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    • 1. 发明授权
    • Liquid crystal display and a manufacturing method thereof
    • 液晶显示器及其制造方法
    • US06717634B2
    • 2004-04-06
    • US10174054
    • 2002-06-19
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • G02F11333
    • G02F1/1309G02F2001/136263
    • A gate line is formed on a substrate in a horizontal direction and a data repair line is formed on the same layer as the gate line in a vertical direction. The repair line is divided into two portions with respect to the gate line. A gate insulating film is formed on the gate line and the data repair line, and a data line is formed on the gate insulating film along the repair line having a smaller width than the repair line, a passivation film being deposited thereon. Contact holes are formed in the passivation film, and contact holes to expose both ends of the divided repair line are formed in the passivation film and gate insulating film. A transparent connecting pattern formed on the passivation film contacts the data line and the repair line through the contact holes. Both ends of the repair line are extended from the data line. A pixel electrode is formed on the passivation film, and the pixel electrode overlaps the edges of the repair line at a predetermined width. The repair line functions as a signal transmitting path when the data line is disconnected, and as a black matrix for blocking light-leakage. The transparent connecting pattern acts as a path when the data line is disconnected at the portion where the gate line intersects the data line.
    • 在水平方向上在基板上形成栅极线,并且在与垂直方向上的栅极线相同的层上形成数据修复线。 修理线相对于栅极线分为两部分。 在栅极线和数据修复线上形成栅极绝缘膜,并且沿着具有比修复线宽的宽度的修复线在栅极绝缘膜上形成数据线,在其上沉积钝化膜。 在钝化膜中形成接触孔,并且在钝化膜和栅极绝缘膜中形成用于露出分割的修复线的两端的接触孔。 形成在钝化膜上的透明连接图案通过接触孔接触数据线和修复线。 修复线的两端从数据线延伸。 像素电极形成在钝化膜上,像素电极以预定的宽度与修复线的边缘重叠。 当数据线断开时,修复线作为信号传输路径,并且作为用于阻止漏光的黑矩阵。 当数据线在栅极线与数据线相交的部分断开时,透明连接图案用作路径。
    • 2. 发明授权
    • Liquid crystal display
    • 液晶显示器
    • US07463323B2
    • 2008-12-09
    • US10739195
    • 2003-12-19
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • G02F1/1343G02F1/136G02F1/1333
    • G02F1/1309G02F2001/136263
    • A gate line is formed on a substrate in a horizontal direction and a data repair line is formed on the same layer as the gate line in a vertical direction. The repair line is divided into two portions with respect to the gate line. A gate insulating film is formed on the gate line and the data repair line, and a data line is formed on the gate insulating film along the repair line having a smaller width than the repair line, a passivation film being deposited thereon. Contact holes are formed in the passivation film, and contact holes to expose both ends of the divided repair line are formed in the passivation film and gate insulating film. A transparent connecting pattern formed on the passivation film contacts the data line and the repair line through the contact holes. Both ends of the repair line are extended from the data line. A pixel electrode is formed on the passivation film, and the pixel electrode overlaps the edges of the repair line at a predetermined width. The repair line functions as a signal transmitting path when the data line is disconnected, and as a black matrix for blocking light-leakage. The transparent connecting pattern acts as a path when the data line is disconnected at the portion where the gate line intersects the data line.
