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1. 发明公开

US20230403905A1 DISPLAY APPARATUS 审中-公开
公开(公告)号：US20230403905A1
公开(公告)日：2023-12-14
申请号：US18135042
申请日：2023-04-14
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han , Donghyun Kim
IPC分类号： H10K59/38 , H10K59/122
CPC分类号： H10K59/38 , H10K59/122
摘要： A display apparatus includes: a first substrate; a bank on the first substrate and including partition walls defining a first well, a second well, a third well, and auxiliary wells, a first quantum dot layer in the first well; and a second quantum dot layer in the second well. The partition walls have a second width that is less than a first width. The first width is an average width of the partition walls farther away from a cross point at where three or more partition walls extending in different directions meet one another, and the second width is an average width of the partition walls at the cross point; a first quantum dot layer in the first well; and a second quantum dot layer in the second well.

2. 发明公开

US20230219343A1 INKJET PRINTING DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME 审中-公开
公开(公告)号：US20230219343A1
公开(公告)日：2023-07-13
申请号：US17963810
申请日：2022-10-11
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han , Jongho Park , Taeho Yang , Myungsoo Huh
IPC分类号： B41J2/145 , B41M3/00 , B41J2/165
CPC分类号： B41J2/145 , B41M3/003 , B41J2/16505
摘要： An inkjet printing device includes a chamber having an imaginary centerline that divides a length of the chamber in the first direction into two halves, and a plurality of inkjet nozzles coupled to the chamber and receiving ink from the chamber, the inkjet nozzles being arranged in a plurality of columns along a first direction. The inkjet nozzles include a center column nozzle disposed adjacent to the centerline of the chamber and an outer column nozzle disposed farther from the centerline than the center column nozzle. The chamber includes a bump portion disposed farther from the centerline than the outer column nozzle, the bump portion including a bump on an inner surface of the chamber.

3. 发明授权

US09515296B2 Deposition device including laser mask and deposition method using the same 有权
标题翻译：包括激光掩模和沉积方法的沉积装置
公开(公告)号：US09515296B2
公开(公告)日：2016-12-06
申请号：US14943619
申请日：2015-11-17
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： H01L21/00 , H01L51/56 , H01L51/00 , C23C16/48
CPC分类号： H01L51/56 , C23C14/04 , C23C14/042 , C23C14/12 , H01L51/0009 , H01L51/0011
摘要： A deposition device including a chamber configured to accommodate a substrate supported on a stage, a deposition source configured to discharge material toward the substrate, and a laser mask system configured to form a laser mask between the substrate and the stage.
摘要翻译：一种沉积装置，包括被配置为容纳支撑在载物台上的基底的腔室，被配置为朝向基底排出材料的沉积源，以及被配置为在基底和载物台之间形成激光掩模的激光掩模系统。

4. 发明申请

US20160160339A1 METHOD OF MANUFACTURING DEPOSITION MASK 有权
标题翻译：制备沉积掩模的方法
公开(公告)号：US20160160339A1
公开(公告)日：2016-06-09
申请号：US14795253
申请日：2015-07-09
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： C23C14/04 , G03F7/40 , G03F7/34 , G03F7/32 , G03F7/16 , G03F7/20
CPC分类号： C23C14/042 , G03F7/16 , G03F7/164 , G03F7/2022 , G03F7/32 , G03F7/34 , G03F7/40
摘要： A method of manufacturing a deposition mask is disclosed. In one aspect, the method includes depositing a first photoresist layer on a substrate, aligning a first photomask over the first photoresist layer and developing the first photoresist layer to form a plurality of first photoresist patterns having sides that gradually narrow toward the substrate. The method also includes forming a metal layer over the first photoresist patterns and a portion of the substrate exposed by the first photoresist patterns, depositing a second photoresist layer over the metal layer and aligning a second photomask over the second photoresist layer and developing the second photoresist layer to form a plurality of second photoresist patterns between the first photoresist patterns. The method further includes etching the metal layer to form a pattern hole, removing the first and second photoresist patterns and separating the substrate so as to form a deposition mask.
摘要翻译：公开了一种制造沉积掩模的方法。一方面，该方法包括在衬底上沉积第一光致抗蚀剂层，将第一光掩模对准第一光致抗蚀剂层上的第一光掩模，并使第一光致抗蚀剂层显影，以形成具有朝向衬底逐渐变窄的侧面的多个第一光致抗蚀剂图案。该方法还包括在第一光致抗蚀剂图案上形成金属层和由第一光致抗蚀剂图案曝光的基板的一部分，在金属层上沉积第二光致抗蚀剂层并使第二光掩模对准在第二光致抗蚀剂层上并显影第二光致抗蚀剂以在第一光致抗蚀剂图案之间形成多个第二光致抗蚀剂图案。该方法还包括蚀刻金属层以形成图案孔，去除第一和第二光致抗蚀剂图案并分离衬底以形成沉积掩模。

