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1. 再颁专利

USRE49885E1 Polarization device, method of manufacturing the same, liquid crystal device, and electronic apparatus 有权
公开(公告)号：USRE49885E1
公开(公告)日：2024-03-26
申请号：US17494524
申请日：2021-10-05
申请人： Seiko Epson Corporation
发明人： Yoshitomo Kumai
IPC分类号： G02F1/1335 , G02B5/30 , G02B27/28 , G02F1/29
CPC分类号： G02F1/133528 , G02B5/3058 , G02B27/283 , G02F1/133548 , G02F1/292
摘要： The wire grid type polarization device includes a substrate, and a metal layer formed on one face of the substrate in a substantially stripe shape in a plan view, a first dielectric layer provided on two side faces opposite to each other among a plurality of side faces of the metal layer and in a top part of the metal layer, and a second dielectric layer provided on the first dielectric layer. A substrate side end portion of the second dielectric layer is located between the one surface of the substrate and the top part of the first metal layer. The wire grid type polarization device includes a substrate and a plurality of metal layers that includes a first metal layer having a first side face, a second side face opposed to the first side face, and a top part. First and second dielectric layers are provided in the first side face, the second side face, and the top part of the first metal layer. The first dielectric layer is provided between the first metal layer and the second dielectric layer. The optical absorption rate of the first dielectric layer is less than that of the second dielectric layer.

2. 发明申请

US20180239071A1 OPTICAL ELEMENT, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS 审中-公开
公开(公告)号：US20180239071A1
公开(公告)日：2018-08-23
申请号：US15955589
申请日：2018-04-17
申请人： Seiko Epson Corporation
发明人： Yoshitomo Kumai
IPC分类号： G02B5/30 , G02B1/10 , G02B5/00 , G02F1/1335 , H04N9/31 , B29C59/00 , B29D11/00 , B29L11/00
CPC分类号： G02B5/3058 , B29C59/007 , B29D11/00788 , B29K2995/0026 , B29L2011/00 , G02B1/10 , G02B5/003 , G02B5/3041 , G02F1/133536 , G02F2001/133548 , H04N9/3105 , H04N9/3167
摘要： An optical element includes a substrate, a plurality of reflection layers disposed on one side of the substrate, an absorbing layer disposed on a side of the reflection layers that is opposite to the substrate, and an oxide film that covers the absorbing layer and portions between any two adjacent reflection layers. The reflection layers are arranged in a striped manner in plan view. The oxide film is made of an oxide of a material contained in the absorbing layer.

3. 再颁专利

USRE45993E1 Polarization device, method of manufacturing the same, liquid crystal device, and electronic apparatus 有权
标题翻译：极化装置及其制造方法，液晶装置和电子设备
公开(公告)号：USRE45993E1
公开(公告)日：2016-05-03
申请号：US14075561
申请日：2013-11-08
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： G02F1/1333 , G02F1/1335 , G02B5/30 , G02F1/29
CPC分类号： G02F1/133528 , G02B5/3058 , G02B27/283 , G02F1/292 , G02F2001/133548
摘要： The wire grid type polarization device includes a substrate, and a metal layer formed on one face of the substrate in a substantially stripe shape in a plan view, a first dielectric layer provided on two side faces opposite to each other among a plurality of side faces of the metal layer and in a top part of the metal layer, and a second dielectric layer provided on the first dielectric layer. A substrate side end portion of the second dielectric layer is located between the one surface of the substrate and the top part of the first metal layer and a plurality of metal layers that includes a first metal layer having a first side face, a second side face opposed to the first side face, and a top part. First and second dielectric layers are provided in the first side face, the second side face, and the top part of the first metal layer. The first dielectric layer is provided between the first metal layer and the second dielectric layer. The optical absorption rate of the first dielectric layer is less than that of the second dielectric layer.
摘要翻译：线栅型偏振光装置包括：基板，在平面图形成有大致条状的基板的一个面上的金属层，设置在多个侧面的彼此相对的两个侧面的第一电介质层的金属层和金属层的顶部，以及设置在第一介电层上的第二介电层。第二电介质层的基板侧端部位于基板的一个表面和第一金属层的顶部之间，并且多个金属层包括具有第一侧面的第一金属层，第二侧面相对于第一侧面和顶部。第一和第二电介质层设置在第一金属层的第一侧面，第二侧面和顶部中。第一介电层设置在第一金属层和第二介质层之间。第一电介质层的光吸收率小于第二电介质层的光吸收率。