    • 在水平方向上在基板上形成栅极线,并且在与垂直方向上的栅极线相同的层上形成数据修复线。 修理线相对于栅极线分为两部分。 在栅极线和数据修复线上形成栅极绝缘膜,并且沿着具有比修复线宽的宽度的修复线在栅极绝缘膜上形成数据线,在其上沉积钝化膜。 在钝化膜中形成接触孔,并且在钝化膜和栅极绝缘膜中形成用于露出分割的修复线的两端的接触孔。 形成在钝化膜上的透明连接图案通过接触孔接触数据线和修复线。 修复线的两端从数据线延伸。 像素电极形成在钝化膜上,像素电极以预定的宽度与修复线的边缘重叠。 当数据线断开时,修复线作为信号传输路径,并且作为用于阻止漏光的黑矩阵。 当数据线在栅极线与数据线相交的部分断开时,透明连接图案用作路径。
    • 3. 发明授权
    • Liquid crystal displays and manufacturing methods thereof
    • 液晶显示器及其制造方法
    • US06429909B1
    • 2002-08-06
    • US09174429
    • 1998-10-19
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • Sang-Soo KimDong-Gyu KimWoon-Yong Park
    • G02F11333
    • G02F1/1309G02F2001/136263
    • A gate line is formed on a substrate in a horizontal direction and a data repair line is formed on the same layer as the gate line in a vertical direction. The repair line is divided into two portions with respect to the gate line. A gate insulating film is formed on the gate line and the data repair line, and a data line is formed on the gate insulating film along the repair line having a smaller width than the repair line, a passivation film being deposited thereon. Contact holes are formed in the passivation film, and contact holes to expose both ends of the divided repair line are formed in the passivation film and gate insulating film. A transparent connecting pattern formed on the passivation film contacts the data line and the repair line through the contact holes. Both the ends of the repair line are extended from the data line. A pixel electrode is formed on the passivation film, and the pixel electrode overlaps the edges of the repair line at a predetermined width. The repair line functions as a signal transmitting path when the data line is disconnected, and as a black matrix for blocking light-leakage The transparent connecting pattern acts as a path when the data line is disconnected at the portion where the gate line intersects the data line.
    • 在水平方向上在基板上形成栅极线,并且在与垂直方向上的栅极线相同的层上形成数据修复线。 修理线相对于栅极线分为两部分。 在栅极线和数据修复线上形成栅极绝缘膜,并且沿着具有比修复线宽的宽度的修复线在栅极绝缘膜上形成数据线,在其上沉积钝化膜。 在钝化膜中形成接触孔,并且在钝化膜和栅极绝缘膜中形成用于露出分割的修复线的两端的接触孔。 形成在钝化膜上的透明连接图案通过接触孔接触数据线和修复线。 维修线的两端都从数据线延伸出来。 像素电极形成在钝化膜上,像素电极以预定的宽度与修复线的边缘重叠。 当数据线断开时,修复线作为信号传输路径,并且作为用于阻止漏光的黑矩阵。当数据线在栅极线与数据相交的部分断开时,透明连接图案用作路径 线。
    • 4. 发明授权
    • Manufacturing method of forming a passivation layer in a liquid crystal
display device
    • 在液晶显示装置中形成钝化层的制造方法
    • US5482173A
    • 1996-01-09
    • US280888
    • 1994-07-27
    • Woon-Yong ParkDong-Gyu KimSang-Soo Kim
    • Woon-Yong ParkDong-Gyu KimSang-Soo Kim
    • G02F1/13G02F1/1333G02F1/1345G02F1/136G02F1/1368H01L29/78H01L29/786C30B33/00B44C1/22
    • G02F1/1345
    • A method for manufacturing a LCD device includes forming a first electrode on a lower substrate so as to be connected with an external terminal on the periphery of the lower substrate and forming a liquid crystal cell on a central portion of the lower substrate. A passivation layer is thereafter formed on the overall surface of the lower substrate. A first portion of the passivation layer which overlies a contact area of the first electrode is then removed using a laser beam directed through the lower substrate at the contact area of the first electrode and the overlying passivation layer. A conductive layer of paste is formed on the contact area of the first electrode, either before or after the removal of the first portion of the passivation layer, and an upper substrate is assembled to the lower substrate so that the conductive layer forms an electrical connection between the first electrode and a common electrode formed on an inner surface of the upper substrate.
    • 一种LCD器件的制造方法,其特征在于,在下基板上形成第一电极,与所述下基板的周边的外部端子连接,在所述下基板的中央部形成液晶元件。 此后在下基板的整个表面上形成钝化层。 然后使用在第一电极和上覆钝化层的接触区域处引导通过下基板的激光束去除覆盖在第一电极的接触区域上的钝化层的第一部分。 在去除钝化层的第一部分之前或之后,在第一电极的接触区域上形成导电层,并且将上基板组装到下基板,使得导电层形成电连接 在第一电极和形成在上基板的内表面上的公共电极之间。
    • 5. 发明授权
    • Thin film transistor array panel
    • 薄膜晶体管阵列面板
    • US07986379B2
    • 2011-07-26
    • US12728138
    • 2010-03-19
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • G02F1/1333G02F1/136
    • G02F1/136204G02F2001/133388
    • A data line and an amorphous silicon pattern are formed on a substrate. The first electrode pattern is extended from the data line and overlaps an edge of the amorphous silicon pattern. The second electrode pattern is made of the same metal as the first electrode pattern and overlaps the edge of the amorphous silicon pattern at an opposite side of the first electrode pattern. Edges of the first and the second electrode patterns are sharply formed so that a tunneling effect easily occurs through the amorphous silicon pattern. An indium-tin-oxide pattern for a capacitor is formed at the end of the second electrode pattern. The capacitor is formed between the ITO pattern and a common electrode.
