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1. 发明申请

US20060213797A1 Container box for framed pellicle 审中-公开
标题翻译：集装箱框架防护薄膜
公开(公告)号：US20060213797A1
公开(公告)日：2006-09-28
申请号：US11370043
申请日：2006-03-08
申请人： Satoshi Nozaki , Kazutoshi Sekihara
发明人： Satoshi Nozaki , Kazutoshi Sekihara
IPC分类号： B65D85/48 , B65D85/38
CPC分类号： G03F1/64 , G03F1/66 , G03F7/70741 , G03F7/70983
摘要： There is provided a pellicle container for use in photolithography, with which no dust particles are deposited onto the pellicle contained therein, and contamination of the pellicle can be prevented and good condition is ensured. The present invention provides a pellicle container consisting of a container base on which a pellicle is mounted, and a covering body that covers the pellicle and latches with the container base by engagement together with the container base along the peripheral edges, wherein the pellicle is supported by inserting a frame supporting pin in the opening of a sleeve provided on the outside surface of the pellicle frame. Preferably, the container base is made from a plastic resin and a metal component is joined to the container base; the metal component fixedly connected to the container base is mechanically connected to a positioning component that positions the frame supporting pin that supports the pellicle; and an elastic member is disposed on the point of contact between the frame supporting pin that supports the pellicle and the pellicle frame. It is even more preferable that the container boase and the Icovering body are made of a plastic resin, and these have antistatic performance such that their surface resistivity is no higher than 1×1012 ohms.
摘要翻译：提供了一种用于光刻的防护薄膜容器，其中没有灰尘颗粒沉积在其中所含的防护薄膜组件上，并且可以防止防护薄膜组件的污染并确保良好的状态。本发明提供一种防护薄膜组件，其由安装有防护薄膜组件的容器基座和覆盖体组成，该覆盖体沿着周缘与容器基部接合而覆盖防护薄膜组件和闩锁与容器基座，其中防护薄膜组件被支撑通过将框架支撑销插入设置在防护薄膜组件框架的外表面上的套筒的开口中。优选地，容器基座由塑料树脂制成，并且金属部件接合到容器基座; 固定连接到容器基座的金属部件机械地连接到定位部件，定位部件定位支撑防护薄膜组件的框架支撑销; 并且弹性构件设置在支撑防护薄膜组件的框架支撑销和防护膜框架之间的接触点上。更优选的是，容器坯料和复盖体由塑料树脂制成，这些具有抗静电性能，使得它们的表面电阻率不高于1×10 12欧姆。

2. 发明授权

US08435703B2 Pellicle 有权
标题翻译：薄膜
公开(公告)号：US08435703B2
公开(公告)日：2013-05-07
申请号：US12801815
申请日：2010-06-28
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03F1/62 , G03F1/64
CPC分类号： G03F1/64
摘要： There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with: (1) an outer stepped portion defining a first recess, opening outside the pellicle frame, for accommodating the filter member, (2) an inner stepped portion defining a second recess, opening in a bottom of the first recess, and (3) a ventilation hole with one end opening in a bottom of the second recess of the inner stepped portion and the other end opening in the space within the pellicle frame.
摘要翻译：提供一种具有由四个侧杆形成的矩形防护薄片框架的防护薄膜组件，具有通过至少一个框架杆制成的通孔，用于调节防护薄膜组件框架内形成的空间的压力等于防护薄膜框架外部的压力; 以及过滤构件，其设置成遮盖所述通孔的外部开口，用于防止颗粒进入所述空间，其中所述通孔形成有：（1）限定第一凹部的外部阶梯部分，在所述防护薄膜框架外部开口，（2）限定第一凹部的第二凹部的内部台阶部，和在第一凹部的底部开口的内侧台阶部，（3）在内侧阶梯部的第二凹部的底部具有一端开口的通气孔并且防护薄膜组件框架内的空间中的另一端开口。

