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1. 发明申请

US20080037683A1 APPARATUS FOR TRANSMITTING AND OUTPUTTING CONTENT, A METHOD FOR TRANSMITTING AND OUTPUTTING CONTENT AND A DATA STRUCTURE FOR TRANSMITTING CONTENT 审中-公开
标题翻译：用于发送和输出内容的装置，用于发送和输出内容的方法以及用于发送内容的数据结构
公开(公告)号：US20080037683A1
公开(公告)日：2008-02-14
申请号：US11735375
申请日：2007-04-13
申请人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
发明人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
IPC分类号： H04L27/00
CPC分类号： H04H60/11 , H04H60/27 , H04N21/433 , H04N21/4331 , H04N21/4384 , H04N21/812
摘要： This invention relates to an apparatus and method for transmitting content, an apparatus and method for outputting content, and a data structure for transmitting content. According to an embodiment, the method for transmitting content includes generating content output information of the content; and transmitting the content and the content output information as transmission data, wherein the content output information defines an output condition of the content to be selectively outputted at a receiver's side when a content output event occurs at the receiver's side.
摘要翻译：本发明涉及用于发送内容的装置和方法，用于输出内容的装置和方法以及用于发送内容的数据结构。根据实施例，用于发送内容的方法包括：生成内容的内容输出信息; 并且将内容和内容输出信息作为发送数据发送，其中，当内容输出事件发生在接收方时，内容输出信息定义在接收方侧选择性地输出的内容的输出条件。

2. 发明授权

US08531607B2 Apparatus for transmitting broadcast signal, method thereof, method of producing broadcast signal and apparatus for receiving broadcast signal 有权
标题翻译：用于发送广播信号的装置，其方法，产生广播信号的方法以及用于接收广播信号的装置
公开(公告)号：US08531607B2
公开(公告)日：2013-09-10
申请号：US11735360
申请日：2007-04-13
申请人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
发明人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
IPC分类号： H04N9/74 , H04N15/00 , H04N13/00 , H04N5/38
CPC分类号： H04H60/27 , H04H40/18 , H04H60/25 , H04H60/47
摘要： An apparatus and method for transmitting a broadcast signal, an apparatus and method of reproducing a broadcast signal, and a broadcast signal data structure, are discussed. According to an embodiment, the method of transmitting the broadcast signal includes generating image modification control information for at least one image; and transmitting the image and the image modification control information as broadcast data.
摘要翻译：讨论了用于发送广播信号的装置和方法，再现广播信号的装置和方法以及广播信号数据结构。根据实施例，发送广播信号的方法包括生成至少一个图像的图像修改控制信息; 以及作为广播数据发送图像和图像修改控制信息。

3. 发明授权

US08035753B2 Apparatus and a method for transmitting and receiving a broadcast signal and a data structure thereof 有权
标题翻译：用于发送和接收广播信号的装置和方法及其数据结构
公开(公告)号：US08035753B2
公开(公告)日：2011-10-11
申请号：US11735352
申请日：2007-04-13
申请人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
发明人： Seong Cheol Han , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
IPC分类号： H04N5/38 , H04N13/00
CPC分类号： H04N7/08 , G09G3/003 , H04H60/13 , H04N5/602 , H04N7/025 , H04N13/167 , H04N13/178 , H04N13/194 , H04N13/359 , H04N21/23614 , H04N21/4348 , H04N21/44004 , H04N21/643 , H04N21/816
摘要： A method for transmitting a broadcast signal including generating display control information for a plurality of broadcast objects to be displayed on a receiving terminal, and transmitting the broadcasting signal including both the plurality of broadcast objects and the display control information to the receiving terminal. Further, the display control information includes instructions on how the receiving terminal is to display the plurality of images.
摘要翻译：一种用于发送广播信号的方法，包括产生要在接收终端上显示的多个广播对象的显示控制信息，以及将包括多个广播对象的广播信号和显示控制信息发送到接收终端。此外，显示控制信息包括关于接收终端如何显示多个图像的指令。

4. 发明申请

US20070247521A1 APPARATUS AND A METHOD FOR TRANSMITTING AND RECEIVING A BROADCAST SIGNAL AND A DATA STRUCTURE THEREOF 有权
标题翻译：装置和发送和接收广播信号的方法及其数据结构
公开(公告)号：US20070247521A1
公开(公告)日：2007-10-25
申请号：US11735352
申请日：2007-04-13
申请人： Seong Cheol HAN , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
发明人： Seong Cheol HAN , Seung Heon Yang , Jong Keun Youn , Byoung Ho Choi , Jae Do Kwak , Jin Tae Kim , Mun Ho Jung
IPC分类号： H04N13/00
CPC分类号： H04N7/08 , G09G3/003 , H04H60/13 , H04N5/602 , H04N7/025 , H04N13/167 , H04N13/178 , H04N13/194 , H04N13/359 , H04N21/23614 , H04N21/4348 , H04N21/44004 , H04N21/643 , H04N21/816
摘要： A method for transmitting a broadcast signal including generating display control information for a plurality of broadcast objects to be displayed on a receiving terminal, and transmitting the broadcasting signal including both the plurality of broadcast objects and the display control information to the receiving terminal. Further, the display control information includes instructions on how the receiving terminal is to display the plurality of images.
摘要翻译：一种用于发送广播信号的方法，包括产生要在接收终端上显示的多个广播对象的显示控制信息，以及将包括多个广播对象的广播信号和显示控制信息发送到接收终端。此外，显示控制信息包括关于接收终端如何显示多个图像的指令。

