUBSTRATE TO WHICH FILM IS FORMED, METHOD FOR PRODUCTION, AND ORGANIC EL DISPLAY DEVICE 有权
标题翻译：形成膜的基材，生产方法和有机EL显示装置
公开(公告)号：US20130302572A1
公开(公告)日：2013-11-14
申请号：US13980571
申请日：2012-01-13
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H05B33/14
CPC分类号： H05B33/145 , C23C14/042 , C23C14/54 , H01L27/3211 , H01L27/3244 , H01L51/0002 , H01L51/56 , H01L2251/558 , Y10T428/24612
摘要： A film formation substrate (200) is arranged such that (i) a base end, in a y-axis direction, of a film-thickness-gradually-diminishing part (23sR) of a first film (23R) overlaps a first film formation region (24R), and (ii) a film-thickness-gradually-diminishing part (23sB) of a second film (23B) is disposed on an outside, in the y-axis direction, of a second film formation region (24B) and overlaps the film-thickness-gradually-diminishing part (23sR) of the first film (23R) so as to compensate for a gradually diminished thickness of the film-thickness-gradually-diminishing part (23sR).
摘要翻译：成膜基板（200）配置成：（i）第一膜（23R）的膜厚逐渐减小部（23sR）的y轴方向的基端与第一膜形成物区域（24R），和（ii）第二膜形成区域（24B）的y轴方向的外侧设置第二膜（23B）的膜厚逐渐减小部分（23sB）并且与第一膜（23R）的膜厚逐渐减小部分（23sR）重叠，以补偿膜厚逐渐减小部分（23sR）的逐渐减小的厚度。

5. 发明申请

US20130292501A1 METHOD OF RECOVERING FILM-FORMING MATERIAL 有权
标题翻译：回收成膜材料的方法
公开(公告)号：US20130292501A1
公开(公告)日：2013-11-07
申请号：US13996515
申请日：2011-12-16
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： B03C1/005
CPC分类号： B03C1/005 , B03C1/30 , B03C2201/20 , C23C14/12 , C23C14/564 , H01L51/0016
摘要： A layer (71), made from a material that is attracted by a magnet, is formed in at least part of a chamber component (70), which at least part makes in contact with a film forming material. A method for collecting a film forming material includes the steps of: (a) exfoliating an attachment (22) which has attached to a surface of the chamber component (70); and (b) collecting the attachment (22) by separating a fragment of the layer (71), which fragment has been exfoliated in the step (a), while causing the fragment to be attracted by a magnet (202a).
摘要翻译：在由至少部分与成膜材料接触的室部件（70）的至少一部分中形成由被磁体吸引的材料制成的层（71）。收集成膜材料的方法包括以下步骤：（a）剥离附着在室部件（70）的表面上的附件（22）; 和（b）通过在片段被磁体（202a）吸引的同时分离在步骤（a）中剥离的片段的片段（71）来收集附件（22）。

6. 发明申请

US20130273679A1 DEPOSITION METHOD, DEPOSITION FILM, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE 有权
标题翻译：沉积方法，沉积膜和用于生产有机电致发光显示器件的方法
公开(公告)号：US20130273679A1
公开(公告)日：2013-10-17
申请号：US13976011
申请日：2011-12-20
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/00
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/12 , H01L51/0008
摘要： A vapor deposition method of the present invention includes the steps of (i) preparing a mask unit including a shadow mask (81) and a vapor deposition source (85) fixed in position relative to each other, (ii) while moving at least one of the mask unit and the film formation substrate (200) relative to the other, depositing a vapor deposition flow, emitted from the vapor deposition source (85), onto a vapor deposition region (210), and (iii) adjusting the position of a second shutter (111) so that the second shutter (111) blocks a vapor deposition flow traveling toward the vapor deposition unnecessary region (210).
摘要翻译：本发明的气相沉积方法包括以下步骤：（i）制备掩模单元，其包括荫罩（81）和相对于彼此固定的位置的气相沉积源（85），（ii）在移动至少一个的掩模单元和成膜基板（200）相对于另一方形成，从蒸镀源（85）排出的气相沉积流沉积在蒸镀区域（210）上，（iii）第二挡板（111），使得所述第二挡板（111）阻挡向所述气相沉积不需要区域（210）行进的气相沉积流。