3. 发明申请

US20100328635A1 Pellicle 有权
标题翻译：薄膜
公开(公告)号：US20100328635A1
公开(公告)日：2010-12-30
申请号：US12801815
申请日：2010-06-28
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03B27/52
CPC分类号： G03F1/64
摘要： There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with: (1) an outer stepped portion defining a first recess, opening outside the pellicle frame, for accommodating the filter member, (2) an inner stepped portion defining a second recess, opening in a bottom of the first recess, and (3) a ventilation hole with one end opening in a bottom of the second recess of the inner stepped portion and the other end opening in the space within the pellicle frame.
摘要翻译：提供一种具有由四个侧杆形成的矩形防护薄片框架的防护薄膜组件，具有通过至少一个框架杆制成的通孔，用于调节防护薄膜组件框架内形成的空间的压力等于防护薄膜框架外部的压力; 以及过滤构件，其设置成遮盖所述通孔的外部开口，用于防止颗粒进入所述空间，其中所述通孔形成有：（1）限定第一凹部的外部阶梯部分，在所述防护薄膜框架外部开口，（2）限定第一凹部的第二凹部的内部台阶部，和在第一凹部的底部开口的内侧台阶部，（3）在内侧阶梯部的第二凹部的底部具有一端开口的通气孔并且防护薄膜组件框架内的空间中的另一端开口。

4. 发明申请

US20060038974A1 Pellicle frame and pellicle for photolithography using the same 有权
标题翻译：用于光刻的防护薄膜组件框架和防护薄膜
公开(公告)号：US20060038974A1
公开(公告)日：2006-02-23
申请号：US11196438
申请日：2005-08-04
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03B27/62
CPC分类号： G03F1/64
摘要： A frame that prevents the decrease in the exposure area by preventing the frame from curving inward by the tensile force of the pellicle membrane and makes it possible to obtain a pellicle having excellent dimensional accuracy and attachment position accuracy on a photomask, and a pellicle for photolithography using the frame. A pellicle frame of the present invention comprises, in at least one pair of opposite side members of a generally rectangular frame body, a portion with an arc form curved outward in the center portion of the side members, portions with an arc form curved inward on both sides of the portion curved outward, and portions with a straightly linear form on the outer sides of the portions curved inward. The radius of the portions with an arc form curved inward is preferably ⅓ or larger of the radius of the portion with an arc form curved outward. The present invention is particularly effective when applied to large frames wherein a length of at least one pair of opposite side members of the frame body is 400 mm or larger.
摘要翻译：通过防止框架由于防护薄膜的拉伸力向内弯曲而防止曝光区域减小的框架，并且可以获得在光掩模上具有优异的尺寸精度和附着位置精度的防护薄膜组件和用于光刻的防护薄膜组件使用框架。本发明的防护膜框架在大致矩形的框体的至少一对相对侧构件中包括在侧构件的中心部分向外弯曲的弧形部分，其中弧形呈向内弯曲的部分该部分的两侧向外弯曲，并且在向内弯曲的部分的外侧上具有直线形状的部分。圆弧向内弯曲的部分的半径优选为圆弧向外弯曲的部分的半径的1/3或更大。本发明在应用于框架体的至少一对相对侧构件的长度为400mm以上的大框架时特别有效。

5. 发明申请

US20110189594A1 PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：用于光刻的薄膜及其制造方法
公开(公告)号：US20110189594A1
公开(公告)日：2011-08-04
申请号：US13015416
申请日：2011-01-27
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03F1/00
CPC分类号： G03F1/00 , G03F1/62
摘要： A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly, intermediate regions positioned on the opposite sides of the central region and having a re-entrant arcuate shape and end proximity regions each having a linear shape, and adhering a pellicle membrane whose tensile force distribution is adjusted so that a tensile force along the pair of long sides of the pellicle frame is larger than a tensile force along the pair of short sides of the pellicle frame, thereby transforming the one of short sides of the pellicle frame to which the pellicle membrane is adhered to have a linear shape.
摘要翻译：制造光刻用防护薄膜的方法包括以下步骤：提供具有一对长边和一对短边的防护薄膜组件框架，每个长边11具有直线形状，并且每个短边12包括突出的中心部分向外，位于中心区域的相对侧上的中间区域，并且具有重新形成的弧形形状和各自具有直线形状的末端邻近区域，并且粘附防护薄膜，其张力分布被调节成使得沿着该对的张力防护薄膜组件框架的长边的长度大于沿着防护薄膜组件框架的一对短边的张力，从而使防护薄膜组件的薄膜附着的短边之一变形为线状。