    • 在基板上形成数据线和非晶硅图案。 第一电极图案从数据线延伸并与非晶硅图案的边缘重叠。 第二电极图案由与第一电极图案相同的金属制成,并且在第一电极图案的相对侧与非晶硅图案的边缘重叠。 尖锐地形成第一和第二电极图案的边缘,使得通过非晶硅图案容易发生隧道效应。 在第二电极图案的末端形成用于电容器的铟锡氧化物图案。 电容器形成在ITO图案和公共电极之间。
    • 6. 发明授权
    • Thin film transistor array panel
    • 薄膜晶体管阵列面板
    • US07710506B2
    • 2010-05-04
    • US11558170
    • 2006-11-09
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • G02F1/1333G02F1/136
    • G02F1/136204G02F2001/133388
    • A data line and an amorphous silicon pattern are formed on a substrate. The first electrode pattern is extended from the data line and overlaps an edge of the amorphous silicon pattern. The second electrode pattern is made of the same metal as the first electrode pattern and overlaps the edge of the amorphous silicon pattern at an opposite side of the first electrode pattern. Edges of the first and the second electrode patterns are sharply formed so that a tunneling effect easily occurs through the amorphous silicon pattern. An indium-tin-oxide pattern for a capacitor is formed at the end of the second electrode pattern. The capacitor is formed between the ITO pattern and a common electrode.
    • 在基板上形成数据线和非晶硅图案。 第一电极图案从数据线延伸并与非晶硅图案的边缘重叠。 第二电极图案由与第一电极图案相同的金属制成,并且在第一电极图案的相对侧与非晶硅图案的边缘重叠。 尖锐地形成第一和第二电极图案的边缘,使得通过非晶硅图案容易发生隧道效应。 在第二电极图案的末端形成用于电容器的铟锡氧化物图案。 电容器形成在ITO图案和公共电极之间。
    • 7. 发明授权
    • Liquid crystal displays
    • 液晶显示器
    • US06587160B2
    • 2003-07-01
    • US09172130
    • 1998-10-14
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • G02F11333
    • G02F1/136204G02F2001/133388
    • A data line and an amorphous silicon pattern are formed on a substrate. The first electrode pattern is extended from the data line and overlaps an edge of the amorphous silicon pattern. The second electrode pattern is made of the same metal as the first electrode pattern and overlaps the edge of the amorphous silicon pattern at an opposite side of the first electrode pattern. Edges of the first and the second electrode patterns are sharply formed so that a tunneling effect easily occurs through the amorphous silicon pattern. An indium-tin-oxide pattern for a capacitor is formed at the end of the second electrode pattern. The capacitor is formed between the ITO pattern and a common electrode.
