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    • 7. 发明申请
    • METHOD OF CLEANING PHOTOMASK
    • 清洗光学方法
    • US20150107617A1
    • 2015-04-23
    • US14285771
    • 2014-05-23
    • SAMSUNG ELECTRONICS CO., LTD.
    • Sang-Hyeon LEEHwa-Sung KIM
    • G03F1/82B08B7/00
    • G03F1/82B08B7/0035
    • A method of cleaning a photomask, the method including placing the photomask in a chamber, the photomask including a mask substrate and a reflective layer, a capping layer, and a light absorbing layer pattern stacked on the mask substrate, and wherein the photomask has contaminants thereon; supplying a gas into the chamber such that the gas does not react with the capping layer or reacts with the capping layer to form an anti-oxidant layer; ionizing the gas by irradiating an inside of the chamber with an energy beam such that the contaminants react with the ionized gas to be converted to a by-product; and removing the by-product from the chamber.
    • 一种清洁光掩模的方法,所述方法包括将光掩模放置在室中,所述光掩模包括掩模基板和反射层,覆盖层和层叠在掩模基板上的光吸收层图案,并且其中光掩模具有污染物 上; 将气体供应到所述室中,使得所述气体不与所述封盖层反应或与所述封盖层反应以形成抗氧化剂层; 通过用能量束照射室的内部来使气体电离,使得污染物与电离气体反应以转化成副产物; 并从室中除去副产物。