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    • 3. 发明申请
    • Semiconductor device and manufacturing method thereof
    • 半导体装置及其制造方法
    • US20040232413A1
    • 2004-11-25
    • US10694803
    • 2003-10-29
    • Semiconductor Energy Laboratory Co., Ltd.
    • Shunpei YamazakiToru TakayamaJunya MaruyamaYumiko Ohno
    • H01L029/12H01L021/00
    • H01L27/1218H01L23/291H01L27/1214H01L27/1266H01L27/3244H01L29/66757H01L29/78603H01L51/0002H01L51/0021H01L51/0024H01L51/003H01L2221/68368H01L2924/0002Y10S438/928Y10S438/982H01L2924/00
    • (Object) It is an object of the present invention to provide a peeling method that causes no damage to a layer to be peeled and to allow not only a layer to be peeled with a small surface area but also a layer to be peeled with a large surface area to be peeled entirely. Further, it is also an object of the present invention to bond a layer to be peeled to various base materials to provide a lighter semiconductor device and a manufacturing method thereof. Particularly, it is an object to bond various elements typified by a TFT, (a thin film diode, a photoelectric conversion element comprising a PIN junction of silicon, or a silicon resistance element) to a flexible film to provide a lighter semiconductor device and a manufacturing method thereof (Solving Means) When a metal layer 11 is provided over a substrate, an oxide layer 12 is provided in contact with the metal layer 11, a layer to be peeled 13 is formed, and the metal layer 11 is irradiated with a laser beam to perform oxidization and form a metal oxide layer 16, a clear separation is possible with a physical means within the metal oxide layer 12 or at an interface between the metal oxide layer 16 and the oxide layer 12.
    • (对象)本发明的目的是提供一种不会对被剥离层造成损害的剥离方法,并且不仅允许以小的表面积剥离层,而且还可以使用剥离层 大的表面积要完全剥离。 此外,本发明的另一个目的是将要剥离的层粘合到各种基材上以提供更轻的半导体器件及其制造方法。 特别地,目的是将由TFT表示的各种元素(薄膜二极管,包含硅的PIN结的光电转换元件或硅电阻元件)粘合到柔性膜上以提供更轻的半导体器件和 制造方法(解决方法)当在基板上设置金属层11时,设置与金属层11接触的氧化物层12,形成被剥离层13,并且金属层11被照射 激光束进行氧化并形成金属氧化物层16,通过金属氧化物层12内的物理手段或金属氧化物层16与氧化物层12之间的界面,可以进行明确的分离。
    • 4. 发明申请
    • Peeling method
    • 剥皮方法
    • US20040087110A1
    • 2004-05-06
    • US10619074
    • 2003-07-15
    • Semiconductor Energy Laboratory Co., Ltd.
    • Toru TakayamaJunya MaruyamaYuugo GotoYumiko OhnoTakuya TsurumeHideaki Kuwabara
    • H01L021/46H01L021/30
    • H01L27/1266H01L21/76251H01L27/1214
    • A peeling method is provided which does not cause damage to a layer to be peeled, and the method enables not only peeling of the layer to be peeled having a small area but also peeling of the entire layer to be peeled having a large area at a high yield. Further, there are provided a semiconductor device, which is reduced in weight through adhesion of the layer to be peeled to various base materials, and a manufacturing method thereof. In particular, there are provided a semiconductor device, which is reduced in weight through adhesion of various elements, typically a TFT, to a flexible film, and a manufacturing method thereof. A metal layer or nitride layer is provided on a substrate; an oxide layer is provided contacting with the metal layer or nitride layer; then, a base insulating film and a layer to be peeled containing hydrogen are formed; and heat treatment for diffusing hydrogen is performed thereto at 410null C. or more. As a result, complete peeling can be attained in the oxide layer or at an interface thereof by using physical means.
