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1. 发明申请

US20100029077A1 Inhibiting background plating 有权
标题翻译：禁止背景电镀
公开(公告)号：US20100029077A1
公开(公告)日：2010-02-04
申请号：US12462325
申请日：2009-07-31
申请人： Robert K. Barr , Hua Dong , Thomas C. Sutter
发明人： Robert K. Barr , Hua Dong , Thomas C. Sutter
IPC分类号： H01L21/3205
CPC分类号： C25D5/022 , C23C28/322 , C23C28/34 , C23C28/345 , C25D5/024 , C25D5/028 , C25D5/34 , H01L31/02167 , H01L31/02168 , H01L31/022425 , Y02E10/50
摘要： Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.
摘要翻译：方法包括将具有高透光率的相变抗蚀剂选择性地沉积在电介质上以形成图案，蚀刻掉未被抗蚀剂覆盖的电介质的部分，并在电介质的蚀刻部分上沉积金属种子层。然后通过光诱导电镀将金属层沉积在金属种子层上。

2. 发明授权

US09206520B2 Inhibiting background plating 有权
标题翻译：禁止背景电镀
公开(公告)号：US09206520B2
公开(公告)日：2015-12-08
申请号：US12462325
申请日：2009-07-31
申请人： Robert K. Barr , Hua Dong , Thomas C. Sutter
发明人： Robert K. Barr , Hua Dong , Thomas C. Sutter
IPC分类号： H01L21/44 , C25D5/02 , C25D5/34 , H01L31/0216 , H01L31/0224 , C23C28/00
CPC分类号： C25D5/022 , C23C28/322 , C23C28/34 , C23C28/345 , C25D5/024 , C25D5/028 , C25D5/34 , H01L31/02167 , H01L31/02168 , H01L31/022425 , Y02E10/50
摘要： Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.
摘要翻译：方法包括将具有高透光率的相变抗蚀剂选择性地沉积在电介质上以形成图案，蚀刻掉未被抗蚀剂覆盖的电介质的部分，并在电介质的蚀刻部分上沉积金属种子层。然后通过光诱导电镀将金属层沉积在金属种子层上。

3. 发明授权

US08470717B2 Method of forming current tracks on semiconductors 有权
标题翻译：在半导体上形成电流轨迹的方法
公开(公告)号：US08470717B2
公开(公告)日：2013-06-25
申请号：US13110879
申请日：2011-05-18
申请人： Robert K. Barr , Hua Dong
发明人： Robert K. Barr , Hua Dong
IPC分类号： H01I21/361
CPC分类号： H01L31/18 , H01L31/022425 , Y02E10/50
摘要： Methods of making current tracks for semiconductors are disclosed. The methods involve selectively depositing a hot melt ink resist containing rosin resins and waxes on a silicon dioxide or silicon nitride layer coating a semiconductor followed by etching uncoated portions of the silicon dioxide or silicon nitride layer with an inorganic acid etch to expose the semiconductor and simultaneously inhibit undercutting of the hot melt ink resist. The etched portions may then be metallized to form a plurality of substantially uniform current tracks.
摘要翻译：公开了制造半导体电流轨道的方法。该方法包括将包含松香树脂和蜡的热熔油墨抗蚀剂选择性地沉积在涂覆半导体的二氧化硅或氮化硅层上，然后用无机酸蚀刻蚀刻二氧化硅或氮化硅层的未涂覆部分以暴露半导体并同时抑制热熔油墨抗蚀剂的底切。然后蚀刻的部分可被金属化以形成多个基本上均匀的电流迹线。

4. 发明申请

US20110287634A1 METHOD OF FORMING CURRENT TRACKS ON SEMICONDUCTORS 有权
标题翻译：在半导体上形成电流轨迹的方法
公开(公告)号：US20110287634A1
公开(公告)日：2011-11-24
申请号：US13110879
申请日：2011-05-18
申请人： Robert K. Barr , Hua Dong
发明人： Robert K. Barr , Hua Dong
IPC分类号： H01L21/306
CPC分类号： H01L31/18 , H01L31/022425 , Y02E10/50
摘要： Methods of making current tracks for semiconductors are disclosed. The methods involve selectively depositing a hot melt ink resist containing rosin resins and waxes on a silicon dioxide or silicon nitride layer coating a semiconductor followed by etching uncoated portions of the silicon dioxide or silicon nitride layer with an inorganic acid etch to expose the semiconductor and simultaneously inhibit undercutting of the hot melt ink resist. The etched portions may then be metallizaed to form a plurality of substantially uniform current tracks.
摘要翻译：公开了制造半导体电流轨道的方法。该方法包括将包含松香树脂和蜡的热熔油墨抗蚀剂选择性地沉积在涂覆半导体的二氧化硅或氮化硅层上，然后用无机酸蚀刻蚀刻二氧化硅或氮化硅层的未涂覆部分以暴露半导体并同时抑制热熔油墨抗蚀剂的底切。然后蚀刻的部分可以被金属化以形成多个基本均匀的电流迹线。

