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1. 发明授权

US07594199B2 Method of optical proximity correction design for contact hole mask 有权
标题翻译：接触孔掩模的光学邻近校正设计方法
公开(公告)号：US07594199B2
公开(公告)日：2009-09-22
申请号：US10756829
申请日：2004-01-14
申请人： Robert John Socha , Xuelong Shi , Douglas Van Den Broeke , Jang Fung Chen
发明人： Robert John Socha , Xuelong Shi , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G06F17/50
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70125
摘要： Disclosed concepts include a method of optimizing an illumination profile of a pattern to be formed in a surface of a substrate. Illumination is optimized by defining a transmission cross coefficient (“TCC”) function determined in accordance with an illumination pupil and a projection pupil corresponding to an illuminator, representing at least one resolvable feature of a mask to be printed on the substrate by at least one impulse function, and creating an interference map of a predetermined order based on the at least one impulse function and the TCC function, wherein the interference map represents the at least one resolvable feature to be printed on the substrate and areas of destructive interference.
摘要翻译：公开的概念包括优化待形成在基板的表面中的图案的照明轮廓的方法。通过定义根据照明光瞳确定的透射交叉系数（“TCC”）函数和对应于照明器的投影光瞳来优化照明，其表示待印刷在基板上的掩模的至少一个可分辨特征至少一个脉冲功能，以及基于所述至少一个脉冲功能和所述TCC功能创建预定顺序的干涉图，其中所述干涉图表示要印刷在所述基板上的所述至少一个可分辨特征以及相消干涉区域。

2. 发明授权

US07506299B2 Feature optimization using interference mapping lithography 有权
标题翻译：使用干涉映射光刻的特征优化
公开(公告)号：US07506299B2
公开(公告)日：2009-03-17
申请号：US10975342
申请日：2004-10-29
申请人： Robert John Socha , Xuelong Shi , Douglas Van Den Broeke , Jang Fung Chen
发明人： Robert John Socha , Xuelong Shi , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G06F17/50
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70125
摘要： Disclosed concepts include a method of, and program product for, optimizing an illumination profile of a pattern to be formed in a surface of a substrate relative to a given mask. Steps include mathematically representing resolvable feature(s) from the given mask, generating an interference map representation from the previous step, modifying the interference map representation to maximize intensity corresponding to the resolvable features, and determining assist feature size(s) such that intensity side lobes do not print.
摘要翻译：公开的概念包括用于优化相对于给定掩模在衬底表面中形成的图案的照明轮廓的方法和程序产品。步骤包括在数学上表示来自给定掩码的可解析特征，从前一步骤生成干涉图表示，修改干涉图表示以最大化对应于可解析特征的强度，以及确定辅助特征尺寸，使强度侧裂片不打印。

3. 发明授权

US08356261B1 Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO) 有权
标题翻译：确定用于加速源掩码优化（SMO）的设计规则优化的图像对数斜率的梯度和粗糙度
公开(公告)号：US08356261B1
公开(公告)日：2013-01-15
申请号：US12830258
申请日：2010-07-02
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F1/70
摘要： The Hessian (second derivative) of the image log slope (ILS) can be quickly and accurately calculated without the need to use approximate methods from the gradient of the ILS with respect to mask transmission and source intensity. The Hessian has been traditionally calculated using a finite-difference approach. Calculating the Hessian through a finite-difference approach is slow and is an approximate method. The gradient of the ILS improves the speed of calculation of the Hessian, and thus accelerated SMO operation is realized. The results of ILS evaluation can be used in design for manufacturing (DFM) to suggest changes in the design rules to improve imaging. For a fixed illumination, this information can help remove forbidden pitches and help select design rules for 1-D and 2-D patterns on a mask design layout.
摘要翻译：图像对数斜率（ILS）的Hessian（二阶导数）可以快速准确地计算，而无需使用相对于掩模传输和源强度的ILS梯度的近似方法。传统上使用有限差分法计算黑森州。通过有限差分方法计算Hessian是一个很简单的方法。 ILS的梯度提高了Hessian的计算速度，从而实现了加速的SMO操作。 ILS评估的结果可用于制造设计（DFM），以建议设计规则的改变以改善成像。对于固定照明，该信息可以帮助删除禁止的间距，并帮助在面罩设计布局上选择1-D和2-D图案的设计规则。

4. 发明授权

US08340394B2 Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process 有权
标题翻译：用于进行用于多次曝光处理的几何分解的基于模型的着色处理的方法，程序产品和装置
公开(公告)号：US08340394B2
公开(公告)日：2012-12-25
申请号：US12509389
申请日：2009-07-24
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G06K9/00
CPC分类号： G03F7/70475 , G03F1/70 , G03F7/70283 , G03F7/70466
摘要： A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) dividing a plurality of the features into a plurality of segments; (b) determining the image log slope (ILS) value for each of the plurality of segments; (c) determining the value of the gradient of the image log slope (ILS) value for each of the plurality of segments; and (d) assigning a phase or color to the segments based on the values of the gradient of the image log slope of each of the plurality of segments.
摘要翻译：一种分解具有要在基底上成像的特征的目标图案的方法，以便允许所述特征在多曝光过程中成像。该方法包括以下步骤：（a）将多个特征划分成多个段; （b）确定所述多个段中的每一个的图像对数斜率（ILS）值; （c）确定所述多个段中的每个段的图像对数斜率（ILS）值的梯度值; 以及（d）基于所述多个片段中的每一个的图像对数斜率的梯度的值，将相位或颜色分配给所述片段。

