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1. 发明公开

US20230194990A1 PHOTORESIST UNDERLAYER COMPOSITION 审中-公开
公开(公告)号：US20230194990A1
公开(公告)日：2023-06-22
申请号：US18076475
申请日：2022-12-07
申请人： Rohm and Haas Electronic Materials LLC
发明人： Iou-Sheng KE , Anton CHAVEZ , Shintaro YAMADA
IPC分类号： G03F7/11 , C09D165/02 , H01L21/027
CPC分类号： G03F7/11 , C09D165/02 , H01L21/0274
摘要： A method of forming a pattern, the method comprising: applying a photoresist underlayer composition over a substrate to provide a photoresist underlayer; forming a photoresist layer over the photoresist underlayer; patterning the photoresist layer; and transferring a pattern from the patterned photoresist layer to the photoresist underlayer. The photoresist underlayer composition includes a polymer that includes a repeating unit represented by Formula 1 as described herein, a compound including a substituent group represented by Formula 2 as described herein, and a solvent.

2. 发明申请

US20210341840A1 COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES 有权
公开(公告)号：US20210341840A1
公开(公告)日：2021-11-04
申请号：US17231417
申请日：2021-04-15
申请人： Rohm and Haas Electronic Materials LLC
发明人： Sheng Liu , James F. Cameron , Shintaro YAMADA , Iou-Sheng KE , Keren ZHANG , Suzanne M. Coley , Li Cui , Paul J. LaBeaume , Deyan Wang
IPC分类号： G03F7/11 , G03F7/09 , G03F7/075 , G03F7/20 , G03F7/16 , C09D7/47 , C09D7/63 , C09D4/06
摘要： Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1) wherein at least two substituents of formula (1) are attached to the aromatic core; and wherein: Ar1 is chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, and a C4-30 fused heteroocyclic aromatic ring system; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(═O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(═O)—R1, and S(═O)2—R1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar1; and * denotes the point of attachment to the core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

3. 发明申请

US20150315333A1 AROMATIC RESINS FOR UNDERLAYERS 有权
标题翻译：底漆的芳香树脂
公开(公告)号：US20150315333A1
公开(公告)日：2015-11-05
申请号：US14701463
申请日：2015-04-30
申请人： Rohm and Haas Electronic Materials LLC , Rohm and Haas Electronic Materials Korea Ltd.
发明人： Seon-Hwa HAN , Sung Wook CHO , Hae-Kwang PYUN , Hae-Kwang Pyun , Jung-June LEE , Shintaro YAMADA
IPC分类号： C08G61/12 , G03F7/16 , G03F7/11 , G03F7/32 , G03F7/34 , C09D165/00 , G03F7/20
CPC分类号： C08G61/128 , C08G61/02 , C08G61/12 , C08G2261/12 , C08G2261/135 , C08G2261/1422 , C08G2261/314 , C08G2261/3424 , C08G2261/76 , C08G2261/90 , C09D165/00 , G03F7/0752 , G03F7/09 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36 , G03F7/40 , G03F7/405
摘要： Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
摘要翻译：某些芳族醇与某些二芳基取代的脂族醇的聚合反应产物可用作半导体制造工艺中的底层。

4. 发明申请

US20160048077A1 HARDMASK 有权
公开(公告)号：US20160048077A1
公开(公告)日：2016-02-18
申请号：US14925147
申请日：2015-10-28
申请人： Rohm and Haas Electronic Materials LLC
发明人： Shintaro YAMADA , Deyan WANG , Sabrina WONG , Cong LIU , Cheng-Bai XU
IPC分类号： G03F7/09 , G03F7/20 , G03F7/16
CPC分类号： G03F7/091 , C08G79/00 , C08K5/0091 , C08K5/56 , C09B57/10 , C09B69/10 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/40 , H01L21/027 , H01L21/0332
摘要： This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.

5. 发明申请

US20150185620A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS 有权
标题翻译：光电子图案修剪组合物和方法
公开(公告)号：US20150185620A1
公开(公告)日：2015-07-02
申请号：US14586945
申请日：2014-12-30
申请人： Rohm and Haas Electronic Materials LLC
发明人： Cong LIU , Seung-Hyun LEE , Kevin ROWELL , Gerhard POHLERS , Cheng-Bai XU , Wenyan YIN , Thomas A. ESTELLE , Shintaro YAMADA
IPC分类号： G03F7/40
CPC分类号： G03F7/405 , G03F7/0392
摘要： Provided are compositions and methods for trimming a photoresist pattern. The photoresist pattern trimming composition comprises: a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R1 is chosen from hydrogen, fluorine, C1-C3 alkyl and C1-C3 fluoroalkyl; R2 is chosen from C1-C15 alkylene; and R3 is chosen from C1-C3 fluoroalkyl; an aromatic acid that is free of fluorine; and a solvent. The compositions and methods find particular applicability in the manufacture of semiconductor devices.
摘要翻译：提供了用于修整光致抗蚀剂图案的组合物和方法。光致抗蚀剂图案修剪组合物包括：基质聚合物，其包含由以下通式（I）的单体形成的单元：其中：R 1选自氢，氟，C 1 -C 3烷基和C 1 -C 3氟代烷基; R2选自C1-C15亚烷基; 并且R 3选自C 1 -C 3氟代烷基; 不含氟的芳香族酸; 和溶剂。组合物和方法在半导体器件的制造中具有特别的适用性。