4. 发明授权

US11346990B2 Polarizing element, liquid crystal apparatus and electronic apparatus 有权
公开(公告)号：US11346990B2
公开(公告)日：2022-05-31
申请号：US16589413
申请日：2019-10-01
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： G02B5/30 , G02F1/1335 , G03B21/00 , G03B33/12
摘要： In a process of manufacturing a polarizing element, in a first film forming step, a metal film, a light absorption film, a hard mask, and a resist mask are sequentially formed, and then, in a patterning step, the metal film and the light absorption film are patterned to form a protruded portion provided with a light absorbing portion at a surface side of a metal portion. In a first etching step, dry etching is performed, with the light absorbing portion being an etching mask, to narrow a width of the metal portion. In a second film forming step, a silicon oxide film is formed to cover the protruded portion. In a second etching step, the dry etching is performed on the silicon oxide film, using the light absorbing portion as an etching mask, to leave the silicon oxide film at a side surface of the metal portion.

5. 发明授权

US10859744B2 Method of manufacturing wire grid polarization element 有权
公开(公告)号：US10859744B2
公开(公告)日：2020-12-08
申请号：US16229137
申请日：2018-12-21
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： G02F1/1335 , G02B5/30 , H01L21/311
摘要： In a manufacturing process of a wire grid polarization element, a metal film, a light absorption film, and an inorganic material film for hard mask are sequentially formed, and then a resist mask is formed using nanoimprinting. Next, the metal film is patterned into a plurality of wire-shaped metal layers by dry etching. The resist mask is remaining at the bottom portion of the concave portion interposed between the adjacent convex portions. Δt/P (%), which is obtained by dividing, by the pitch P (nm), the difference Δt (nm) between the maximum value and the minimum value of the thickness t (nm) of the residual film of the resist mask remaining at the bottom portion of the concave portion, is rendered to be 13.4% or less.

6. 发明授权

US09201170B2 Method for producing polarizing element 有权
标题翻译：偏振元件的制造方法
公开(公告)号：US09201170B2
公开(公告)日：2015-12-01
申请号：US13774588
申请日：2013-02-22
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： C03B23/037 , C03C17/00 , C03C17/34 , G02B1/10 , G02B5/30
CPC分类号： G02B1/08 , C03B23/037 , C03C17/34 , C03C17/3447 , G02B1/10 , G02B5/3025 , G02B5/3058
摘要： A method for producing a polarizing element includes: forming particulate materials containing a metal halide on a glass substrate; forming a protective film that covers the particulate materials in a plasma environment while reducing the metal halide constituting the particulate materials; and stretching the particulate materials by stretching the glass substrate and the protective film at a temperature at which the glass substrate is softened.
摘要翻译：一种偏振元件的制造方法包括：在玻璃基板上形成含有金属卤化物的微粒材料; 在还原构成颗粒材料的金属卤化物的同时形成在等离子体环境中覆盖颗粒材料的保护膜; 并且在玻璃基板软化的温度下拉伸玻璃基板和保护膜来拉伸微粒材料。

7. 发明授权

US10877363B2 Display device and reflective polarizing element 有权
公开(公告)号：US10877363B2
公开(公告)日：2020-12-29
申请号：US16716953
申请日：2019-12-17
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： G03B21/20 , F21V8/00 , G02B5/30 , G03B21/00
CPC分类号： G03B21/2073 , G02B5/3025 , G02B6/0008 , G03B21/006 , G03B21/204 , G02F2203/07
摘要： A display device includes a light source unit, light guide on which light from the light source unit is incident, liquid crystal panel modulating emitted light, and reflective polarizing element between the light guide and liquid crystal panel. The element includes a reflective metal portion extending in one direction and reflection enhancing portion on an end portion in the metal portion thickness direction. Light is incident on the element from an opposite side from the metal portion with respect to the reflection enhancing portion. The reflection enhancing portion includes a low refractive index film to overlap with the metal portion end portion and a high refractive index film on an opposite side of the low refractive index film from the metal portion. The high refractive index film thickness is set to an appropriate thickness corresponding to the metal portion thickness and width, and the low refractive index film thickness.

