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    • 1. 发明授权
    • Heat treatment boat support
    • 热处理船支持
    • US5482558A
    • 1996-01-09
    • US430478
    • 1995-04-28
    • Shingo WatanabeMitsuo MizukamiHironobu Nishi
    • Shingo WatanabeMitsuo MizukamiHironobu Nishi
    • C30B25/12C30B31/14H01L21/205H01L21/22H01L21/31H01L21/324H01L21/673C23C16/00F27B1/10
    • C30B31/14H01L21/67303H01L21/67309
    • A heat treatment boat for mounting a number of disc-shaped objects to be treated at a vertical interval for heat treatment thereof in a vertical heat treatment furnace comprises arcuate or ring-shaped support members provided on support rods at a vertical interval for supporting the objects to be treated in surface contact with the undersides of peripheral parts of the objects to be treated. The heat treatment boat is disposed on a ring-shaped intermediate member of high radiant heat absorption disposed on a heat insulating cylinder. The heat treatment boat comprises support rods which are planted on an annular support member circumferentially in accordance with a contour of the objects to be treated and whose upper ends are secured to an annular fixation member. The heat treatment boat of such constitution can reduce occurrences of slips in the disc-shaped objects when heat treated.
    • 在垂直热处理炉中用于安装待处理的多个圆盘形物体进行热处理的热处理船包括以垂直间隔设置在支撑杆上的弓形或环形支撑构件,用于支撑物体 被处理与待处理物体的周边部分的下侧面接触。 热处理舟配置在隔热筒上设置的高辐射吸热性环状中间构件。 热处理舟包括根据待处理物体的轮廓周向地种植在环形支撑构件上的支撑杆,其上端固定在环形固定构件上。 这种结构的热处理舟可以在热处理时减少圆盘形物体中滑动的发生。
    • 2. 发明授权
    • Object-supporting boat
    • 对象支持船
    • US5820683A
    • 1998-10-13
    • US651887
    • 1996-05-22
    • Katsutoshi IshiiIsao HaginoMitsuo Mizukami
    • Katsutoshi IshiiIsao HaginoMitsuo Mizukami
    • C23C16/458H01L21/673C23C16/00
    • H01L21/67309C23C16/4583
    • A boat includes a boat body, a top plate mounted on one end and a bottom plate mounted on the other end of the boat body. The boat body has a prop section and the prop section has a plurality of support portions provided parallel to each other along its longitudinal direction and each having a substantially circular arc-like configuration. The support portion has an opening at a front side to allow the forward end of an arm to be entered into an inside of the support portion to transfer a wafer W. Another opening is provided in a back section of a prop section at an area corresponding to the opening to allow the forward end of the arm to extend through it. The support portion supports the wafer W with the wafer edge portion set on its rest surface. The support portion and its rest surface are so formed as to have a substantially circular arc-configuration. By doing so, the rest surface of the support portion supports the wafer edge portion over as greater a length as possible. The rest surface of the support portion has its flatness set to be not more than 0.1 mm. When the wafer W is placed on the rest surface, the rear surface of the wafer edge portion is set substantially in face contact with the rest surface of the support portion.
    • 船包括船体,安装在一端的顶板和安装在船体另一端的底板。 船体具有支柱部分,并且支柱部分具有沿着其纵向方向彼此平行设置的多个支撑部分,并且每个支撑部分具有大致圆弧状的构造。 支撑部分具有在前侧的开口,以允许臂的前端进入支撑部分的内部以传送晶片W.另一个开口设置在支撑部分的背部的对应的区域 到开口以允许臂的前端延伸穿过它。 支撑部分支撑晶片W,晶片边缘部分设置在其支撑表面上。 支撑部分及其支撑面形成为具有大致圆弧形状。 通过这样做,支撑部分的剩余表面支撑晶片边缘部分尽可能长的长度。 支撑部的其余表面的平坦度设定为不大于0.1mm。 当将晶片W放置在其余表面上时,晶片边缘部分的后表面基本上与支撑部分的其余表面接触。