7. 发明授权

US09748526B2 Vapor deposition device, vapor deposition method, and method for producing organic el display device 有权
公开(公告)号：US09748526B2
公开(公告)日：2017-08-29
申请号：US14004896
申请日：2012-03-09
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： C23C14/24 , H01L51/56 , C23C14/04 , C23C14/12 , H05B33/10
CPC分类号： H01L51/56 , C23C14/042 , C23C14/12 , C23C14/243 , H05B33/10
摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

8. 发明授权

US09299946B2 Display substrate, organic electroluminescent display device, and manufacturing method for display substrate and organic electroluminescent display device 有权
标题翻译：显示基板，有机电致发光显示装置以及显示基板和有机电致发光显示装置的制造方法
公开(公告)号：US09299946B2
公开(公告)日：2016-03-29
申请号：US14008535
申请日：2012-03-27
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L33/14 , H01L51/50 , H05B33/14 , H01L51/56 , H01L27/32 , H01L51/52
CPC分类号： H01L51/504 , H01L27/3213 , H01L27/3218 , H01L27/3244 , H01L51/5265 , H01L51/56 , H05B33/145
摘要： TFT substrate (10) includes a plurality of pixel regions each including light emitting regions of at least three colors, which light emitting regions include light emitting layers (23R(1), 23G, 23R(2), and 23B), respectively, and two adjacent ones of the light emitting regions are a combination other than a combination of (i) a light emitting region included in a light emitting layer (23G) of a color having a highest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance and (ii) a light emitting region included in a light emitting layer (23B) of a color having a lowest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance.
摘要翻译： TFT基板（10）包括分别包括至少三种颜色的发光区域的多个像素区域，该发光区域分别包括发光层（23R（1），23G，23R（2）和23B），以及两个相邻的发光区域是除了（i）包含在发光层（23G）中的发光区域的组合之外的组合，在发光层的发光层的情况下具有最高电流效率的颜色所述至少三种颜色的发光区域发射具有相同亮度的光，以及（ii）包含在具有最低电流效率的颜色的发光层（23B）中的发光区域，在发光层的发光层至少三种颜色的发光区域发射具有相同亮度的光。

9. 发明授权

US09240572B2 Vapor deposition device, vapor deposition method, and organic EL display device 有权
标题翻译：气相沉积装置，气相沉积法和有机EL显示装置
公开(公告)号：US09240572B2
公开(公告)日：2016-01-19
申请号：US13984799
申请日：2012-03-02
申请人： Shinichi Kawato , Satoshi Inoue , Tohru Sonoda , Satoshi Hashimoto
发明人： Shinichi Kawato , Satoshi Inoue , Tohru Sonoda , Satoshi Hashimoto
IPC分类号： H01L51/56 , C23C14/04 , C23C14/12 , C23C14/56 , C23C16/455 , H01L51/00
CPC分类号： H01L51/56 , C23C14/044 , C23C14/12 , C23C14/562 , C23C16/45578 , H01L51/0011
摘要： A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.
摘要翻译：蒸镀装置包括：蒸镀源（60），具有排出气相沉积粒子（91）的多个气相沉积源开口（61），具有多个限制开口（82）的限制单元（80）气相沉积掩模（70），其中多个掩模开口（71）仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区（72）中。多个气相沉积区域沿着与基板（10）的法线方向正交的第二方向和基板的移动方向排列，其中气相沉积微粒不具有非气相沉积区域（73）夹在其间。沿着平行于第二方向的直线上的非蒸镀区域的位置，沿着基板的移动方向的不同位置，沿蒸镀粒子的法线方向底物。因此，可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。

10. 发明授权

US09076989B2 Method for forming deposition film, and method for producing display device 有权
标题翻译：沉积膜形成方法及显示装置的制造方法
公开(公告)号：US09076989B2
公开(公告)日：2015-07-07
申请号：US13976422
申请日：2011-12-20
申请人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
发明人： Tohru Sonoda , Shinichi Kawato , Satoshi Inoue , Satoshi Hashimoto
IPC分类号： H01L51/56 , H05B33/04 , H05B33/10 , H01L21/02 , H01L51/00 , C23C14/04 , C23C16/04 , H01L27/32
CPC分类号： H01L51/56 , C23C14/042 , C23C16/042 , H01L21/02104 , H01L27/3211 , H01L51/0011 , H01L2227/323 , H01L2251/566 , H05B33/04 , H05B33/10
摘要： A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.
摘要翻译：掩模膜（13）形成为在显示区域（R1）（发光区域）和密封区域中具有开口。随后，形成具有条纹图案的发光层（8R，8G，8B）。然后，剥离掩模膜（13），从而提供以高分辨率图案化的发光层（8R，8G，8B）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式