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    • 3. 发明申请
    • THIN-FILM INSPECTION APPARATUS AND METHOD THEREFOR
    • 薄膜检查装置及其方法
    • US20110205556A1
    • 2011-08-25
    • US13120295
    • 2009-07-02
    • Satoshi SakaiYouji NakanoYasuyuki KobayashiKengo YamaguchiAkemi Takano
    • Satoshi SakaiYouji NakanoYasuyuki KobayashiKengo YamaguchiAkemi Takano
    • G01B11/06
    • G01B11/0625
    • A thin-film inspection apparatus includes a storage section (14) that stores at least two feature-value characteristics in which at least two feature values selected from feature values in a spectral reflectance spectrum that are affected by a variation in the film thickness of at least one of a first transparent thin film and a second transparent thin film are each associated with the film thickness of the first transparent thin film and the film thickness of the second transparent thin film; a light irradiation section (11) that irradiates an inspection-target substrate (S) with white light through a transparent glass substrate; a light receiving section (12) that receives reflected light reflected from the inspection-target substrate (S); and an arithmetic section (15) that obtains measurement values of the feature values stored in the storage section (14) from a spectral reflectance spectrum generated based on the received reflected light and that calculates the film thickness of each of the first transparent thin film and the second transparent thin film by using the obtained measurement values of the feature values and the feature-value characteristics stored in the storage section (14).
    • 薄膜检查装置包括存储部分(14),其存储至少两个特征值特性,其中从光谱反射光谱中的特征值中选择的至少两个特征值受到在 第一透明薄膜和第二透明薄膜中的至少一个分别与第一透明薄膜的膜厚度和第二透明薄膜的膜厚相关联; 通过透明玻璃基板将白色光照射到检查对象基板(S)的光照射部(11) 接收从所述检查对象基板(S)反射的反射光的受光部(12)。 以及算术部(15),其从基于所接收的反射光生成的光谱反射光谱获得存储在所述存储部(14)中的特征量的测量值,并且计算所述第一透明薄膜和 通过使用获得的存储在存储部分(14)中的特征值和特征值特性的测量值来确定第二透明薄膜。
    • 4. 发明授权
    • Thin-film inspection apparatus and method therefor
    • 薄膜检查装置及其方法
    • US08482744B2
    • 2013-07-09
    • US13120295
    • 2009-07-02
    • Satoshi SakaiYouji NakanoYasuyuki KobayashiKengo YamaguchiAkemi Takano
    • Satoshi SakaiYouji NakanoYasuyuki KobayashiKengo YamaguchiAkemi Takano
    • G01B11/28
    • G01B11/0625
    • A thin-film inspection apparatus calculates a film thickness of a first transparent thin film and a second transparent thin film of an inspection-target substrate including the first and second transparent thin films and a transparent conductive film on a transparent glass substrate. The apparatus has a storage section storing at least two feature-value characteristics in which at least two feature values selected from feature values in a spectral reflectance spectrum; a light irradiation section irradiating the inspection-target substrate with white light through the transparent glass substrate; a light receiving section receiving light reflected from the inspection-target substrate; and an arithmetic section obtaining measurement values of the feature values stored in the storage section from the spectral reflectance spectrum based on the reflected light received by the light receiving section, and calculating the film thickness of each of the first transparent thin film and the second transparent thin film.
    • 薄膜检查装置在透明玻璃基板上计算包括第一透明薄膜和第二透明薄膜的透明导电薄膜的检查对象基板的第一透明薄膜和第二透明薄膜的膜厚。 该装置具有存储至少两个特征值特性的存储部分,其中从光谱反射光谱中的特征值中选择的至少两个特征值; 光照射部,通过透明玻璃基板照射检查对象基板的白色光; 接收从检查对象基板反射的光的受光部; 以及算术部,基于由所述受光部所接收的反射光,从所述光谱反射率光谱求出存储在所述存储部中的特征量的测量值,并且计算所述第一透明薄膜和所述第二透明薄膜 薄膜。
    • 10. 发明申请
    • Process For Producing Photovoltaic Device And Photovoltaic Device
    • 生产光伏器件和光伏器件的工艺
    • US20100116328A1
    • 2010-05-13
    • US12452684
    • 2008-12-19
    • Youji Nakano
    • Youji Nakano
    • H01L31/00H01L31/0368
    • H01L31/202H01L31/046H01L31/0463Y02E10/50Y02P70/521
    • A process for producing a photovoltaic device having a high conversion efficiency with improved productivity. The process for producing a photovoltaic device includes an n-layer formation step of depositing an n-layer composed of crystalline silicon on a substrate disposed inside a deposition chamber under reduced pressure conditions by heating the substrate with a heating device to convert the substrate to a heated state, supplying a raw material gas to the inside of the deposition chamber, and then supplying power to a discharge electrode positioned opposing the substrate, wherein the n-layer formation step comprises depositing the n-layer with the pressure inside the deposition chamber set to not less than 500 Pa and not more than 1,000 Pa, and the distance between the substrate and the discharge electrode set to not less than 6 mm and not more than 12 mm.
    • 一种生产率高的转换效率高的光伏器件的制造方法。 制造光伏器件的方法包括:n层形成步骤,在减压条件下,在沉积室内设置的基板上沉积由结晶硅构成的n层,用加热装置加热衬底,将衬底转换成 向沉积室内部供给原料气体,然后向与该基板相对配置的放电电极供电,其特征在于,所述n层形成工序包括:在所述沉积室组中沉积所述n层 为500Pa以上1000Pa以下,基板与放电电极之间的距离为6mm以上且12mm以下。