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1. 发明授权

US07189332B2 Apparatus and method for detecting an endpoint in a vapor phase etch 有权
标题翻译：用于检测气相蚀刻中的端点的装置和方法
公开(公告)号：US07189332B2
公开(公告)日：2007-03-13
申请号：US10269149
申请日：2002-10-11
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald , Hongqin Shi
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald , Hongqin Shi
IPC分类号： C23F3/12
CPC分类号： H01J37/32963 , B81C1/00476 , B81C1/00587 , B81C99/0065 , B81C2201/0132 , B81C2201/0138 , H01J37/32449 , H01J37/32935
摘要： Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber.
摘要翻译：通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。

2. 发明授权

US06949202B1 Apparatus and method for flow of process gas in an ultra-clean environment 有权
标题翻译：在超清洁环境中工艺气体流动的装置和方法
公开(公告)号：US06949202B1
公开(公告)日：2005-09-27
申请号：US09649569
申请日：2000-08-28
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Niles K. MacDonald
IPC分类号： B81B3/00 , C23F1/00 , C23F1/08 , C23F1/12
CPC分类号： C23F1/08 , B81C1/00587 , B81C99/0025 , B81C2201/0138 , B82Y30/00 , H01L21/67017
摘要： Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of the process gas. Recirculation is effected by a pump that has no sliding or abrading parts that contact the process gas, nor any wet (such as oil) seals or purge gas in the pump. Improved processing can be achieved by a process chamber that contains a baffle, a perforated plate, or both, appropriately situated in the chamber to deflect the incoming process gas and distribute it over the workpiece surface. In certain embodiments, a diluent gas is added to the recirculation loop and continuously circulated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop. Also, cooling of the process gas, etching chamber and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample of microscopic dimensions.
摘要翻译：通过使用工艺气体的再循环来增强在制造微结构时通过与工艺气体接触而从工件材料中添加或除去层或区域的工艺。循环由不具有接触工艺气体的滑动或研磨部件的泵以及泵中的任何湿的（例如油）密封件或吹扫气体来实现。改进的处理可以通过包含挡板，多孔板或两者的处理室来实现，该处理室适当地位于室中以偏转进入的工艺气体并将其分布在工件表面上。在某些实施方案中，将稀释气体加入再循环回路并在其中连续循环，随后将工艺气体（例如蚀刻剂气体）渗入再循环回路中。此外，工艺气体，蚀刻室和/或样品台的冷却可以帮助蚀刻工艺。该方法对于从微观尺寸的样品中添加或除去材料特别有用。

3. 发明授权

US06290864B1 Fluoride gas etching of silicon with improved selectivity 有权
标题翻译：氟化物气体蚀刻硅，提高了选择性
公开(公告)号：US06290864B1
公开(公告)日：2001-09-18
申请号：US09427841
申请日：1999-10-26
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald
IPC分类号： B81C500
CPC分类号： H01L21/32135 , B81C1/00595 , H01L21/3065 , H01L21/3081
摘要： The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by the addition of non-etchant gaseous additives to the etchant gas. An additional discovery is that non-etchant gaseous additives that have a molar averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity.
摘要翻译：通过使用作为惰性气体氟化物或卤素氟化物的蚀刻气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，通过添加非金属氧化物，相对于微观结构的其它部分，对硅部分具有更大的选择性提取气态添加剂到蚀刻剂气体。另外的发现是，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气体添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间内完成蚀刻，同时仍然实现同样的选择性提高。