    • 在基板上形成数据线和非晶硅图案。 第一电极图案从数据线延伸并与非晶硅图案的边缘重叠。 第二电极图案由与第一电极图案相同的金属制成,并且在第一电极图案的相对侧与非晶硅图案的边缘重叠。 尖锐地形成第一和第二电极图案的边缘,使得通过非晶硅图案容易发生隧道效应。 在第二电极图案的末端形成用于电容器的铟锡氧化物图案。 电容器形成在ITO图案和公共电极之间。
    • 8. 发明授权
    • Liquid crystal display panels having control lines with uniforms
resistance
    • 具有均匀电阻的控制线的液晶显示面板
    • US6104465A
    • 2000-08-15
    • US774505
    • 1996-12-30
    • Byoung-Sun NaDong-Gyu KimWoon-Yong Park
    • Byoung-Sun NaDong-Gyu KimWoon-Yong Park
    • G02F1/1343G02F1/1345
    • G02F1/1345
    • A liquid crystal display (LCD) panel includes a substrate, a plurality of parallel control lines on the substrate, and a bonding pad area on the substrate having a plurality of bonding pads therein. A respective one of a plurality of interconnecting conductors connect a respective bonding pad of the bonding pad area to a respective one of the plurality of parallel control lines, each of the plurality of interconnecting conductors having a uniform resistance. According to embodiments of the invention, an interconnecting conductor of the plurality of interconnecting conductors may include a material selected to provide the uniform resistance. The interconnecting conductor may include a first portion including a first material having a first resistivity and a second portion including a second material having a second resistivity different from the first resistivity. The first and second portions may have respective first and second lengths selected to provide the uniform resistance. According to other embodiments, an interconnecting conductor of the plurality of interconnecting conductors may have a width selected to provide the uniform resistance. In one embodiment, the plurality of interconnecting conductors have a resistivity per unit length associated therewith and extend from the bonding pad area in a fanned configuration, with the resistivity of the interconnecting conductors increasing toward a medial portion of the fanned configuration. The width of the interconnecting conductors may decrease towards the medial portion of the fanned configuration to produce the desired resistivity. According to other embodiments, an interconnecting conductor of the plurality of interconnecting conductors has a length selected to provide the uniform resistance. In one embodiment, the interconnecting conductor has a serpentine portion to provide the desired length.
    • 液晶显示器(LCD)面板包括衬底,在衬底上的多个并行控制线,以及衬底上的焊盘区域,其中具有多个焊盘。 多个互连导体中的相应一个将接合焊盘区域的相应接合焊盘连接到多个并联控制线中的相应一个,多个互连导体中的每一个具有均匀的电阻。 根据本发明的实施例,多个互连导体的互连导体可以包括被选择以提供均匀电阻的材料。 互连导体可以包括包括具有第一电阻率的第一材料的第一部分和包括具有不同于第一电阻率的第二电阻率的第二材料的第二部分。 第一和第二部分可以具有相应的第一和第二长度,以提供均匀的电阻。 根据其他实施例,多个互连导体的互连导体可以具有被选择为提供均匀电阻的宽度。 在一个实施例中,多个互连导体具有与其相关联的每单位长度的电阻率,并且从结合焊盘区域以扇形配置延伸,互连导体的电阻率朝着扇形结构的中间部分增加。 互连导体的宽度可以朝着扇形构型的中间部分减小以产生所需的电阻率。 根据其他实施例,多个互连导体的互连导体具有选择的长度以提供均匀的电阻。 在一个实施例中,互连导体具有蛇形部分以提供期望的长度。
    • 10. 发明申请
    • THIN FILM TRANSISTOR ARRAY PANEL
    • 薄膜晶体管阵列
    • US20070064165A1
    • 2007-03-22
    • US11558170
    • 2006-11-09
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • Joo-Hyung LeeDong-Gyu KimWoon-Yong Park
    • G02F1/1333
    • G02F1/136204G02F2001/133388
    • A data line and an amorphous silicon pattern are formed on a substrate. The first electrode pattern is extended from the data line and overlaps an edge of the amorphous silicon pattern. The second electrode pattern is made of the same metal as the first electrode pattern and overlaps the edge of the amorphous silicon pattern at an opposite side of the first electrode pattern. Edges of the first and the second electrode patterns are sharply formed so that a tunneling effect easily occurs through the amorphous silicon pattern. An indium-tin-oxide pattern for a capacitor is formed at the end of the second electrode pattern. The capacitor is formed between the ITO pattern and a common electrode.
    • 在基板上形成数据线和非晶硅图案。 第一电极图案从数据线延伸并与非晶硅图案的边缘重叠。 第二电极图案由与第一电极图案相同的金属制成,并且在第一电极图案的相对侧与非晶硅图案的边缘重叠。 尖锐地形成第一和第二电极图案的边缘,使得通过非晶硅图案容易发生隧道效应。 在第二电极图案的末端形成用于电容器的铟锡氧化物图案。 电容器形成在ITO图案和公共电极之间。