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1. 发明申请

US20210249451A1 METHOD OF FABRICATING CONDUCTIVE PATTERN, DISPLAY DEVICE, AND METHOD OF FABRICATING DISPLAY DEVICE 有权
公开(公告)号：US20210249451A1
公开(公告)日：2021-08-12
申请号：US17003524
申请日：2020-08-26
申请人： Samsung Display Co., LTD.
发明人： Jae Uoon KIM , Hong Sick PARK , Jong Hyun CHOUNG
IPC分类号： H01L27/12 , H01L27/32
摘要： A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

2. 发明申请

US20180157098A1 SUBSTRATE, DISPLAY DEVICE INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE DISPLAY DEVICE 审中-公开
公开(公告)号：US20180157098A1
公开(公告)日：2018-06-07
申请号：US15625397
申请日：2017-06-16
申请人： Samsung Display Co., Ltd.
发明人： Jong Hyun CHOUNG , Hong Sick PARK , Seung Bae KANG , Ki Tae KIM , Joon Woo BAE , Hee Sung YANG
IPC分类号： G02F1/1335
CPC分类号： G02F1/133512 , G02F1/133502 , G02F1/133514 , G02F1/133516 , G02F1/133528 , G02F1/133553 , G02F1/133621 , G02F2001/133357 , G02F2001/133548 , G02F2001/133557 , G02F2001/133614 , G02F2201/121 , G02F2201/123 , G02F2201/50 , G02F2202/36 , G02F2203/01 , G02F2203/055
摘要： There is provided a display device. The display device includes a first substrate, a second substrate that faces the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. One of the first substrate and the second substrate includes a base substrate and a light blocking pattern disposed on a surface that faces the other surface of both surfaces of the base substrate, the light blocking pattern exposing a part of the base substrate. The light blocking pattern includes a semi-transmission reflective layer a disposed on the base substrate, a phase matching layer disposed on the semi-transmission reflective layer, and a reflective metal layer disposed on the phase matching layer. The phase matching layer and the reflective metal layer include materials having substantially the same etching rate.

3. 发明公开

US20230292550A1 DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME 审中-公开
公开(公告)号：US20230292550A1
公开(公告)日：2023-09-14
申请号：US17975809
申请日：2022-10-28
申请人： Samsung Display Co., LTD.
发明人： Hyoung Sik KIM , Jong Hee PARK , Hong Sick PARK , Woo Jin CHO
IPC分类号： H01L27/32 , H01L51/56 , H01L27/12
CPC分类号： H01L27/3262 , H01L27/3223 , H01L27/3276 , H01L51/56 , H01L27/124 , H01L2227/323
摘要： A display device includes: a substrate; a thin-film transistor disposed on the substrate and including a semiconductor layer; an interlayer insulating layer disposed on the thin-film transistor; a data conductive layer disposed on the interlayer insulating layer and including an auxiliary electrode and a transistor electrode connected to the semiconductor layer of the thin-film transistor, a via layer disposed on the data conductive layer; a pixel electrode layer disposed on the via layer and including: a pixel electrode and a dummy pixel electrode separated from the pixel electrode; an intermediate layer disposed on the pixel electrode layer; and a common electrode disposed on the intermediate layer. The auxiliary electrode includes a main conductive layer and an upper sub-conductive layer. Side surfaces of the main conductive layer of the auxiliary electrode are disposed inner than side surfaces of the upper sub-conductive layer of the auxiliary electrode.

4. 发明申请

US20150220202A1 TOUCH SCREEN PANEL AND MANUFACTURING METHOD THEREOF 有权
标题翻译：触摸屏面板及其制造方法
公开(公告)号：US20150220202A1
公开(公告)日：2015-08-06
申请号：US14466673
申请日：2014-08-22
申请人： Samsung Display Co., Ltd.
发明人： Jong-Hyun CHOUNG , In-Bae KIM , Hong Sick PARK , Byeong-Jin LEE
IPC分类号： G06F3/041 , G06F3/044
CPC分类号： G06F3/0416 , G06F3/044 , G06F2203/04103 , G06F2203/04111
摘要： A touch screen panel and manufacturing method thereof are disclosed. In one aspect, the touch screen panel includes a substrate having a touch area and a peripheral area that surrounds the touch area and a plurality of first touch electrode patterns that are formed in the touch area, extend in a first direction, and are configured to transmit a first touch signal. The touch panel also includes a plurality of second touch electrode patterns that are formed in the touch area, extend in a second direction crossing the first direction, and are configured to transmit a second touch signal and a plurality of first driving circuit wirings that are formed in the peripheral area and are respectively electrically connected to the first touch electrode patterns. The first driving circuit wirings include a low resistance wiring layer.
摘要翻译：公开了触摸屏面板及其制造方法。一方面，触摸屏面板包括具有触摸区域和围绕触摸区域的周边区域的基板和形成在触摸区域中的多个第一触摸电极图案，沿第一方向延伸，并且被配置为发送第一触摸信号。触摸面板还包括形成在触摸区域中的多个第二触摸电极图案，沿与第一方向交叉的第二方向延伸，并且被配置为传输形成的第二触摸信号和多个第一驱动电路布线并且分别电连接到第一触摸电极图案。第一驱动电路布线包括低电阻布线层。