4. 发明授权

US07041224B2 Method for vapor phase etching of silicon 有权
公开(公告)号：US07041224B2
公开(公告)日：2006-05-09
申请号：US10104109
申请日：2002-03-22
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi , Andrew G. Huibers , Peter Heureux
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi , Andrew G. Huibers , Peter Heureux
IPC分类号： B81C1/00
CPC分类号： B81C1/00 , B81B2201/045 , B81C1/00476 , B81C1/00531 , B81C1/00595 , B81C99/0025 , B81C2201/0138 , B82Y30/00 , H01L21/3065 , H01L21/3081 , H01L21/32135
摘要： The etching of a material in a vapor phase etchant is disclosed where a vapor phase etchant is provided to an etching chamber at a total gas pressure of 10 Torr or more, preferably 20 Torr or even 200 Torr or more. The vapor phase etchant can be gaseous acid etchant, a noble gas halide or an interhalogen. The sample/workpiece that is etched can be, for example, a semiconductor device or MEMS device, etc. The material that is etched/removed by the vapor phase etchant is preferably silicon and the vapor phase etchant is preferably provided along with one or more diluents. Another feature of the etching system includes the ability to accurately determine the end point of the etch step, such as by creating an impedance at the exit of the etching chamber (or downstream thereof) so that when the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. A first plasma or wet chemical etch (or both) can be performed prior to the vapor phase etch.

5. 发明授权

US06942811B2 Method for achieving improved selectivity in an etching process 有权
标题翻译：在蚀刻过程中实现改进的选择性的方法
公开(公告)号：US06942811B2
公开(公告)日：2005-09-13
申请号：US09954864
申请日：2001-09-17
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi
IPC分类号： B44C1/22 , B81B3/00 , C03C15/00 , C03C25/68 , C23F1/00 , C23F1/08 , C23F1/12
CPC分类号： B81B3/00 , B81B2201/045 , B81C1/00476 , B81C1/00531 , B81C1/00595 , B81C99/0025 , B81C2201/0138 , B82Y30/00 , H01L21/3065 , H01L21/3081 , H01L21/32135
摘要： The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. Also, the etch selectivity can be improved by doping the sacrificial material.
摘要翻译：通过使用作为惰性气体氟化物或卤素氟化物的蚀刻剂气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，相对于微结构的其它部分，通过减慢蚀刻速率对硅部分具有更大的选择性。蚀刻速率优选为30um / hr或更小，并且可以为3um / hr或甚至更小。通过向蚀刻剂气体中添加非蚀刻剂气体添加剂也提高了选择性。优选地，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气态添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间段内完成蚀刻，同时仍然实现相同的改进选择性。通过精确确定去除步骤的终点的能力也可以增强蚀刻工艺。气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。此外，通过掺杂牺牲材料可以改善蚀刻选择性。

6. 发明授权

US06684929B2 Panel system 失效
标题翻译：面板系统
公开(公告)号：US06684929B2
公开(公告)日：2004-02-03
申请号：US10077553
申请日：2002-02-15
申请人： Douglas B. MacDonald , Steven E. Sanders , Mark T. Slager , Dean K. Hubbard , Roy W. Fink , Steven J. Throndset , David J. Battey , Robert E. Jeffers , Allen C. Hager
发明人： Douglas B. MacDonald , Steven E. Sanders , Mark T. Slager , Dean K. Hubbard , Roy W. Fink , Steven J. Throndset , David J. Battey , Robert E. Jeffers , Allen C. Hager
IPC分类号： A47G500
CPC分类号： E04B2/7425 , E04B2002/7418 , E04B2002/7446 , E04B2002/7462 , E04B2002/7483 , E04B2002/7487 , E04B2002/7488 , E04B2002/749
摘要： An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures. The range of lateral positions provided by the apertures in the first one of the columns is less than the range of lateral positions provided by the apertures in the other row of the columns. The apertures located in a first one of the rows has vertical dimensions that are different than those located in the other of the rows. The range of vertical positions provided by the apertures in the first one of the rows is less than the range of vertical positions provided by the apertures in the other of the rows.
摘要翻译：办公室面板隔板包括具有至少两个立柱的面板框架和刚性地互连立柱的水平结构构件。面板框具有第一侧和第二相对侧，并且面板框在其第一侧上限定至少四个孔。隔板还包括具有限定隔板的外表面的主平面的盖构件。盖构件包括至少四个突起，其可移除地插入到至少四个孔中，以将盖构件可移除地固定到框架。所述孔布置在至少两个垂直间隔开的水平行和至少两个水平间隔开的垂直柱。第一列中的孔具有与位于另一列中的孔的水平尺寸不同的水平尺寸。当插入到相应的一个孔中时，每个突起具有一定范围的横向位置。由第一列中的孔提供的横向位置的范围小于由另一列中的孔提供的横向位置的范围。位于第一行中的孔具有与位于另一行中的位置不同的垂直尺寸。由第一行中的孔提供的垂直位置的范围小于由另一行中的孔提供的垂直位置的范围。