6. 发明申请

US20140206201A1 HARDMASK SURFACE TREATMENT 有权
标题翻译： HARDMASK表面处理
公开(公告)号：US20140206201A1
公开(公告)日：2014-07-24
申请号：US13745753
申请日：2013-01-19
申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人： Deyan WANG , Peter TREFONAS, III , Shintaro YAMADA , Kathleen M. O'Connell
IPC分类号： H01L21/033
CPC分类号： H01L21/0332 , C08G77/58 , C08K5/0091 , C08K5/56 , C08L33/064 , C08L33/066 , C09D133/064 , C09D133/066 , C09D183/14 , G03F1/00
摘要： Compositions suitable for forming oxymetal hardmask layers are provided. Methods of forming oxymetal hardmask layers using such compositions are also provided, where the surface of the oxymetal hardmask layer formed has a water contact angle substantially matched to that of subsequently applied organic coatings.
摘要翻译：提供适合于形成氧化金属硬掩模层的组合物。还提供了使用这种组合物形成氧化金属硬掩模层的方法，其中形成的氧化金属硬掩模层的表面与随后施加的有机涂层的水接触角基本匹配。

7. 发明申请

US20210343522A1 COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES 有权
公开(公告)号：US20210343522A1
公开(公告)日：2021-11-04
申请号：US17231339
申请日：2021-04-15
申请人： Rohm and Haas Electronic Materials LLC
发明人： Sheng Liu , James F. CAMERON , Iou-Sheng KE , Shintaro YAMADA , Li CUI
IPC分类号： H01L21/027 , C09D163/00 , G03F7/11 , G03F7/00 , G03F7/09 , G03F7/075
摘要： Coating compositions comprise: a B-staged reaction product of one or more compounds comprising: a core chosen from C6-50 carbocyclic aromatic, C2-50 heterocyclic aromatic, C1-20 aliphatic, C1-20 heteroaliphatic, C3-20 cycloaliphatic, and C2-20 heterocycloaliphatic, each of which may be substituted or unsubstituted; and two or more substituents of formula (1) attached to the core: wherein: Ar1 is an aromatic group independently chosen from C6-50 carbocyclic aromatic and C2-50 heteroaromatic, each of which may be substituted or unsubstituted; Z is a substituent independently chosen from OR1, protected hydroxyl, carboxyl, protected carboxyl, SR1, protected thiol, —O—C(═O)—C1-6 alkyl, halogen, and NHR2; wherein each R1 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, and C5-30 aryl; each R2 is independently chosen from H, C1-10 alkyl, C2-10 unsaturated hydrocarbyl, C5-30 aryl, C(═O)—R1, and S(═O)2—R1; x is an integer from 1 to the total number of available aromatic ring atoms in Ar1; and * denotes the point of attachment to the core; provided that when the core comprises an aromatic ring, no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition. Coated substrates formed with the coating compositions and methods of forming electronic devices using the compositions are also provided. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

8. 发明申请

US20170073453A1 AROMATIC RESINS FOR UNDERLAYERS 有权
标题翻译：底漆的芳香树脂
公开(公告)号：US20170073453A1
公开(公告)日：2017-03-16
申请号：US15363114
申请日：2016-11-29
申请人： Rohm and Haas Electronic Materials LLC , Rohm and Haas Electronic Materials Korea Ltd.
发明人： Li CUI , Sung Wook CHO , Mingqi LI , Shintaro YAMADA , Peter TREFONAS, III , Robert L. AUGER
IPC分类号： C08G8/04 , G03F7/16 , G03F7/09 , G03F7/26 , C09D161/06 , H01L21/311 , G03F7/20
CPC分类号： C08G8/04 , C08G8/08 , C09D161/06 , G03F7/091 , G03F7/094 , G03F7/16 , G03F7/168 , G03F7/2002 , G03F7/26 , H01L21/31111 , H01L21/31144
摘要： Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
摘要翻译：某些芳族醇与某些芳族醛的聚合反应产物可用作半导体制造工艺中的底层。

9. 发明申请

US20150166711A1 AROMATIC RESINS FOR UNDERLAYERS 有权
标题翻译：底漆的芳香树脂
公开(公告)号：US20150166711A1
公开(公告)日：2015-06-18
申请号：US14569610
申请日：2014-12-12
申请人： Rohm and Haas Electronic Materials LLC , Rohm and Haas Electronic Materials Korea Ltd.
发明人： Li CUI , Sung Wook CHO , Mingqi LI , Shintaro YAMADA , Peter TREFONAS, III , Robert L. AUGER
IPC分类号： C08G8/04 , H01L21/311
CPC分类号： C08G8/04 , C08G8/08 , C09D161/06 , G03F7/091 , G03F7/094 , G03F7/16 , G03F7/168 , G03F7/2002 , G03F7/26 , H01L21/31111 , H01L21/31144
摘要： Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.
摘要翻译：某些芳族醇与某些芳族醛的聚合反应产物可用作半导体制造工艺中的底层。

10. 发明申请

US20150064612A1 HARDMASK 有权
公开(公告)号：US20150064612A1
公开(公告)日：2015-03-05
申请号：US14017281
申请日：2013-09-03
申请人： Rohm and Haas Electronic Materials LLC
发明人： Shintaro YAMADA , Deyan WANG , Sabrina WONG , Cong LIU , Cheng-Bai XU
IPC分类号： G03F1/00
CPC分类号： G03F7/091 , C08G79/00 , C08K5/0091 , C08K5/56 , C09B57/10 , C09B69/10 , G03F7/16 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/40 , H01L21/027 , H01L21/0332
摘要： This invention provides a composition containing an organometallic compound having a chromophore moiety in the metal polymer backbone which allows a wider range of n/k values such that substrate reflectivity can be controlled under various conditions.
摘要翻译：本发明提供一种组合物，其含有在金属聚合物骨架中具有发色团部分的有机金属化合物，其允许更宽范围的n / k值，使得可以在各种条件下控制衬底反射率。

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