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    • 6. 发明授权
    • Resist composition and method for producing resist pattern
    • 抗蚀剂组合物和抗蚀剂图案的制造方法
    • US09291893B2
    • 2016-03-22
    • US13281145
    • 2011-10-25
    • Tatsuro MasuyamaSatoshi YamamotoKoji Ichikawa
    • Tatsuro MasuyamaSatoshi YamamotoKoji Ichikawa
    • G03F7/004G03F7/039G03F7/20
    • G03F7/0046G03F7/0045G03F7/0397G03F7/2041
    • A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
    • 抗蚀剂组合物含有 具有由式(aa)表示的结构单元的树脂和由式(ab)表示的结构单元; 和酸产生剂,其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键,任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。
    • 7. 发明授权
    • Resist composition and method for producing resist pattern
    • 抗蚀剂组合物和抗蚀剂图案的制造方法
    • US09229320B2
    • 2016-01-05
    • US13196446
    • 2011-08-02
    • Koji IchikawaSatoshi Yamamoto
    • Koji IchikawaSatoshi Yamamoto
    • G03F7/004G03F7/039G03F7/20
    • G03F7/0045G03F7/0046G03F7/0397G03F7/2041G03F7/2059
    • A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.
    • 抗蚀剂组合物含有 具有衍生自由式(a)表示的化合物的结构单元的树脂; 和由式(B1)表示的酸发生剂。 其中R1表示氢原子或甲基; A10表示单键,可以具有取代基的C1〜C6烷二基或由说明书中定义的式(a-1)表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。