    • 提供一种不会对被剥离层造成损害的剥离方法,并且该方法不仅能够剥离具有小面积的被剥离层,而且还可以剥离具有大面积的待剥离的整个层 高产。 此外,提供了一种半导体器件及其制造方法,该半导体器件通过将待剥离的层的粘合而减小重量。 特别地,提供了一种通过将各种元件(通常为TFT)粘附到柔性膜而减小重量的半导体器件及其制造方法。 金属层或氮化物层设置在基板上; 提供与金属层或氮化物层接触的氧化物层; 然后,形成基底绝缘膜和含有氢的被剥离层。 在410℃以上进行用于扩散氢的热处理。 结果,可以通过使用物理手段在氧化物层或其界面处获得完全的剥离。
    • 6. 发明申请
    • Separating method
    • 分离方法
    • US20040132265A1
    • 2004-07-08
    • US10740437
    • 2003-12-22
    • Semiconductor Energy Laboratory Co., Ltd.
    • Junya MaruyamaYumiko OhnoToru TakayamaYuugo GotoShunpei Yamazaki
    • H01L021/46H01L021/30
    • H01L27/1266H01L21/6835H01L27/1214H01L2221/68359H01L2221/68368H01L2924/3025
    • The present invention is a separation method for easy separation of an allover release layer with a large area. Further, the present invention is the separating method that is not subjected to restrictions in the use of substrates, such as a kind of substrate, during forming a release layer. A separation method comprising the steps of forming a metal film, a first oxide, and a semiconductor film containing hydrogen in this order; and bonding a support to a release layer containing the first oxide and the semiconductor film and separating the release layer bonded to the support from a substrate provided with the metal layer by a physical means. Through the separation method, heat treatment is carried out to diffuse hydrogen contained in the semiconductor film, a third oxide is formed by reducing a second oxide formed at a surface boundary between the metal film and the first oxide film, and a film containing the second oxide and the third oxide, a surface boundary between the film containing the second oxide and the third oxide, and the metal film, or a surface boundary between the film containing the second oxide and the third oxide, and the first oxide is split.
    • 本发明是用于容易地分离大面积的全层释放层的分离方法。 此外,本发明是在形成剥离层期间不受使用诸如基板的基板的限制的分离方法。 一种分离方法,包括依次形成含有氢的金属膜,第一氧化物和半导体膜的步骤; 以及将载体接合到包含第一氧化物和半导体膜的剥离层,并且通过物理手段从与设置有金属层的基板分离结合到载体的剥离层。 通过分离方法,进行热处理以扩散半导体膜中所含的氢,通过还原在金属膜和第一氧化物膜之间的表面边界处形成的第二氧化物和包含第二氧化物的膜形成第三氧化物 氧化物和第三氧化物,含有第二氧化物的膜和第三氧化物的膜与金属膜之间的表面边界或含有第二氧化物的膜和第三氧化物之间的表面边界以及第一氧化物被分裂。
    • 7. 发明申请
    • Method of transferring a laminate and method of manufacturig a semiconductor device
    • 转印层压体的方法和制造半导体器件的方法
    • US20030217805A1
    • 2003-11-27
    • US10438854
    • 2003-05-16
    • Semiconductor Energy Laboratory Co. , Ltd.
    • Toru TakayamaYuugo GotoJunya MaruyamaYumiko Ohno
    • B32B031/00
    • H01L21/76251H01L21/2007H01L2221/68368Y10T428/14
    • An object of the present invention is to provide a method of transferring an object to be peeled onto a transferring member in a short time without imparting damage to the object to be peeled within a laminate. Also, another object of the present invention is to provide a method of manufacturing a semiconductor device in which a semiconductor element manufactured on a substrate is transferred onto a transferring member, typically, a plastic substrate. The methods are characterized by including: forming a peeling layer and an object to be peeled on a substrate; bonding the object to be peeled and a support through a two-sided tape; peeling the object to be peeled from the peeling layer by using a physical method, and then bonding the object to be peeled onto a transferring member; and peeling the support and the two-sided tape from the object to be peeled.
    • 本发明的目的是提供一种在短时间内将被剥离物转印到转印部件上而不会对层压体内被剥离对象造成损伤的方法。 另外,本发明的另一个目的是提供一种半导体器件的制造方法,其中将制造在衬底上的半导体元件转移到通常为塑料衬底的转印构件上。 该方法的特征在于包括:在基板上形成剥离层和待剥离物体; 通过双面胶带粘合要剥离的物体和支撑体; 通过使用物理方法剥离剥离层的物体,然后将被剥离物接合到转印体上; 并将支撑体和双面胶带从要剥离的物体上剥离。