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    • 9. 发明申请
    • NEAR-FIELD NOISE SUPPRESSION FILM
    • 近场噪声抑制膜
    • US20150173257A1
    • 2015-06-18
    • US14631522
    • 2015-02-25
    • Seiji KAGAWA
    • Seiji KAGAWA
    • H05K9/00
    • H05K9/0084C23C14/20C23C14/5806H01Q17/00Y10T428/31681
    • A noise suppression film having reduced unevenness of electromagnetic wave noise absorbability, which comprises a thin Ni film, which is vapor-deposited on one surface of a stretched plastic film of polyethylene terephthalate, and then subject to a heat-shrinkage-causable heat treatment at a temperature in a range of 110-170° C. for 10 minutes to 1 hour, (a) the light transmittance of the thin Ni film measured with laser rays having a wavelength of 660 nm being 3-50%, and (b) the surface resistance of the thin Ni film being 10-200 Ω/square when measured on its square test piece TP of 10 cm×10 cm under a load of 3.85 kg applied via a flat pressure plate, with a pair of electrodes each having a length completely covering a side of the test piece disposed on opposing side portions of the test piece.
    • 一种降低电磁波噪声吸收性的不均匀性的噪声抑制薄膜,其包括薄膜,其被蒸镀在聚对苯二甲酸乙二醇酯的拉伸塑料膜的一个表面上,然后进行热收缩可热处理 温度在110-170℃的范围内10分钟至1小时,(a)用波长为660nm的激光测得的薄Ni薄膜的透光率为3-50%,(b) 当在平坦压力板上施加的3.85kg的负荷下,在其10cm×10cm的平方测试片TP上测量时,薄Ni膜的表面电阻为10-200&OHgr / / square,一对电极各自具有 完全覆盖设置在测试片的相对侧部上的测试片的一侧的长度。