专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090297404A1 PLASMA REACTOR WITH HIGH SPEED PLASMA IMPEDANCE TUNING BY MODULATION OF SOURCE POWER OR BIAS POWER 审中-公开
标题翻译：具有高速等离子体阻抗调节的等离子体反应器通过调节源功率或偏置功率
公开(公告)号：US20090297404A1
公开(公告)日：2009-12-03
申请号：US12129202
申请日：2008-05-29
申请人： STEVEN C. SHANNON , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
发明人： STEVEN C. SHANNON , Kartik Ramaswamy , Daniel J. Hoffman , Matthew L. Miller , Kenneth S. Collins
IPC分类号： G05D17/00
CPC分类号： H01J37/32935 , H01J37/32082 , H01J37/32183
摘要： A plasma reactor, having source and bias RF power generators of different frequencies, is provided with a controller responsive to fluctuations in plasma load impedance measured at one of the generators to modulate the output of the other generator to compensate for the fluctuations.
摘要翻译：具有不同频率的源极和偏置RF功率发生器的等离子体反应器设置有响应于在一个发生器处测量的等离子体负载阻抗的波动的控制器，以调制另一发生器的输出以补偿波动。

2. 发明申请

US20100013572A1 APPARATUS FOR MULTIPLE FREQUENCY POWER APPLICATION 有权
标题翻译：多种频率功率应用的设备
公开(公告)号：US20100013572A1
公开(公告)日：2010-01-21
申请号：US12506658
申请日：2009-07-21
申请人： STEVEN C. SHANNON , JANG GYOO YANG , MATTHEW L. MILLER , KARTIK RAMASWAMY , JAMES P. CRUSE
发明人： STEVEN C. SHANNON , JANG GYOO YANG , MATTHEW L. MILLER , KARTIK RAMASWAMY , JAMES P. CRUSE
IPC分类号： H03H7/38
CPC分类号： H03H7/38
摘要： Apparatus and methods are provided for a power matching apparatus for use with a processing chamber. In one aspect of the invention, a power matching apparatus is provided including a first RF power input coupled to a first adjustable capacitor, a second RF power input coupled to a second adjustable capacitor, a power junction coupled to the first adjustable capacitor and the second adjustable capacitor, a receiver circuit coupled to the power junction, a high voltage filter coupled to the power junction and the high voltage filter has a high voltage output, a voltage/current detector coupled to the power junction and a RF power output connected to the voltage/current detector.
摘要翻译：提供了用于与处理室一起使用的功率匹配装置的装置和方法。在本发明的一个方面，提供了一种功率匹配装置，其包括耦合到第一可调电容器的第一RF功率输入端，耦合到第二可调电容器的第二RF功率输入端，耦合到第一可调电容器的功率端，耦合到功率结的接收器电路，耦合到功率结的高电压滤波器和高压滤波器具有高电压输出，耦合到功率结的电压/电流检测器和连接到功率结的RF功率输出电压/电流检测器。

3. 发明申请

US20080087381A1 MATCHING NETWORK CHARACTERIZATION USING VARIABLE IMPEDANCE ANALYSIS 失效
标题翻译：使用可变阻抗分析匹配网络特征
公开(公告)号：US20080087381A1
公开(公告)日：2008-04-17
申请号：US11536197
申请日：2006-09-28
申请人： STEVEN C. SHANNON , Daniel J. Hoffman , Steven Lane , Walter R. Merry , Jivko Dinev
发明人： STEVEN C. SHANNON , Daniel J. Hoffman , Steven Lane , Walter R. Merry , Jivko Dinev
IPC分类号： C23F1/00
CPC分类号： H03H7/38 , H03H11/28
摘要： Embodiments of a method of calculating the equivalent series resistance of a matching network using variable impedance analysis and matching networks analyzed using the same are provided herein. In one embodiment, a method of calculating the equivalent series resistance of a matching network includes the steps of connecting the matching network to a load; measuring an output of the matching network over a range of load impedances; and calculating the equivalent series resistance of the matching network based upon a relationship between the measured output and the load resistance. The load may be a surrogate load or may be a plasma formed in a process chamber.
摘要翻译：本文提供了使用可变阻抗分析和使用其分析的匹配网络来计算匹配网络的等效串联电阻的方法的实施例。在一个实施例中，计算匹配网络的等效串联电阻的方法包括将匹配网络连接到负载的步骤; 在一定范围的负载阻抗上测量匹配网络的输出; 并根据测量输出与负载电阻之间的关系计算匹配网络的等效串联电阻。负载可以是替代负载，也可以是在处理室中形成的等离子体。

4. 发明申请

US20070294043A1 METHOD FOR DETERMINING PLASMA CHARACTERISTICS 失效
标题翻译：用于确定等离子体特性的方法
公开(公告)号：US20070294043A1
公开(公告)日：2007-12-20
申请号：US11617802
申请日：2006-12-29
申请人： STEVEN C. SHANNON , Daniel J. Hoffman , Jeremiah T.P. Pender , Tarreg Mawari
发明人： STEVEN C. SHANNON , Daniel J. Hoffman , Jeremiah T.P. Pender , Tarreg Mawari
IPC分类号： G06F19/00
CPC分类号： H05H1/0081 , H01J37/32174 , H01J37/32935 , H01L21/67005
摘要： Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of a plasma at two different frequencies, and determining at least one characteristic of the plasma utilizing the metrics. In another embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage information for first and second waveforms coupled to a plasma at different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform. In another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, and determining at least one characteristic of a plasma using model.
摘要翻译：提供了确定等离子体特性的方法。在一个实施例中，用于确定等离子体特性的方法包括以两个不同的频率获得等离子体的度量，以及使用该度量来确定等离子体的至少一个特性。在另一个实施例中，一种用于确定等离子体特性的方法包括获得与不同频率耦合到等离子体的第一波形和第二波形的电流和电压信息的度量，使用从每个不同频率波形获得的度量来确定等离子体的至少一个特性。在另一个实施例中，该方法包括提供作为频率的函数的等离子体的等离子体阻抗模型，以及使用模型确定等离子体的至少一个特性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式