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    • 2. 发明授权
    • High voltage operating field effect transistor, and bias circuit therefor and high voltage circuit thereof
    • 高电压工作场效应晶体管及其偏置电路及其高电压电路
    • US07432568B2
    • 2008-10-07
    • US11063468
    • 2005-02-22
    • Yutaka HayashiHisashi HasegawaYoshifumi YoshidaJun Osanai
    • Yutaka HayashiHisashi HasegawaYoshifumi YoshidaJun Osanai
    • H01L29/76
    • H01L29/4238
    • A high voltage operating field effect transistor has a substrate, a semiconductor channel formation region disposed in a surface of the substrate, a source region and a drain region which are spaced apart from each other with the semiconductor channel formation region disposed between the source region and the drain region, a gate insulating film region disposed on the semiconductor channel formation region, a resistive gate region disposed on the gate insulating film region, a source side electrode disposed on a source region end portion side of the resistive gate region, and a drain side electrode disposed on a drain region end portion side of the resistive gate region. A signal electric potential is supplied to the source side electrode, and a bias electric potential an absolute value of which is equal to or larger than that of a specified electric potential and which changes according to an increase or decrease in a drain electric potential is supplied to the drain side electrode.
    • 高电压工作场效应晶体管具有衬底,设置在衬底的表面中的半导体沟道形成区域,源极区域和漏极区域,其中半导体沟道形成区域设置在源极区域和源极区域之间, 漏极区域,设置在半导体沟道形成区域上的栅极绝缘膜区域,设置在栅极绝缘膜区域上的电阻栅极区域,设置在电阻栅极区域的源极区域端部侧的源极侧电极,以及漏极区域 设置在电阻栅极区域的漏区端部侧的侧面电极。 信号电位被提供给源极电极,并且提供绝对值等于或大于指定电位并且根据漏极电位的增加或减小而变化的偏置电位 到漏极侧电极。
    • 5. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07002235B2
    • 2006-02-21
    • US10395675
    • 2003-03-24
    • Hisashi Hasegawa
    • Hisashi Hasegawa
    • H01L27/01H01L29/00
    • H01L28/20H01L21/84H01L27/1203H01L27/13
    • A semiconductor device has a semiconductor support substrate, a buried insulation film disposed on the semiconductor support substrate, and a single-crystal silicon active layer disposed on the buried insulation film. The buried insulation film has portions which have been removed so that remaining portions of the buried insulating film form buried insulating film island regions. The single-crystal silicon active layer has portions which have been removed so that remaining portions of the single-crystal silicon active layer form single-crystal silicon active layer island regions defining single-crystal silicon resistors of a resistance circuit.
    • 半导体器件具有半导体支撑衬底,设置在半导体支撑衬底上的掩埋绝缘膜和设置在掩埋绝缘膜上的单晶硅有源层。 掩埋绝缘膜具有已经被去除的部分,使得埋入绝缘膜的剩余部分形成掩埋绝缘膜岛区域。 单晶硅有源层具有被去除的部分,使得单晶硅有源层的剩余部分形成限定电阻电路的单晶硅电阻器的单晶硅有源层岛状区域。
    • 6. 发明申请
    • Semiconductor device and method therefore
    • 因此,半导体器件和方法
    • US20060035421A1
    • 2006-02-16
    • US11209057
    • 2005-08-22
    • Hisashi Hasegawa
    • Hisashi Hasegawa
    • H01L21/84H01L21/8244H01L21/8238
    • H01L28/20H01L21/84H01L27/1203H01L27/13
    • Where the silicon active layer of an SOI substrate is used as a resistor, it is difficult to form small wells densely in a semiconductor support substrate portion under the resistor because of the presence of a buried insulation film. It is also difficult to control the potential division of the wells. Therefore, there is the problem that the resistance value is varied by potential variations. Island-like silicon active layer and buried insulation film are formed by etching. Side spacers made of polycrystalline silicon are formed on the sidewalls of step portions of the island-like silicon active layer, buried insulation film, and semiconductor support substrate. The potentials at the side spacers are controlled. Thus, resistance value variations due to variations in the potential difference between the semiconductor support substrate and the resistor can be suppressed. Furthermore, accurate potential division owing to each resistor is facilitated.
    • 在SOI衬底的硅有源层用作电阻器的情况下,由于存在掩埋绝缘膜,难以在电阻器下面的半导体支撑衬底部分中密集地形成小孔。 也难以控制井的潜在分配。 因此,存在电阻值随电位变化而变化的问题。 岛状硅有源层和掩埋绝缘膜通过蚀刻形成。 在岛状硅有源层,埋入绝缘膜和半导体支撑基板的台阶部分的侧壁上形成由多晶硅制成的侧面间隔物。 控制侧面间隔物的电位。 因此,可以抑制由于半导体支撑衬底和电阻器之间的电位差的变化引起的电阻值变化。 此外,由于每个电阻器的精确电位分配便利。
    • 9. 发明授权
    • Filled paper
    • 填充纸
    • US4240870A
    • 1980-12-23
    • US74317
    • 1979-09-11
    • Hiroji ShibazakiSetsuji EdagawaHisashi Hasegawa
    • Hiroji ShibazakiSetsuji EdagawaHisashi Hasegawa
    • C09C1/00C09C1/02D21H17/67D21H3/78
    • D21H17/675
    • The filled paper is filled with at least one of (i) a calcium carbonate in the form of particles comprising a core about 0.5 to about 6.5 .mu.m in average diameter and about 100 to about 4000 projections formed on the surface of the core and having a length (L) of about 0.25 to about 2.00 .mu.m, a diameter (D) of about 0.08 to about 0.20 .mu.m and an aspect ratio (L/D) of about 3 to about 10, the calcium carbonate having a void volume of about 1.0 to about 1.8 ml/g and an oil absorption of about 45 to about 60 ml/100 g, and (ii) a calcium carbonate in the form of particles comprising a core about 0.2 to about 2.0 .mu.m in average diameter and about 100 to about 4000 projections formed on the surface of the core and having a length (L) of about 0.15 to about 4.00 .mu.m, a diameter (D) of about 0.05 to about 0.20 .mu.m and an aspect ratio (L/D) of about 3 to about 20, the calcium carbonate having a void volume of about 1.8 to about 3.3 ml/g and an oil absorption of about 50 to about 100 ml/100 g.The paper has increased stiffness and enhanced opacity with reduced weight.
    • 填充的纸填充有以下中的至少一种:(i)颗粒形式的碳酸钙,其包含平均直径约0.5至约6.5μm的芯和在芯的表面上形成的约100至约4000个突起,并且具有 约0.25至约2.00μm的长度(L),约0.08至约0.20μm的直径(D)和约3至约10的纵横比(L / D),所述碳酸钙具有空隙体积 约1.0至约1.8ml / g,吸油量为约45至约60ml / 100g,和(ii)包含平均直径为约0.2至约2.0μm的芯颗粒形式的碳酸钙,以及 在芯的表面上形成约100至约4000个突起,其长度(L)为约0.15至约4.00μm,直径(D)为约0.05至约0.20μm,纵横比(L / D )为约3至约20,碳酸钙具有约1.8至约3.3ml / g的空隙体积和约50至约100ml / 100的吸油量 G。 该纸具有增加的刚度和增强的不透明度,减轻重量。