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    • 5. 发明申请
    • SEMICONDUCTOR DEVICES HAVING THROUGH-ELECTRODES AND METHODS FOR FABRICATING THE SAME
    • 具有电极的半导体器件及其制造方法
    • US20150123284A1
    • 2015-05-07
    • US14470366
    • 2014-08-27
    • Chajea JOTaeje CHOHyunsoo CHUNG
    • Chajea JOTaeje CHOHyunsoo CHUNG
    • H01L23/538H01L25/065H01L21/768
    • H01L23/5384H01L21/76879H01L21/76898H01L23/481H01L25/0657H01L2224/16145H01L2224/16225H01L2924/15311
    • A semiconductor device having through-electrodes and methods for fabricating the same are provided. The semiconductor device may include a first semiconductor chip including a first active surface on which a first top pad is provided; a second semiconductor chip including a second active surface on which a second top pad is provided and a second inactive surface on which a second bottom pad is provided, the second semiconductor chip being stacked on the first semiconductor chip with the second active surface facing the first active surface; and a conductive interconnection configured to electrically connect the chips. The conductive interconnection includes a first through-electrode that penetrates the second semiconductor chip and electrically connects the second bottom pad to the second top pad; and a second through-electrode that passes through the second top pad without contacting the second top pad, and electrically connects the second bottom pad to the first top pad.
    • 提供了具有贯通电极的半导体器件及其制造方法。 半导体器件可以包括第一半导体芯片,其包括第一有源表面,第一有源表面上设置有第一顶部焊盘; 包括第二有源表面的第二半导体芯片,其上设置有第二顶焊盘,第二非活性表面设置有第二底焊盘,第二半导体芯片堆叠在第一半导体芯片上,第二有源表面面向第一 活性表面 以及被配置为电连接芯片的导电互连。 导电互连包括穿透第二半导体芯片并将第二底部焊盘电连接到第二顶部焊盘的第一贯通电极; 以及第二贯通电极,其穿过所述第二顶部焊盘而不接触所述第二顶部焊盘,并且将所述第二底部焊盘电连接到所述第一顶部焊盘。