7. 发明授权

US07051482B2 Panel system 有权
公开(公告)号：US07051482B2
公开(公告)日：2006-05-30
申请号：US10770368
申请日：2004-02-02
申请人： Douglas B. MacDonald , Steven E. Sanders , Mark T. Slager , Dean K. Hubbard , Roy W. Fink , Steven J. Throndset , David J. Battey , Robert E. Jeffers , Allen C. Hager
发明人： Douglas B. MacDonald , Steven E. Sanders , Mark T. Slager , Dean K. Hubbard , Roy W. Fink , Steven J. Throndset , David J. Battey , Robert E. Jeffers , Allen C. Hager
IPC分类号： E04H1/00
CPC分类号： E04B2/7425 , E04B2002/7418 , E04B2002/7446 , E04B2002/7462 , E04B2002/7483 , E04B2002/7487 , E04B2002/7488 , E04B2002/749
摘要： An office panel partition includes a panel frame having at least two uprights and a horizontal structural member rigidly interconnecting the uprights. The panel frame has a first side and a second opposite side, and the panel frame defines at least four apertures on the first side thereof. The partition also includes a cover member having a major planar surface defining an exterior surface of the partition. The cover member includes at least four projections that are removably insertable into the at least four apertures to removably secure the cover member to the frame. The apertures are arranged in at least two vertically spaced horizontal rows and at least two horizontally spaced vertical columns. The apertures in a first one of the columns have different horizontal dimensions than those of the apertures located in the other of the columns. Each of the projections has a range of lateral positions when inserted into a respective one of the apertures. The range of lateral positions provided by the apertures in the first one of the columns is less than the range of lateral positions provided by the apertures in the other row of the columns. The apertures located in a first one of the rows has vertical dimensions that are different than those located in the other of the rows. The range of vertical positions provided by the apertures in the first one of the rows is less than the range of vertical positions provided by the apertures in the other of the rows.

8. 发明授权

US5893616A Knock-down hang-on storage unit for portable partition systems 失效
标题翻译：用于便携式分区系统的敲门挂式存储单元
公开(公告)号：US5893616A
公开(公告)日：1999-04-13
申请号：US856994
申请日：1997-05-15
申请人： Douglas B. MacDonald , James L. Stickland
发明人： Douglas B. MacDonald , James L. Stickland
IPC分类号： A47B17/00 , A47B47/02 , A47B57/58 , A47B96/02 , E05D15/58 , E06B3/50 , F16B12/38 , A47B47/00
CPC分类号： A47B96/028 , A47B47/02 , E05D15/582 , E06B3/5045 , F16B12/38 , E05Y2900/20 , E05Y2900/212 , Y10T403/587
摘要： A knock-down hang-on storage unit for portable partition systems includes first and second end members with shelf support flanges having inwardly protruding horizontal support legs and vertical support legs that define narrow vertical slots. Forward edges of the end members have rearwardly opening notches that capture the forward edge of a shelf that extends horizontally between the end members. The shelf includes first and second depending attachment flanges along opposite sides thereof that are inserted into the slots. The rear portion of the shelf is supported on the horizontal support legs adjacent upstanding tabs on the shelf support brackets to horizontally capture the shelf member between the end members and provide a fastenerless interconnection therebetween.
摘要翻译：用于便携式分隔系统的敲击式挂式存储单元包括第一和第二端部构件，其具有带有向内突出的水平支撑腿的搁板支撑凸缘和限定窄垂直狭槽的垂直支撑腿。端部构件的前边缘具有向后开口的凹口，其捕获在端部构件之间水平延伸的搁架的前边缘。搁板包括插入槽中的沿其相对侧的第一和第二垂直附接凸缘。搁架的后部支撑在水平支撑腿上，与搁架支撑支架上的直立突出部相邻，以在端部构件之间水平地捕获搁板构件，并在其间提供无紧固件互连。

