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1. 发明申请

US20130180454A1 THIN FILM DEPOSITION APPARATUS 审中-公开
标题翻译：薄膜沉积装置
公开(公告)号：US20130180454A1
公开(公告)日：2013-07-18
申请号：US13823846
申请日：2011-09-16
申请人： Sang-Joon Park , Jin-Ho Kim , Byung-Guk Son
发明人： Sang-Joon Park , Jin-Ho Kim , Byung-Guk Son
IPC分类号： C23C16/455
CPC分类号： C23C16/455 , C23C16/303 , C23C16/45508 , C23C16/45514 , H01L21/02538 , H01L21/0262
摘要： Provided is a thin film deposition apparatus which comprises a chamber, a susceptor, a source gas supply part, and a susceptor support. The chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the chamber to directly support a plurality of substrates along a circumference of a center of a top surface or support a substrate holder on which at least one substrate is disposed. The source gas supply part supplies first and second source gases into a central portion of an upper side of the susceptor in a state where the first and second gases are separated from each other. Also, the source gas supply part respectively injects the first and second source gases separated from each other toward a circumference of the susceptor through vertically arranged source gas injection holes to supply the first and second source gases onto the substrates disposed on the susceptor. The susceptor support is configured to support a center of the susceptor from a lower side of the susceptor. Also, the susceptor support includes an additional gas supply part for injecting an additional gas introduced from the outside onto a top surface of the susceptor.
摘要翻译：提供一种薄膜沉积设备，其包括室，基座，源气体供应部分和基座支撑件。该腔室具有进行沉积处理的内部空间。基座设置在室内以沿着顶表面的中心的圆周直接支撑多个基板，或支撑其上设置有至少一个基板的基板保持器。源气体供给部在第一气体和第二气体彼此分离的状态下将第一源气体和第二源气体供给到基座的上侧的中央部。另外，原料气体供给部分通过垂直排列的原料气体注入孔分别将彼此分离的第一和第二源气体朝向基座的圆周喷射，以将第一和第二源气体提供到设置在基座上的基板上。基座支撑构造成从基座的下侧支撑基座的中心。此外，基座支架包括用于将从外部引入的附加气体注入到基座的顶表面上的附加气体供应部件。

2. 发明申请

US20130291798A1 THIN FILM DEPOSITION APPARATUS AND SUBSTRATE TREATMENT SYSTEM INCLUDING THE SAME 审中-公开
标题翻译：薄膜沉积装置及其基底处理系统
公开(公告)号：US20130291798A1
公开(公告)日：2013-11-07
申请号：US13979462
申请日：2012-01-03
申请人： Ho-Young Lee , Sang-Joon Park , Jin-Pil Heo , Byung-Guk Son , Wook-Sang Jang , Kyung-Cheol Lee
发明人： Ho-Young Lee , Sang-Joon Park , Jin-Pil Heo , Byung-Guk Son , Wook-Sang Jang , Kyung-Cheol Lee
IPC分类号： C23C16/458
CPC分类号： C23C16/458 , C23C16/4584 , C23C16/4585 , H01L21/02538 , H01L21/0262 , H01L21/67346 , H01L21/68742 , H01L21/68764 , H01L21/68771 , Y10S901/43
摘要： The present invention relates to a thin film deposition apparatus and a substrate treatment system including same. The thin film deposition apparatus includes a deposition chamber, a susceptor, a rotation mechanism, an elevation member, and an elevation driving unit. The deposition chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the deposition chamber, and a plurality of substrates is seated on a top surface of the susceptor. The elevation member is disposed above the susceptor to support a portion of each side of the substrates seated on the susceptor. When the elevation member is operated, the substrates are separated from the susceptor or seated on the susceptor. The elevation driving unit elevates the elevation member.
摘要翻译：本发明涉及一种薄膜沉积设备及其基片处理系统。薄膜沉积设备包括沉积室，基座，旋转机构，升降构件和升降驱动单元。沉积室具有进行沉积处理的内部空间。基座设置在沉积室内，并且多个基板位于基座的顶表面上。升降构件设置在基座上方以支撑安置在基座上的基板的每一侧的一部分。当升降构件被操作时，基板与基座分离或者安置在基座上。升降驱动单元升高升降构件。

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