5. 发明申请

US20140204300A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF 有权
标题翻译：显示装置及其制造方法
公开(公告)号：US20140204300A1
公开(公告)日：2014-07-24
申请号：US13961793
申请日：2013-08-07
申请人： Samsung Display Co., Ltd.
发明人： Hong Sick PARK , Seon-Il KIM , Min Ho MOON , Hyang-Shik KONG , Yeun Tae KIM , Chang Oh JEONG
IPC分类号： G02F1/1362
CPC分类号： G02F1/13458 , G02F1/133305 , G02F1/133377 , G02F1/1341 , G02F1/136286 , G02F1/1368
摘要： The present invention relates to a display device and a manufacturing method thereof, wherein a spoilage layer generated in a manufacturing process is removed, and a manufacturing method of a display device according to an exemplary embodiment of the present invention includes: forming a thin film transistor on a substrate including a plurality of pixel areas; forming a pixel electrode connected to the thin film transistor in the pixel area; forming a sacrificial layer on the pixel electrode; forming a barrier layer on the sacrificial layer; forming a common electrode on the barrier layer; forming a roof layer on the common electrode; patterning the barrier layer, the common electrode, and the roof layer to exposed a portion of the sacrificial layer thereby forming an injection hole; removing the sacrificial layer to form a microcavity for a plurality of pixel areas; removing the barrier layer.
摘要翻译：本发明涉及一种显示装置及其制造方法，其中在制造过程中产生的腐败层被去除，并且根据本发明的示例性实施例的显示装置的制造方法包括：形成薄膜晶体管在包括多个像素区域的基板上; 在所述像素区域中形成连接到所述薄膜晶体管的像素电极; 在像素电极上形成牺牲层; 在牺牲层上形成阻挡层; 在阻挡层上形成公共电极; 在公共电极上形成屋顶层; 图案化阻挡层，公共电极和屋顶层，以暴露部分牺牲层，从而形成注入孔; 去除所述牺牲层以形成用于多个像素区域的微腔; 去除阻挡层。

6. 发明申请

US20190333435A1 WIRING SUBSTRATE, DISPLAY DEVICE INCLUDING THE WIRING SUBSTRATE, AND METHOD OF FABRICATING THE WIRING SUBSTRATE 审中-公开
公开(公告)号：US20190333435A1
公开(公告)日：2019-10-31
申请号：US16384821
申请日：2019-04-15
申请人： Samsung Display Co., Ltd.
发明人： Hyun Eok SHIN , Hong Sick PARK , Gyung Min BAEK , Sang Woo SOHN , Sang Won SHIN , Ju Hyun LEE
IPC分类号： G09G3/20 , H01L51/52 , H01L27/32
摘要： A display device may include a base and a first wiring layer disposed on the base. The first wiring layer may include a first material and a second material layer that overlap each other. A material of the second material layer may be different from a material of the first material layer. The second material layer contains MoOx, wherein 1.9≤x≤2.1.