9. 发明授权

US4245274A Readout and circuit board with test access 失效
标题翻译：读取和电路板与测试访问
公开(公告)号：US4245274A
公开(公告)日：1981-01-13
申请号：US3474
申请日：1979-01-15
申请人： Douglas B. MacDonald , Desi de Perczel
发明人： Douglas B. MacDonald , Desi de Perczel
IPC分类号： H05K7/14 , H05K7/18
CPC分类号： H05K7/14 , Y10S439/912
摘要： An electronic readout assembly in which the readout unit is captured in a frame which is secured in upright display position on a circuit board which in turn is slideably seated in a bracket adapted for utilization mounting, the readout being of the flat plate type having an array of contact prongs projecting from a bottom edge thereof, and the frame having a bottom opening through which the prongs engage with circuit connections on the circuit board. The frame also has open portions which expose the prongs to convenient access for test purposes in a region between the frame and circuit board.
摘要翻译：一种电子读出组件，其中读出单元被捕获在框架中，该框架固定在电路板上的直立显示位置，该电路板又可滑动地安置在适于安装的托架中，平板型读出器具有阵列从底部边缘突出的接触尖端，并且该框架具有底部开口，叉子通过该底部开口与电路板上的电路连接接合。该框架还具有敞开的部分，这些部分在框架和电路板之间的区域中露出插脚以方便访问用于测试目的。

10. 发明授权

US07461484B2 Customizable partition system 有权
标题翻译：可定制的分区系统
公开(公告)号：US07461484B2
公开(公告)日：2008-12-09
申请号：US10367249
申请日：2003-02-14
申请人： David J. Battey , Roy W. Fink , Richard Scott Hand , Joshua W. Hoekstra , Robert E. Jeffers , Michael P. Kelley , Douglas B. MacDonald , Gaylan M. McColley , Karl J. Mead , F. Javier Olvera , William H. Palermo , Todd Pelman , Micah E. Roberts , Mark T. Slager , Steven J. Throndset
发明人： David J. Battey , Roy W. Fink , Richard Scott Hand , Joshua W. Hoekstra , Robert E. Jeffers , Michael P. Kelley , Douglas B. MacDonald , Gaylan M. McColley , Karl J. Mead , F. Javier Olvera , William H. Palermo , Todd Pelman , Micah E. Roberts , Mark T. Slager , Steven J. Throndset
IPC分类号： E04C2/52
CPC分类号： E04B2/7425 , E04B2002/7418 , E04B2002/7446 , E04B2002/7462 , E04B2002/7483 , E04B2002/7487 , E04B2002/7488 , E04B2002/749
摘要： A partition system includes an internally-open partition frame having permanent and removable frame members forming multiple vertical and horizontal wireways, with both lay-in and feed-through wire routing. Utility support brackets are attachable for good wire management. The partition frame supports a wide variety of customizable and functional surface components, including a markerboard wall surface, a slatwall, a colored/covered wall surface, a wall surface including utility outlets, a transparent window. The partition frame includes continuous horizontal and vertical rows of slots that flexibly and adjustably support furniture accessories, such as a worksurface, at selected heights and locations along the partition system. Covers are provided that maintain a very high-quality appearance with uniform lines and gaps. Some covers include adjustable edge-mounted light seals for eliminating light leaks and unsightly areas. Further, the present partition system provides flexibility, customizability, rearrangeability, reconfigurability, and an intuitive assembly.
摘要翻译：分隔系统包括具有永久和可移除的框架构件的内部开放的分隔框架，其形成多个垂直和水平线槽，具有铺设和直通导线布线。实用支撑支架可附加于良好的电线管理。分隔框架支撑各种可定制和功能性的表面部件，包括标记墙壁表面，舷墙，彩色/覆盖的墙壁表面，包括公用出口的墙壁表面，透明窗口。分隔框架包括连续的水平和垂直的槽排，其在选定的高度和沿着分隔系统的位置处可柔性和可调节地支撑家具配件，例如工作台面。提供了保持非常高质量的外观，均匀的线条和间隙的封面。一些盖子包括可调节的边缘安装光密封件，用于消除漏光和难看的区域。此外，本分区系统提供灵活性，可定制性，可重新布置性，可重新配置性和直观的组装。

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