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    • 7. 发明申请
    • DEPOSITION APPARATUS
    • 沉积装置
    • US20160248050A1
    • 2016-08-25
    • US15005975
    • 2016-01-25
    • Samsung Display Co., Ltd.
    • Jae Sik KIMHyun Sung BANGKyu Hwan HWANG
    • H01L51/56C23C14/24H01L51/00
    • C23C14/24C23C14/12C23C14/243H01L51/001H01L51/0011
    • Disclosed is a deposition apparatus including: a deposition source heating a deposition material filled therein to vaporize the deposition material and including a plurality of nozzles spraying the vaporized deposition material toward a counter substrate; and a structure disposed between the deposition source and the substrate and including a plurality of angle adjustment plates arranged to have an opening in order to guide a movement direction of the deposition material sprayed from the nozzles, in which the angle adjustment plate is subjected to coating treatment by a self-assembled monolayer (SAM). Thereby, when a continuous deposition operation is performed, an organic material is not stacked on a structure such as an angle limitation plate or the angle adjustment plate.
    • 公开了一种沉积设备,包括:沉积源,加热填充在其中的沉积材料以蒸发沉积材料,并且包括将蒸发的沉积材料喷射到相对基板的多个喷嘴; 以及设置在所述沉积源和所述基板之间的结构,并且包括多个角度调整板,所述多个角度调整板布置成具有开口,以便引导从所述角度调节板经受涂覆的喷嘴喷射的沉积材料的移动方向 通过自组装单层(SAM)进行处理。 因此,当进行连续沉积操作时,有机材料不会堆叠在诸如角度限制板或角度调节板的结构上。