5. 发明申请

US20080121839A1 Slurry Composition for Chemical Mechanical Polishing and Precursor Composition Thereof 有权
标题翻译：化学机械抛光及其前体组合物的浆料组成
公开(公告)号：US20080121839A1
公开(公告)日：2008-05-29
申请号：US11615094
申请日：2006-12-22
申请人： Tae Won PARK , In Kyung Lee , Byoung Ho Choi
发明人： Tae Won PARK , In Kyung Lee , Byoung Ho Choi
IPC分类号： C09K13/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： Disclosed are a slurry composition for chemical mechanical polishing and a precursor composition thereof. The polishing slurry composition includes deionized water, abrasive particles, a pH-adjusting agent and a surfactant, wherein the surfactant includes two or more ionic moieties and two or more lipophilic groups. The polishing slurry composition can polish convex surfaces of a semiconductor having a step height at a higher rate than the polishing rate for concave surfaces acting as polishing stop layers of the semiconductor so that the polishing can be self-stopped, reduces the occurrence of surface defects after the polishing process, and has a high degree of polishing planarization and good dispersion stability.
摘要翻译：公开了一种用于化学机械抛光的浆料组合物及其前体组合物。抛光浆料组合物包括去离子水，磨料颗粒，pH调节剂和表面活性剂，其中表面活性剂包括两个或多个离子部分和两个或更多个亲脂基团。抛光浆料组合物可以对作为半导体的抛光停止层的凹面的抛光速率高的阶梯高度的半导体的凸面进行抛光，使得抛光可以自停，减少表面缺陷的发生在抛光过程之后，并且具有高度的抛光平坦化和良好的分散稳定性。

6. 发明授权

US09123660B2 Chemical mechanical polishing slurry compositions and polishing method using the same 有权
标题翻译：化学机械抛光浆料组合物和使用其的抛光方法
公开(公告)号：US09123660B2
公开(公告)日：2015-09-01
申请号：US13534647
申请日：2012-06-27
申请人： Tai Young Kim , Byoung Ho Choi , Chang Ki Hong , Hyung Soo Kim
发明人： Tai Young Kim , Byoung Ho Choi , Chang Ki Hong , Hyung Soo Kim
IPC分类号： C09G1/02 , C09K3/14 , H01L21/3105
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： Disclosed herein is a CMP slurry composition. The CMP slurry composition includes cerium oxide particles, an adsorbent for adsorbing the cerium oxide particles to a polishing pad, an adsorption adjusting agent for adjusting adsorption performance of the adsorbent, and a pH adjusting agent. The CMP slurry composition may improve polishing efficiency of a patterned oxide layer and lifespan of a diamond disc conditioner.
摘要翻译：本文公开了CMP浆料组合物。 CMP浆料组合物包括氧化铈颗粒，用于将氧化铈颗粒吸附到抛光垫的吸附剂，用于调节吸附剂的吸附性能的吸附调节剂和pH调节剂。 CMP浆料组合物可以改善图案化氧化物层的抛光效率和金刚石盘片调节剂的寿命。

7. 发明申请

US20090294749A1 Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same 有权
标题翻译：用于抛光相变存储器件的化学机械抛光浆料组合物及使用其的相变存储器件抛光方法
公开(公告)号：US20090294749A1
公开(公告)日：2009-12-03
申请号：US12540661
申请日：2009-08-13
申请人： Tae Young Lee , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
发明人： Tae Young Lee , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
IPC分类号： H01L21/306 , H01L21/10 , H01L21/06 , H01L47/00
CPC分类号： C09G1/04 , H01L45/06 , H01L45/143 , H01L45/144 , H01L45/148 , H01L45/1683
摘要： A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water and iron or an iron compound. The slurry composition can achieve high polishing rate on a phase-change memory device and improved polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), can minimize the occurrence of processing imperfections (e.g., dishing and erosion), and can lower the etch rate on a phase-change memory material to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition.
摘要翻译：提供了一种用于相变存储器件的化学机械抛光（CMP）的浆料组合物。浆料组合物包含去离子水和铁或铁化合物。浆料组合物可以在相变存储器件上实现高抛光速率并且改善相变记忆材料和抛光停止层（例如，氧化硅膜）之间的抛光选择性，可以最小化处理缺陷的发生（例如，凹陷和侵蚀），并且可以降低相变记忆材料上的蚀刻速率，以提供高质量的抛光表面。还提供了使用该浆料组合物来研磨相变存储器件的方法。