6. 发明申请

US20060240199A1 Pellicle frame 审中-公开
标题翻译：防护薄膜框架
公开(公告)号：US20060240199A1
公开(公告)日：2006-10-26
申请号：US11368394
申请日：2006-03-07
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03F1/14
CPC分类号： G03F1/64 , Y10T428/24273
摘要： The invention provides a pellicle frame which can readily be peeled off after being adhesively attached to a photomask, and a photolithographic framed pellicle which makes use of this pellicle frame. The pellicle frame provided by the invention is a rectangular framework body of which the longer side framework member has a length of at least 500 mm, wherein at least one cavity is provided on the outside surface of any framework member at a distance of 50 mm or smaller from a corner of the frame. It is preferable that at least five cavities are provided on the outside surfaces of the pellicle frame, and the cavities each have a cylindrical configuration having a diameter in the range from 1.0 mm to 3.0 mm and a depth of at least 0.5 mm, but not deep enough to penetrate the framework member through. The framed pellicle is constructed by using this pellicle frame.
摘要翻译：本发明提供了一种防护薄膜组件框架，其能够在粘附到光掩模之后容易地剥离，并且使用该防护薄膜框架的光刻框架防护薄膜组件。由本发明提供的防护薄膜框架是矩形框架体，其长边框架构件具有至少500mm的长度，其中至少一个空腔设置在任何框架构件的外表面上，距离为50mm，或从框架的角落较小。优选地，在防护薄膜组件框架的外表面上设置至少五个空腔，并且空腔各自具有直径在1.0mm至3.0mm的范围和至少0.5mm的深度的圆柱形构造，但不是足够深入穿透框架构件。框架的防护薄膜是通过使用这个防护薄膜框架构成的。

7. 发明申请

US20060040079A1 Method of die coating with a die coater 审中-公开
标题翻译：使用模涂机进行模涂法
公开(公告)号：US20060040079A1
公开(公告)日：2006-02-23
申请号：US11196392
申请日：2005-08-04
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： B44F1/06 , B32B29/00 , B32B27/00 , B05D3/02 , B05D3/12
CPC分类号： G03F1/62 , B05C5/0254 , B05D1/265 , Y10T428/3154 , Y10T428/31971
摘要： The invention provides an inexpensive improved die-coating method for the preparation of a high-quality pellicle membrane used for dust-proof protection of a photomask in the photolithographic patterning works in respect of greatly decreased deposition of foreign matter particles and increased uniformity of the film. The improvement is accomplished by a method comprising the steps of: keeping the coating die end as immersed in the coating solution; gently pulling up the coating die at a rate, for example, not exceeding 2 mm/second until the die end comes apart from the solution; and holding the coating die as pulled up until the drops of the coating solution hanging from the die end disappear by means of the surface tension of the solution giving a flat, smooth end surface of the coating die prior to the start of the coating works on a substrate surface with the coating solution ejected from the slit in the coating die end followed by drying and peeling of the resin film off the substrate surface.
摘要翻译：本发明提供了一种廉价的改进的模具涂布方法，用于制备用于光刻图案工作中的光掩模的防尘保护的高品质防护薄膜，用于大大降低异物颗粒的沉积和增加膜的均匀性。通过包括以下步骤的方法实现改进：将涂层模头端部浸没在涂布溶液中; 以例如不超过2mm /秒的速率轻轻地拉起涂覆模具，直到模具端部离开溶液; 并且将上述涂布模具拉起来，直到从模具端悬垂的涂布溶液的液滴通过溶液的表面张力消失，在涂料开始涂布之前给出了涂层模具的平坦光滑的端面基材表面，其中涂布溶液从涂布模具端部中的狭缝喷射，然后干燥并将树脂膜从基材表面剥离。

