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    • 2. 发明申请
    • PLASMA APPARATUS AND METHOD OF OPERATING THE SAME
    • 等离子体装置及其操作方法
    • US20160056017A1
    • 2016-02-25
    • US14799588
    • 2015-07-15
    • Samsung Electronics Co., Ltd.
    • Moojin KIMBongseong KIMUnjoo LEE
    • H01J37/32
    • H01J37/321H01J37/32706H01J37/32972
    • A plasma apparatus includes a chuck disposed in a process chamber, a gas supply unit supplying a process gas into the process chamber, a plasma generating unit configured to generate plasma over the chuck, a direct current (DC) power generator applying a DC pulse signal to the chuck, and a sensor monitoring a state of the plasma and providing a sensing signal to the DC power generator. Each period of the DC pulse signal includes a negative pulse duration, a positive pulse duration, and a pulse-off duration. If a signal disturbance of the sensing signal occurs in an nth period of the DC pulse signal, the DC power generator changes a magnitude of a positive pulse and/or a length of the positive pulse duration of an n+1th period of the DC pulse signal, where “n” denotes a natural number.
    • 一种等离子体装置,包括设置在处理室中的卡盘,将处理气体供应到处理室中的气体供应单元,配置成在卡盘上产生等离子体的等离子体产生单元,施加DC脉冲信号的直流(DC)功率发生器 并且传感器监测等离子体的状态并向DC发电机提供感测信号。 DC脉冲信号的每个周期包括负脉冲持续时间,正脉冲持续时间和脉冲关闭持续时间。 如果在直流脉冲信号的第n个周期中发生感测信号的信号干扰,则直流发电机改变正脉冲的大小和/或直流脉冲的第n + 1个周期的正脉冲持续时间的长度 信号,其中“n”表示自然数。