8. 发明申请

US20090001339A1 Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same 审中-公开
标题翻译：用于抛光相变存储器件的化学机械抛光浆料组合物及使用其的相变存储器件抛光方法
公开(公告)号：US20090001339A1
公开(公告)日：2009-01-01
申请号：US11967439
申请日：2007-12-31
申请人： Tae Young LEE , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
发明人： Tae Young LEE , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
IPC分类号： H01L45/00 , C09K13/00 , C09K13/06
CPC分类号： H01L45/144 , C09G1/04 , H01L45/06 , H01L45/143 , H01L45/148 , H01L45/1683
摘要： A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water, a nitrogenous compound, and optionally abrasive particles, an oxidizing agent, or a combination thereof. The slurry composition can polish a phase-change memory device at a high rate, can achieve high polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), and can minimize the occurrence of processing imperfections (e.g., dishing and erosion) to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition.
摘要翻译：提供了一种用于相变存储器件的化学机械抛光（CMP）的浆料组合物。浆料组合物包含去离子水，含氮化合物和任选的磨料颗粒，氧化剂或其组合。浆料组合物可以以高速率抛光相变存储器件，可以在相变记忆材料和抛光停止层（例如，氧化硅膜）之间实现高抛光选择性，并且可以最小化处理缺陷的发生（例如，凹陷和侵蚀）以提供高质量的抛光表面。还提供了使用该浆料组合物来研磨相变存储器件的方法。

9. 发明授权

US08586464B2 Chemical mechanical polishing slurry composition for polishing phase-change memory device and method for polishing phase-change memory device using the same 有权
标题翻译：用于抛光相变存储器件的化学机械抛光浆料组合物和使用其的相变存储器件的抛光方法
公开(公告)号：US08586464B2
公开(公告)日：2013-11-19
申请号：US12540661
申请日：2009-08-13
申请人： Tae Young Lee , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
发明人： Tae Young Lee , In Kyung Lee , Byoung Ho Choi , Yong Soon Park
IPC分类号： H01L21/4763 , H01L21/00
CPC分类号： C09G1/04 , H01L45/06 , H01L45/143 , H01L45/144 , H01L45/148 , H01L45/1683
摘要： A slurry composition for chemical mechanical polishing (CMP) of a phase-change memory device is provided. The slurry composition comprises deionized water and iron or an iron compound. The slurry composition can achieve high polishing rate on a phase-change memory device and improved polishing selectivity between a phase-change memory material and a polish stop layer (e.g., a silicon oxide film), can minimize the occurrence of processing imperfections (e.g., dishing and erosion), and can lower the etch rate on a phase-change memory material to provide a high-quality polished surface. Further provided is a method for polishing a phase-change memory device using the slurry composition.
摘要翻译：提供了一种用于相变存储器件的化学机械抛光（CMP）的浆料组合物。浆料组合物包含去离子水和铁或铁化合物。浆料组合物可以在相变存储器件上实现高抛光速率并且改善相变记忆材料和抛光停止层（例如，氧化硅膜）之间的抛光选择性，可以最小化处理缺陷的发生（例如，凹陷和侵蚀），并且可以降低相变记忆材料上的蚀刻速率，以提供高质量的抛光表面。还提供了使用该浆料组合物来研磨相变存储器件的方法。

10. 发明授权

US07695637B2 Slurry composition for chemical mechanical polishing and precursor composition thereof 有权
标题翻译：用于化学机械抛光的浆料组合物及其前体组合物
公开(公告)号：US07695637B2
公开(公告)日：2010-04-13
申请号：US11615094
申请日：2006-12-22
申请人： Tae Won Park , In Kyung Lee , Byoung Ho Choi
发明人： Tae Won Park , In Kyung Lee , Byoung Ho Choi
IPC分类号： H01L21/302
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： Disclosed are a slurry composition for chemical mechanical polishing and a precursor composition thereof. The polishing slurry composition includes deionized water, abrasive particles, a pH-adjusting agent and a surfactant, wherein the surfactant includes two or more ionic moieties and two or more lipophilic groups. The polishing slurry composition can polish convex surfaces of a semiconductor having a step height at a higher rate than the polishing rate for concave surfaces acting as polishing stop layers of the semiconductor so that the polishing can be self-stopped, reduces the occurrence of surface defects after the polishing process, and has a high degree of polishing planarization and good dispersion stability.
摘要翻译：公开了一种用于化学机械抛光的浆料组合物及其前体组合物。抛光浆料组合物包括去离子水，磨料颗粒，pH调节剂和表面活性剂，其中表面活性剂包括两个或多个离子部分和两个或更多个亲脂基团。抛光浆料组合物可以对作为半导体的抛光停止层的凹面的抛光速率高的阶梯高度的半导体的凸面进行抛光，使得抛光可以自停，减少表面缺陷的发生在抛光过程之后，并且具有高度的抛光平坦化和良好的分散稳定性。

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