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    • 9. 发明授权
    • Control value output apparatus with an operation member for continuous
value change
    • 控制值输出装置,具有连续值变化的操作构件
    • US5227573A
    • 1993-07-13
    • US717463
    • 1991-06-19
    • Seiji Nakano
    • Seiji Nakano
    • G10H1/24G05B24/02G10H1/053G10H1/18G10H1/46
    • G10H1/46
    • A control value output apparatus for controlling a controllable value such as a tone volume value which can be continuously changed upon operation of an operation member of an operation unit for supplying a control value, comprises an output unit for holding a control value. A data source supplies a predetermined or preset control value to the output unit. The control value held in the output unit and the control value supplied from the operation unit are compared and when a coincidence output is generated, the output unit holds the control value from the operation unit in place of the presently held control value, and the output control value follows an operation position of the operation member.
    • 一种控制值输出装置,用于控制在用于提供控制值的操作单元的操作构件的操作时可以连续改变的音调音量值的可控制值,包括用于保持控制值的输出单元。 数据源向输出单元提供预定或预设的控制值。 比较保持在输出单元中的控制值和从操作单元提供的控制值,并且当产生一致输出时,输出单元保持来自操作单元的控制值代替当前保持的控制值,并且输出 控制值遵循操作构件的操作位置。
    • 10. 发明授权
    • Device and method for supporting a substrate
    • 用于支撑衬底的装置和方法
    • US08528889B2
    • 2013-09-10
    • US12748652
    • 2010-03-29
    • Seiji NakanoMichiaki MatsushitaNaruaki IidaSuguru EnokidaKatsuhiro Morikawa
    • Seiji NakanoMichiaki MatsushitaNaruaki IidaSuguru EnokidaKatsuhiro Morikawa
    • B23Q3/00B25B1/00
    • H01L21/67742H01L21/68707
    • A substrate support device including a support member having a lower-surface support section to support a lower surface of a substrate; and a position restriction section provided on the lower-surface support section, the position restriction section being formed to surround a periphery of the substrate supported on the lower-surface support section and restrict a position of the substrate. At least one of the lower-surface support section and the position restriction section includes a base material and a protective film formed to cover the base material and prevent at least one of wear and chemical erosion to which the base material will be subject. The substrate support device further includes, for example, a base that supports the support member, and a driving structure that moves the support member in a relative fashion with respect to the base, and is constructed as a substrate transport device.
    • 一种基板支撑装置,包括:支撑构件,具有用于支撑基板的下表面的下表面支撑部分; 以及设置在所述下表面支撑部上的位置限制部,所述位置限制部形成为围绕支撑在所述下表面支撑部上的所述基板的周围,并限制所述基板的位置。 下表面支撑部和位置限制部中的至少一个包括基材和保护膜,所述基材和保护膜形成为覆盖基材并防止基材将受到的磨损和化学侵蚀中的至少一种。 基板支撑装置还包括例如支撑支撑构件的基座和相对于基座相对移动支撑构件的驱动结构,并且被构造为基板输送装置。