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    • 3. 发明申请
    • Semiconductor Device and Method for Manufacturing the Same
    • 半导体装置及其制造方法
    • US20150179682A1
    • 2015-06-25
    • US14641838
    • 2015-03-09
    • Semiconductor Energy Laboratory Co., Ltd.
    • Kunio Hosoya
    • H01L27/12
    • H01L27/1255G02F1/1362G02F1/136227G02F1/1368G02F2201/50H01L27/124
    • It is an object to obtain a liquid crystal display device in which a contact defect is reduced, increase in contact resistance is suppressed, and an opening ratio is high. The present invention relates to a liquid crystal display device having a substrate; a thin film transistor provided over the substrate, which includes a gate wiring, a gate insulating film, an island-shaped semiconductor film, a source region, and a drain region; a source wiring which is provided over the substrate and is connected to the source region; a drain electrode which is provided over the substrate and is connected to the drain region; an auxiliary capacitor provided over the substrate; a pixel electrode connected to the drain electrode; and a protective film fanned so as to cover the thin film transistor and the source wiring, where the protective film has an opening, and the auxiliary capacitor is formed in the area where the opening is formed.
    • 本发明的目的是获得接触缺陷减小的液晶显示装置,接触电阻的增加被抑制,开口率高。 本发明涉及具有基板的液晶显示装置; 设置在基板上的薄膜晶体管,其包括栅极布线,栅极绝缘膜,岛状半导体膜,源极区域和漏极区域; 源极布线,其设置在所述基板上并且连接到所述源极区域; 漏极,其设置在所述衬底上并连接到所述漏极区; 设置在基板上的辅助电容器; 连接到所述漏电极的像素电极; 以及覆盖保护膜具有开口的薄膜晶体管和源极布线的保护膜,并且辅助电容器形成在形成开口的区域中。