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1. 发明申请

US20070259126A1 Method for the Production of Thin Dense Ceramic Layers 审中-公开
标题翻译：薄密陶瓷层的生产方法
公开(公告)号：US20070259126A1
公开(公告)日：2007-11-08
申请号：US11662787
申请日：2005-08-04
申请人： Robert Vassen , Dag Hathiramani , Deltev Stover
发明人： Robert Vassen , Dag Hathiramani , Deltev Stover
IPC分类号： C23C4/02
CPC分类号： C04B41/009 , C04B41/52 , C04B41/89 , C23C4/02 , C23C4/123 , C23C4/134 , H01M8/1246 , H01M2008/1293 , Y02E60/525 , Y02P70/56 , C04B41/4527 , C04B41/5037 , C04B41/0072 , C04B41/5044 , C04B35/83 , C04B35/80
摘要： The invention relates to a method for the production of a thin dense ceramic layer on a substrate by means of atmospheric plasma spraying, whereby the following steps are carried out: a) the substrate is pre-heated to a temperature corresponding to at least a quarter of the melting point of the ceramic for application in Kelvin, b) a ceramic powder or a ceramic powder mixture with d50-values of less than 50 gm is used as spray adjunct, c) particle speeds at incidence on the substrate of more than 200 m/s are set, d) particle temperatures are set such that on incidence on the substrate surface the particles have a temperature at least 5% above the melting point of the ceramic for application in Kelvin, e) the amount of the spray adjunct and passage speed of the plasma burner are set such that on a single pass of the substrate a layer thickness of less than 100 ?m is achieved, f) a thin and also gas-tight layer is generated on the substrate with a single pass of the substrate which has a leakage rate of less than 10−1 mbar L/(cm2 s).
摘要翻译：本发明涉及通过大气等离子体喷涂在衬底上生产薄的致密陶瓷层的方法，由此进行以下步骤：a）将衬底预加热至相当于至少四分之一的温度用于开尔文的陶瓷熔点b）陶瓷粉末或陶瓷粉末混合物，其中d <50％小于50gm作为喷雾助剂，c）颗粒速度在设置衬底上的超过200m / s的入射率，d）设定颗粒温度，使得在基底表面上入射时，颗粒的温度比用于开尔文的陶瓷的熔点至少高5％，e ）等离子体燃烧器的喷雾辅助和通过速度的量被设定为使得在基板的单次通过时实现小于100μm的层厚度，f）薄的气密层也产生在该衬底具有单次通过的衬底其泄漏率小于10psar / s（cm 2）。

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