5. 发明授权

US09583669B2 Inkjet printable etch resist 有权
标题翻译：喷墨可印刷蚀刻抗蚀剂
公开(公告)号：US09583669B2
公开(公告)日：2017-02-28
申请号：US13587916
申请日：2012-08-16
申请人： Hua Dong , Robert K. Barr
发明人： Hua Dong , Robert K. Barr
IPC分类号： H01L21/302 , H01L21/461 , C03C15/00 , C03C25/68 , C23F1/00 , H01L31/18 , H01L21/28 , H01L21/027 , H01L21/47 , H01L21/3115 , H01L21/02 , C08L93/04 , C09D11/08 , C09D11/34
CPC分类号： H01L31/1804 , C08L93/04 , C09D11/08 , C09D11/34 , H01L21/02118 , H01L21/0273 , H01L21/2822 , H01L21/31155 , H01L21/47 , Y02E10/547 , Y02P70/521
摘要： The methods involve selectively depositing a resist containing a solid hydrogenated rosin resin and a liquid hydrogenated rosin resin ester as a mixture on a semiconductor followed by etching uncoated portions of the semiconductor and simultaneously inhibiting undercutting of the resist. The etched portions may then be metallized to form current tracks.
摘要翻译：所述方法包括在半导体上选择性地沉积含有固体氢化松香树脂和液体氢化松香树脂酯的抗蚀剂作为混合物，随后蚀刻半导体的未涂覆部分并同时抑制抗蚀剂的底切。然后蚀刻的部分可被金属化以形成电流迹线。

6. 发明授权

US09130110B2 Method of stripping hot melt etch resists from semiconductors 有权
标题翻译：从半导体剥离热熔蚀刻抗蚀剂的方法
公开(公告)号：US09130110B2
公开(公告)日：2015-09-08
申请号：US13239358
申请日：2011-09-21
申请人： Hua Dong , Robert K. Barr
发明人： Hua Dong , Robert K. Barr
IPC分类号： C03C15/00 , C09K13/00 , H01L31/18 , G03F7/42 , H01L31/0224
CPC分类号： H01L31/18 , G03F7/425 , H01L31/022425 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： Hot melt etch resist is selectively applied to an anti-reflective coating or a selective emitter on a semiconductor wafer. The exposed portions of the anti-reflective coating or selective emitter are etched away using an inorganic acid containing etch to expose the semiconductor surface. The hot melt etch resist is then stripped from the semiconductor with an alkaline stripper which does not compromise the electrical integrity of the semiconductor. The exposed semiconductor is then metalized to form current tracks.
摘要翻译：热熔蚀刻抗蚀剂被选择性地施加到半导体晶片上的抗反射涂层或选择性发射极。使用含有无机酸的蚀刻将抗反射涂层或选择性发射体的暴露部分蚀刻掉以露出半导体表面。然后用碱性剥离剂从半导体中剥离热熔蚀刻抗蚀剂，其不影响半导体的电气完整性。然后将暴露的半导体金属化以形成电流迹线。