8. 发明授权

US10866349B2 Wire grid polarization element and electronic device 有权
公开(公告)号：US10866349B2
公开(公告)日：2020-12-15
申请号：US16229552
申请日：2018-12-21
申请人： SEIKO EPSON CORPORATION
发明人： Yoshitomo Kumai
IPC分类号： G02B5/30 , G02F1/1335
CPC分类号： G02B5/3058 , G02F1/133528 , G02F2001/133548
摘要： A wire grid polarization element includes a wire grid including a plurality of wire-shaped metal layers arranged in parallel on one surface of a substrate, and a light-absorbing layer including a germanium film containing at least one of oxygen and nitrogen is provided on a side opposite to the substrate with respect to the plurality of wire-shaped metal layers. Such a germanium film can be formed by mixing an oxygen gas or a nitrogen gas into an argon gas in film formation by reactive sputtering. In this case, a flow rate of the oxygen gas or the nitrogen gas is made appropriate and thus, a complex refraction index of the germanium film is set to an appropriate value, and a reflectance with respect to linearly polarized light vibrating in an extending direction of the wire-shaped metal layers is set to 3.0% or lower.

9. 发明授权

US09977168B2 Optical element, method for manufacturing the same, and electronic apparatus 有权
公开(公告)号：US09977168B2
公开(公告)日：2018-05-22
申请号：US15195385
申请日：2016-06-28
申请人： Seiko Epson Corporation
发明人： Yoshitomo Kumai
IPC分类号： G02B5/30 , G02B1/10 , B29C59/00 , G02B5/00 , H04N9/31 , G02F1/1335 , B29D11/00 , B29L11/00
CPC分类号： G02B5/3058 , B29C59/007 , B29D11/00788 , B29K2995/0026 , B29L2011/00 , G02B1/10 , G02B5/003 , G02B5/3041 , G02F1/133536 , G02F2001/133548 , H04N9/3105 , H04N9/3167
摘要： An optical element includes a substrate, a plurality of reflective reflection layers on the substrate, and an absorbing layer over the reflection layers. The reflection layers are arranged in a striped manner in plan view. The absorbing layer absorbs polarized light oscillating in the direction in which the reflection layers extend. The optical element also includes an oxide film on the substrate between the reflection layers and on the absorbing layer. The oxide film is formed by oxidizing the absorbing layer.

10. 发明申请

US20170045658A1 OPTICAL ELEMENT, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS 有权
标题翻译：光学元件，其制造方法和电子设备
公开(公告)号：US20170045658A1
公开(公告)日：2017-02-16
申请号：US15195385
申请日：2016-06-28
申请人： Seiko Epson Corporation
发明人： Yoshitomo Kumai
IPC分类号： G02B5/30 , G02B1/10 , B29C59/00 , G02F1/1335 , B29D11/00 , G02B5/00 , H04N9/31
CPC分类号： G02B5/3058 , B29C59/007 , B29D11/00788 , B29K2995/0026 , B29L2011/00 , G02B1/10 , G02B5/003 , G02B5/3041 , G02F1/133536 , G02F2001/133548 , H04N9/3105 , H04N9/3167
摘要： An optical element includes a substrate, a plurality of reflective reflection layers on the substrate, and an absorbing layer over the reflection layers. The reflection layers are arranged in a striped manner in plan view. The absorbing layer absorbs polarized light oscillating in the direction in which the reflection layers extend. The optical element also includes an oxide film on the substrate between the reflection layers and on the absorbing layer. The oxide film is formed by oxidizing the absorbing layer.
摘要翻译：光学元件包括衬底，在衬底上的多个反射层，以及反射层上的吸收层。反射层在平面图中以条纹方式布置。吸收层吸收在反射层延伸的方向上振荡的偏振光。光学元件还包括在反射层之间和吸收层上的衬底上的氧化物膜。通过氧化吸收层形成氧化膜。

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