7. 发明申请

US20140322845A1 DEVICE FOR MONITORING LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY 有权
标题翻译：用于监测液晶显示的装置和用于制造液晶显示的方法
公开(公告)号：US20140322845A1
公开(公告)日：2014-10-30
申请号：US13962366
申请日：2013-08-08
申请人： Samsung Display Co., Ltd.
发明人： Seon Uk LEE , Won Tae KIM , Min Ho MOON , Hong Sick PARK , Sung Hwan WON , You Young JIN
IPC分类号： G02F1/13
CPC分类号： H01L27/1248 , G02F1/1309 , H01L27/1259
摘要： A device for monitoring a liquid crystal display includes: a substrate including a display region and a non-display region disposed at an edge of the display region. The display region includes: a thin film transistor disposed on the substrate, a pixel electrode disposed on the substrate and connected to the thin film transistor, a first sacrificial layer disposed on the pixel electrode, and a roof layer disposed on the sacrificial layer. The non-display region includes: a second sacrificial layer disposed on the substrate, and the roof layer disposed on the second sacrificial layer. The first sacrificial layer has a first longitudinal dimension and a first cross-sectional area, and the second sacrificial layer has a second longitudinal dimension and a second cross-sectional area. The first cross-sectional area is the same as the second cross-sectional area. The second longitudinal dimension is greater than the first longitudinal dimension.
摘要翻译：用于监视液晶显示器的装置包括：基板，包括设置在显示区域的边缘处的显示区域和非显示区域。显示区域包括：设置在基板上的薄膜晶体管，设置在基板上并连接到薄膜晶体管的像素电极，设置在像素电极上的第一牺牲层和设置在牺牲层上的屋顶层。非显示区域包括：设置在基板上的第二牺牲层，以及设置在第二牺牲层上的屋顶层。第一牺牲层具有第一纵向尺寸和第一横截面积，并且第二牺牲层具有第二纵向尺寸和第二横截面面积。第一截面积与第二横截面积相同。第二纵向尺寸大于第一纵向尺寸。

8. 发明申请

US20140125904A1 LIQUID CRYSTAL DISPLAY 有权
标题翻译：液晶显示器
公开(公告)号：US20140125904A1
公开(公告)日：2014-05-08
申请号：US14046326
申请日：2013-10-04
申请人： Samsung Display Co., Ltd.
发明人： Jong-Hyun CHOUNG , Wang Woo LEE , Bong-Kyun KIM , In-Bae KIM , Seol-Il KIM , Young Min MOON , Hong Sick PARK , Ki Tae KIM
IPC分类号： G02F1/1368
CPC分类号： G02F1/133345 , G02F1/133707 , G02F1/134363 , G02F1/136259 , G02F1/1368 , G02F2001/134372 , G02F2001/136231 , G02F2001/136295 , G02F2201/124 , H01L27/1225
摘要： A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.
摘要翻译：液晶显示器包括：基板; 设置在基板上的栅极线和数据线; 设置在所述基板上的半导体层; 设置在基板上的第一和第二场产生电极; 以及由与第一场产生电极相同的层形成并覆盖数据线的至少一部分的第一保护层。

9. 发明申请

US20140011352A1 METAL WIRE ETCHANT AND METHOD OF FORMING METAL WIRE USING THE SAME 有权
标题翻译：金属线材和使用该金属线形成金属线的方法
公开(公告)号：US20140011352A1
公开(公告)日：2014-01-09
申请号：US13728463
申请日：2012-12-27
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： Jong-Hyun CHOUNG , In-Bae KIM , Seon-Il KIM , Hong Sick PARK , Jae Woo JEONG , Gyu-Po KIM , Won-Guk SEO , Hyun-Cheol SHIN , Ki-Beom LEE , Sam-Young CHO , Seung-Yeon HAN
IPC分类号： C23F1/18 , H01L21/48
CPC分类号： C23F1/18 , C23F1/26 , H01L21/4814
摘要： A metal wire etchant including persulfate, a sulfonate, a fluorine compound, an azole-based compound, an organic acid, a nitrate, and a chlorine compound, and a method of making the same.
摘要翻译：包括过硫酸盐，磺酸盐，氟化合物，唑类化合物，有机酸，硝酸盐和氯化合物的金属线蚀刻剂及其制备方法。

10. 发明申请

US20230116992A1 METHOD OF FABRICATING CONDUCTIVE PATTERN, DISPLAY DEVICE, AND METHOD OF FABRICATING DISPLAY DEVICE 有权
公开(公告)号：US20230116992A1
公开(公告)日：2023-04-20
申请号：US18084274
申请日：2022-12-19
申请人： Samsung Display Co., LTD.
发明人： Jae Uoon KIM , Hong Sick PARK , Jong Hyun CHOUNG
IPC分类号： H01L27/12 , H10K59/123 , H10K59/131
摘要： A method of fabricating a conductive pattern includes forming a conductive metal material layer and a conductive capping material layer on a substrate, forming a photoresist pattern as an etching mask on the conductive capping material layer, forming a first conductive capping pattern by etching the conductive capping material layer with a first etchant, forming a conductive metal layer and a second conductive capping pattern by etching the conductive metal material layer and the first conductive capping pattern with a second etchant, and forming a conductive capping layer by etching the second conductive capping pattern with a third etchant. The second conductive capping pattern includes a first region overlapping the conductive metal layer and a second region not overlapping the conductive metal layer, and the forming of the conductive capping layer includes etching the second region of the second conductive capping pattern to form the conductive capping layer.

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