7. 发明授权

US09115729B2 Floating action type servo-valve 有权
标题翻译：浮动式伺服阀
公开(公告)号：US09115729B2
公开(公告)日：2015-08-25
申请号：US13824207
申请日：2012-05-03
申请人： Hua Dong
发明人： Hua Dong
IPC分类号： F16K11/074 , F16K31/06 , F16K31/124 , F15B13/043 , F16K31/10
CPC分类号： F15B13/043 , F16K31/0682 , F16K31/10 , Y10T137/7761
摘要： The present invention relates to a valve, and a floating action type servo-valve used for fluid control, including a valve body, a torque motor, a pilot stage and a power stage control mechanism. An upper valve block, an intermediate block and a lower valve block are stacked and fastened by a fastener in the valve body. A torsion-bar spring of the torque motor passes through the center of an armature and is fixed to the valve body with a stand. A pilot stage revolving shaft and a power stage revolving stage are provided in a same central line, with a mating between the pilot stage revolving shaft and the upper valve block and a mating between the power stage revolving shaft and the lower valve block. The servo valve includes a shifting enlargement mechanism constitute by a shifting fork and a shifting lever.
摘要翻译：本发明涉及一种阀，以及用于流体控制的浮动式伺服阀，包括阀体，扭矩电机，先导级和功率级控制机构。上阀体，中间块和下阀块通过紧固件堆叠并紧固在阀体中。扭力马达的扭杆弹簧通过衔铁的中心，并用支架固定在阀体上。先导级旋转轴和动力级旋转级设置在相同的中心线上，在先导级旋转轴和上阀块之间配合，并且在动力级旋转轴和下阀块之间配合。伺服阀包括通过换档叉和变速杆构成的变速放大机构。

8. 发明授权

US08802933B2 Bacillus thuringiensis gene with lepidopteran activity 有权
标题翻译：具有鳞翅目昆虫活性的苏云金芽孢杆菌基因
公开(公告)号：US08802933B2
公开(公告)日：2014-08-12
申请号：US13208437
申请日：2011-08-12
申请人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi , Thomas C. Wolfe
发明人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi , Thomas C. Wolfe
IPC分类号： A01H5/00 , C12N15/82 , C12N1/21
CPC分类号： C07K14/32 , A01N63/02 , C07K14/325 , C12N15/8286 , Y02A40/162
摘要： The invention provides nucleic acids, and variants and fragments thereof, obtained from strains of Bacillus thuringiensis encoding polypeptides having pesticidal activity against insect pests, including Lepidoptera. Particular embodiments of the invention provide isolated nucleic acids encoding pesticidal proteins, pesticidal compositions, DNA constructs, and transformed microorganisms and plants comprising a nucleic acid of the embodiments. These compositions find use in methods for controlling pests, especially plant pests.
摘要翻译：本发明提供从编码具有杀虫活性的昆虫的苏云金芽孢杆菌菌株获得的核酸及其变体和片段，其包括鳞翅目昆虫害虫。本发明的具体实施方案提供编码杀虫蛋白，杀虫组合物，DNA构建体和转化的微生物的分离的核酸和包含实施方案的核酸的植物。这些组合物可用于防治害虫，特别是植物害虫的方法。

9. 发明授权

US08470764B2 Bacillus thuringiensis gene with coleopteran activity 有权
公开(公告)号：US08470764B2
公开(公告)日：2013-06-25
申请号：US12817287
申请日：2010-06-17
申请人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi
发明人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi
IPC分类号： C07K14/00
CPC分类号： C07K14/325 , C12N15/8286 , Y02A40/162
摘要： The invention provides nucleic acids, and variants and fragments thereof, obtained from strains of Bacillus thuringiensis encoding polypeptides having pesticidal activity against insect pests, including Coleoptera. Particular embodiments of the invention provide isolated nucleic acids encoding pesticidal proteins, pesticidal compositions, DNA constructs, and transformed microorganisms and plants comprising a nucleic acid of the embodiments. These compositions find use in methods for controlling pests, especially plant pests.

10. 发明授权

US08389683B2 Bacillus thuringiensis gene with coleopteran activity 有权
公开(公告)号：US08389683B2
公开(公告)日：2013-03-05
申请号：US12829527
申请日：2010-07-02
申请人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi
发明人： Andre R. Abad , Hua Dong , Sue B. Lo , Xiaomei Shi
IPC分类号： C07K14/325 , A01N37/18
CPC分类号： C12N15/8286 , C07K14/325 , Y02A40/162
摘要： The invention provides nucleic acids, and variants and fragments thereof, obtained from strains of Bacillus thuringiensis encoding polypeptides having pesticidal activity against insect pests, including Coleoptera. Particular embodiments of the invention provide isolated nucleic acids encoding pesticidal proteins, pesticidal compositions, DNA constructs, and transformed microorganisms and plants comprising a nucleic acid of the embodiments. These compositions find use in methods for controlling pests, especially plant pests.

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