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    • 2. 发明申请
    • INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCT
    • 信息处理设备,信息处理方法和计算机程序产品
    • US20120133677A1
    • 2012-05-31
    • US13295732
    • 2011-11-14
    • Seiji SUZUKIYasushi OKUMURAYusuke MIYAZAWA
    • Seiji SUZUKIYasushi OKUMURAYusuke MIYAZAWA
    • G09G5/00
    • G06F1/1694G06F3/04815G06F3/0485G06F3/0488G06F2200/1637G06T19/006
    • An information processing apparatus, method and computer program product cooperate to provide a device that changes the way content is displayed depending on an inclination angle of the device. The device includes an inclination acquisition device that acquires inclination information of a display housing that houses a display with a displayed image thereon. A first controller causes a first change to the displayed image according to the inclination information. A second controller causes a second change to the displayed image when a predetermined condition is met with respect to the inclination information. By including subcomponents that cooperate in this manner, the device allows a user to perceive a displayed image at various viewing angles and easily recognize whether certain displayed features are able to be actuated when the device is positioned in a certain inclination angle.
    • 信息处理装置,方法和计算机程序产品协同提供根据装置的倾斜角度改变内容显示方式的装置。 该装置包括倾斜获取装置,其获取容纳具有所显示图像的显示器的显示外壳的倾斜信息。 第一控制器根据倾斜信息对所显示的图像进行第一次改变。 当相对于倾斜信息满足预定条件时,第二控制器对所显示的图像进行第二改变。 通过包括以这种方式协作的子组件,设备允许用户以各种视角感知显示的图像,并且容易地识别当设备定位在一定倾斜角度时某些显示的特征是否能够被致动。
    • 5. 发明申请
    • ELECTRONIC COMPONENT AND DISPLAY DEVICE AND A METHOD OF MANUFACTURING THE SAME
    • 电子部件和显示装置及其制造方法
    • US20090227057A1
    • 2009-09-10
    • US12201391
    • 2008-08-29
    • Seiji SUZUKI
    • Seiji SUZUKI
    • H01L21/306G03F7/20
    • H01L27/1288H01L27/1214
    • An electronic component or display device of the present invention can be provided by using a following pattern formation method. On a substrate treated with a first etching with a first resist pattern as a first mask, a second resist pattern is transfer-printed on the first resist patterns so as to partially overlap with the first resist pattern and partially extended from the first resist pattern. And then a second etching is performed by using the first resist pattern and the second resist pattern as a second mask. The first resist pattern and the second resist pattern are used for forming wirings and/or terminals, and the extended portion of the second resist pattern is used to make the wirings to have a cross section of a stair-like edge shape.
    • 本发明的电子部件或显示装置可以通过使用以下图案形成方法来提供。 在用第一抗蚀剂图案作为第一掩模的第一蚀刻处理的基板上,将第二抗蚀剂图案转印印刷在第一抗蚀剂图案上,以便与第一抗蚀剂图案部分重叠并且部分地从第一抗蚀剂图案延伸。 然后通过使用第一抗蚀剂图案和第二抗蚀剂图案作为第二掩模来执行第二蚀刻。 第一抗蚀剂图案和第二抗蚀剂图案用于形成布线和/或端子,并且第二抗蚀剂图案的延伸部分用于使布线具有阶梯状边缘形状的横截面。