5. 发明授权

US12059911B2 Method of manufacturing display device 有权
公开(公告)号：US12059911B2
公开(公告)日：2024-08-13
申请号：US17722842
申请日：2022-04-18
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： B41J3/407 , H10K71/13
CPC分类号： B41J3/407 , H10K71/135
摘要： A method of manufacturing a display device includes: discharging ink onto a substrate including a main partition wall for partitioning a color filter area and a dummy accommodation area adjacent to the color filter area; generating main position information by detecting a position of the first erroneous ink discharged on the main partition wall; disposing a hydrophobic plate so as to be adjacent to the first erroneous ink, based on the main position information; bringing the hydrophobic plate into contact with the main partition wall; and then moving the hydrophobic plate to the dummy accommodation area, to accommodate the first erroneous ink in the dummy accommodation area.

6. 发明授权

US11974490B2 Apparatus for manufacturing a display device 有权
公开(公告)号：US11974490B2
公开(公告)日：2024-04-30
申请号：US17107537
申请日：2020-11-30
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： G01N21/85 , H10K71/13
CPC分类号： H10K71/135 , G01N21/85 , G01N2021/8564
摘要： An apparatus for manufacturing a display device, the apparatus comprising: a droplet discharger comprising a nozzle configured to discharge a droplet; a first detector on a falling path of the droplet that falls from the droplet discharger and configured to detect a shape of the droplet; a second detector spaced apart from the first detector and configured to detect the shape of the droplet that falls from the droplet discharger; and a controller configured to calculate at least one of a volume of the droplet, a falling speed of the droplet, the falling path of the droplet, or a discharge angle, at which the droplet is discharged from the nozzle, based on results detected by the first detector and the second detector.

7. 发明申请

US20210005839A1 APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE 有权
公开(公告)号：US20210005839A1
公开(公告)日：2021-01-07
申请号：US16812566
申请日：2020-03-09
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jeongwon Han , Jongsung Kim
IPC分类号： H01L51/52 , H01L27/32 , H01L51/00 , H01L51/56 , B65H18/14
摘要： An apparatus for manufacturing a display device includes a first roller from which a film member is unwound, a second roller around which the film member is wound, a flatness maintainer that is arranged between the first roller and the second roller and keeps at least one of an upper surface and a lower surface of the film member, flat, and a sensing unit arranged on at least one of the upper surface of the film member and the lower surface of the film member and detecting droplets dropped from a head unit onto the film member.

8. 发明授权

US10161030B2 Deposition mask and deposition apparatus having the same 有权
公开(公告)号：US10161030B2
公开(公告)日：2018-12-25
申请号：US14012917
申请日：2013-08-28
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： C23C14/04 , C23C18/06 , C23C16/04 , C23C10/04 , C23C8/04 , C30B25/04 , H01L51/00
摘要： A deposition apparatus includes a deposition chamber, a deposition source, and a deposition mask. The deposition source is disposed in the deposition chamber and provides a deposition material to a deposition substrate. The deposition mask includes a body portion and a carbon layer. The carbon layer is disposed on a first surface making contact with the deposition mask and includes at least one of carbon nanotube or graphene.

9. 发明授权

US10675711B2 Mask extension welding device for thin film deposition 有权
公开(公告)号：US10675711B2
公开(公告)日：2020-06-09
申请号：US15098842
申请日：2016-04-14
申请人： Samsung Display Co., Ltd.
发明人： Jeongwon Han
IPC分类号： B23K26/21 , C23C14/04 , B23K26/035 , B23K26/244 , B23K37/04 , C23C14/24
摘要： A mask extension welding apparatus for thin film deposition to extend and weld a mask on a frame includes an extension unit configured to extend the mask in a first direction, a pressure unit configured to press the mask towards the frame, and a laser welding unit configured to weld the mask and the frame. The pressure unit includes an upper housing, a lower housing spaced apart from the upper housing with respect to a fluid inlet, and a porous plate disposed at a downstream of the fluid inlet, the porous plate connecting the upper housing and the lower housing, and configured to eject a fluid supplied through the fluid inlet towards the mask.

10. 发明授权

US09802276B2 Manufacturing apparatus for mask frame assembly, and method using the same 有权
公开(公告)号：US09802276B2
公开(公告)日：2017-10-31
申请号：US15043866
申请日：2016-02-15
申请人： Samsung Display Co., Ltd.
发明人： Myungkyu Kim , Jeongwon Han
IPC分类号： B23K31/02 , B23K37/04 , H01L51/00
CPC分类号： B23K37/0435 , B23K31/02 , B23K37/0408 , H01L51/0011
摘要： Exemplary embodiments provide an apparatus to manufacture a mask frame assembly, including: extending unit configured to extend both ends of a mask in a first direction and arrange the mask on a frame, the mask including a deposition pattern and the frame including an opening; a pressurizing unit including a plurality of pressing portions the plurality of pressing portions configured to independently press the mask toward the frame; and a welding unit configured to weld the mask to affix the mask onto the frame.

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