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    • 4. 发明授权
    • Vapor deposition method and apparatus
    • 气相沉积方法和装置
    • US08313806B2
    • 2012-11-20
    • US12216060
    • 2008-06-27
    • Hiroyasu Matsuura
    • Hiroyasu Matsuura
    • C23C16/00B05D5/00B05D1/32
    • C23C14/042C23C14/541C23C14/56H01L51/001H01L51/56
    • Provided is a method for moving, in a vacuum chamber carrying therein a fixedly-provided evaporation source, a substrate toward the evaporation source together with a mask closely attached to the substrate surface, and onto the surface substrate, evaporating a material vaporized in the evaporation source through an aperture formed to the mask. In this method of the invention, means for moving the substrate toward the evaporation source is provided with cooling means not to come in contact with but to be in proximity to a surface of the mask on the evaporation source side, and a cooling plate formed with an aperture proximal to the evaporation source is disposed. With such a configuration, the steam of the material coming from the evaporation source is directed to the mask and the substrate through the aperture of the cooling plate. As such, the material film evaporated on the substrate surface shows a satisfactory distribution of film thickness, and any possible misalignment from desired positions of evaporation can be accordingly suppressed.
    • 提供了一种在真空室中携带固定设置的蒸发源的方法,将基板与紧贴在基板表面上的掩模一起朝向蒸发源移动,并且在表面基板上蒸发蒸发的材料 源通过形成到掩模的孔。 在本发明的这种方法中,用于将基板朝向蒸发源移动的装置设置有冷却装置,其不与蒸发源侧的掩模的表面接触而接近,并且形成有冷却板 设置靠近蒸发源的孔。 通过这样的结构,来自蒸发源的材料的蒸汽通过冷却板的孔被引向掩模和基板。 因此,在基板表面上蒸发的材料膜显示出令人满意的膜厚度分布,并且可以相应地抑制与期望的蒸发位置的任何可能的未对准。
    • 8. 发明申请
    • MASKLESS EXPOSURE METHOD
    • MASKLESS曝光方法
    • US20090262319A1
    • 2009-10-22
    • US12390687
    • 2009-02-23
    • Hiroyasu MatsuuraSeiji IshikawaTadamichi WachiToshimasa Ishigaki
    • Hiroyasu MatsuuraSeiji IshikawaTadamichi WachiToshimasa Ishigaki
    • G03B27/42
    • G03F7/70791G03F7/70433
    • A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing.
    • 绘制电路图案的无掩模曝光方法包括:相对于投影光学系统移动基板; 通过投影光学系统沿第一方向扫描基板; 沿第二方向移动扫描区域; 在第一方向扫描基板,从而形成重叠部分。 与电路图案不同的多个标记在重叠部分附近露出。 多个标记是至少包括设置在重叠部分的一侧上的两个标记和设置在重叠部分的另一侧上的两个标记的一组标记。 通过测量多个标记之间的距离的偏差来分析一对扫描区域之间的偏差,曝光的倾斜度和舞台的偏航角度。 校准数据是从分析结果中获得的。
    • 9. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
    • 液晶显示装置及其制造方法
    • US20080074588A1
    • 2008-03-27
    • US11845806
    • 2007-08-28
    • Shinji SekiguchiKeiji TakanosuYasushi SanoKoji HaraHiroyasu Matsuura
    • Shinji SekiguchiKeiji TakanosuYasushi SanoKoji HaraHiroyasu Matsuura
    • G02F1/1335H01L21/02
    • G02F1/133555G02F1/13363G02F2001/133565G02F2001/133633G02F2413/09
    • The present invention relates to a method of manufacturing a transflective liquid crystal display device including a color filter substrate having a plurality of pixels, each including a reflective display part and a transmissive display part, and retardation plates each built in areas on a principal surface of the color filter substrate opposed to a liquid crystal layer, which correspond to the reflective display parts. The manufacturing method is characterized by including in the following order: a first step of applying a photosetting resin composition on the principal surface of the color filter; a second step of partially curing areas of a photosetting resin film, which correspond to the reflective display parts, respectively, by light exposure through a mask; a third step of removing uncured portions of the photosetting resin film remaining in the second step by development; a fourth step of selectively forming unevenness in areas of a principal surface of the cured photosetting resin film, which correspond to the reflective display parts; and a fifth step of applying a material of the retardation plate onto the photosetting resin film having the unevenness, to form the retardation plates in the respective areas corresponding to the reflective display parts, by anchoring energy of a part having the unevenness, for the material of the retardation plate.
    • 本发明涉及一种半透射型液晶显示装置的制造方法,其包括具有多个像素的滤色器基板,每个像素包括反射显示部分和透射显示部分,以及相位差板,其各自内置在 与液晶层相对的与反射显示部相对应的滤色器基板。 该制造方法的特征在于包括以下顺序:在滤色器的主表面上施加光固化树脂组合物的第一步骤; 通过通过掩模的曝光分别对应于反射显示部分部分地固化光固化树脂膜的区域的第二步骤; 第三步,通过显影除去残留在第二步中的光固化树脂膜的未固化部分; 在与所述反射显示部对应的所述固化的光固化型树脂薄膜的主面的区域中选择性地形成凹凸的第四工序; 以及将相位差板的材料施加到具有不平坦度的光固化树脂膜上的第五步骤,通过将具有不平坦部分的能量锚定在材料上以形成相应于反射显示部分的各个区域中的相位差板 的相位差板。