8. 发明授权

US08449966B2 Pellicle frame and a pellicle 有权
标题翻译：防护薄膜框架和防护薄膜
公开(公告)号：US08449966B2
公开(公告)日：2013-05-28
申请号：US13137836
申请日：2011-09-16
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： B32B1/00
CPC分类号： G03F1/62 , B32B1/00 , B32B27/04 , B32B27/34 , B32B27/38 , B32B2307/71 , B32B2457/14 , B32B2457/202 , G03F1/64 , Y10T428/239
摘要： A new kind of pellicle frame is proposed which is made up of a core body and a clad body; the core body consists of a composite of carbon fiber plus resin, and it is preferred that the carbon fiber exists in the form of a laminated body of carbon fiber sheets in which the resin is impregnated; and the clad body is the outer layer sealing the core body such that no carbon is exposed through the clad body.
摘要翻译：提出了一种新的防护薄膜框架，由芯体和包层体组成; 芯体由碳纤维和树脂的复合体组成，碳纤维优选以浸渍树脂的碳纤维片层叠体的形式存在; 并且包层体是密封芯体的外层，使得没有碳通过包层体暴露。

9. 发明授权

US08338060B2 Pellicle for lithography and method for manufacturing the same 有权
标题翻译：光刻用薄膜及其制造方法
公开(公告)号：US08338060B2
公开(公告)日：2012-12-25
申请号：US13015416
申请日：2011-01-27
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03F1/64 , G03B27/62
CPC分类号： G03F1/00 , G03F1/62
摘要： A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a linear shape and each of the short sides 12 including a central portion projecting outwardly, intermediate regions positioned on the opposite sides of the central region and having a re-entrant arcuate shape and end proximity regions each having a linear shape, and adhering a pellicle membrane whose tensile force distribution is adjusted so that a tensile force along the pair of long sides of the pellicle frame is larger than a tensile force along the pair of short sides of the pellicle frame, thereby transforming the one of short sides of the pellicle frame to which the pellicle membrane is adhered to have a linear shape.
摘要翻译：制造光刻用防护薄膜的方法包括以下步骤：提供具有一对长边和一对短边的防护薄膜组件框架，每个长边11具有直线形状，并且每个短边12包括突出的中心部分向外，位于中心区域的相对侧上的中间区域，并且具有重新形成的弧形形状和各自具有直线形状的末端邻近区域，并且粘附防护薄膜，其张力分布被调节成使得沿着该对的张力防护薄膜组件框架的长边的长度大于沿着防护薄膜组件框架的一对短边的张力，从而使防护薄膜组件的薄膜附着的短边之一变形为线状。

10. 发明授权

US08293432B2 Pellicle 有权
标题翻译：薄膜
公开(公告)号：US08293432B2
公开(公告)日：2012-10-23
申请号：US12801642
申请日：2010-06-18
申请人： Kazutoshi Sekihara
发明人： Kazutoshi Sekihara
IPC分类号： G03F1/62
CPC分类号： G03F1/64
摘要： There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the external opening of the ventilation hole for preventing entrance of a foreign substance, and at least one of two openings of the ventilation hole is chamfered to a degree selected from a group consisting of “C0.5 to C1.0” and “R0.5 to R1.0”.
摘要翻译：提供防护薄膜组件，其具有通过至少一个框架杆制成的通风孔，用于将框架内的压力调节到大气压力;以及过滤器，用于遮盖通风孔的外部开口以防止异物进入，并且通气孔的两个开口中的至少一个被倒角到从由C0.5至C1.0和R0.5至R1.0组成的组中选择的程度。

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