5. 发明授权

US08224061B2 Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process 有权
标题翻译：用于执行用于多次曝光处理的图案分解的基于模型的着色处理的方法，程序产品和装置
公开(公告)号：US08224061B2
公开(公告)日：2012-07-17
申请号：US12614208
申请日：2009-11-06
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G06K9/00
CPC分类号： G03F7/70466 , G03F7/705
摘要： A method of decomposing a target pattern containing features to be imaged onto a substrate into a plurality of exposure patterns for use in a multi-exposure process. The method includes dividing the target pattern into fragments; associating the fragments with an exposure pattern; associating the fragments with image log slope (ILS) evaluation points; and maximizing ILS values. Maximizing the ILS values further includes calculating ILS values at the ILS evaluation points; determining a minimum ILS value; calculating changes in the ILS values as a result of associating fragments with a different exposure pattern; determining a maximum change of the ILS values; and associating fragments associated with the maximum change with a different exposure pattern.
摘要翻译：一种将包含待成像特征的目标图案分解成多曝光图案以用于多曝光过程的方法。该方法包括将目标图案划分成片段; 将片段与曝光图案相关联; 将片段与图像对数斜率（ILS）评估点相关联; 并最大化ILS值。最大化ILS值还包括在ILS评估点计算ILS值; 确定最小ILS值; 计算ILS值的变化，作为将片段与不同曝光模式相关联的结果; 确定ILS值的最大变化; 以及将与最大变化相关联的片段与不同的曝光模式相关联。

6. 发明授权

US07548302B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07548302B2
公开(公告)日：2009-06-16
申请号：US11655999
申请日：2007-01-22
申请人： Arno Jan Bleeker , Donis George Flagello , Robert John Socha , James Sherwood Greeneich , Kars Zeger Troost
发明人： Arno Jan Bleeker , Donis George Flagello , Robert John Socha , James Sherwood Greeneich , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译：将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

7. 发明授权

US07493589B2 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process 有权
标题翻译：用于多重曝光过程中用于基于模型的几何分解的方法，程序产品和装置
公开(公告)号：US07493589B2
公开(公告)日：2009-02-17
申请号：US11496742
申请日：2006-08-01
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F7/70466 , G03F1/36 , G03F1/70 , G03F7/70433 , G03F7/705
摘要： A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned.
摘要翻译：一种分解具有要在基底上成像的特征的目标图案的方法，以便允许所述特征在多曝光过程中成像。该方法包括以下步骤：（a）将多个特征分割为多个多边形; （b）确定所述多个多边形中的每一个的图像对数斜率（ILS）值; （c）确定具有最小ILS值的多边形，并且定义包含多边形的掩模; （d）将步骤（c）中定义的掩模与传输交叉系数的本征函数进行卷积，以产生干涉图，其中传输交叉系数定义要用于对目标图案成像的照明系统; 以及（e）基于在与所述多边形相对应的位置处的所述干涉图的值将相位分配给所述多边形，其中所述相位定义在所述多曝光处理中分配多边形的曝光。

8. 发明授权

US06887625B2 Assist features for use in lithographic projection 有权
标题翻译：辅助光刻投影的功能
公开(公告)号：US06887625B2
公开(公告)日：2005-05-03
申请号：US09905198
申请日：2001-07-16
申请人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
发明人： Johannes Jacobus Matheus Baselmans , Markus Schluter , Donis George Flagello , Robert John Socha
IPC分类号： G03F1/00 , G03F7/20 , G03F9/00 , G03C5/00 , G06F17/50
CPC分类号： G03F7/70433 , G03F1/36
摘要： In a mask pattern for a device such as a DRAM including a nearly regular array of isolated features, assist features are positioned so as to make the array more symmetric. Where the isolated features are positioned at most but not all of the points of a regular unit cell, the assist features may be positioned at the points of the unit cell not occupied by the isolated features. The isolated features may represent contact holes.
摘要翻译：在诸如包括几乎规则的孤立特征阵列的DRAM的设备的掩模图案中，辅助特征被定位成使阵列更对称。在隔离特征被定位在常规单位单元的最多但不是全部点处的情况下，辅助特征可以位于不被隔离特征占据的单位单元的点处。隔离的特征可以表示接触孔。

9. 发明授权

US06871337B2 Illumination optimization for specific mask patterns 有权
标题翻译：特定掩模图案的照明优化
公开(公告)号：US06871337B2
公开(公告)日：2005-03-22
申请号：US10079829
申请日：2002-02-22
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G03F1/00 , G03F1/36 , G03F7/20 , H01L21/027 , G06F17/50
CPC分类号： G03F7/70433 , G03F1/36 , G03F7/70125 , G03F7/70441 , G03F7/705
摘要： A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic. By elimination of parts of the illumination pattern which have no influence on modulation, excess DC light can be reduced, thereby improving depth of focus. Optimization of mask patterns includes addition of sub-resolution features to reduce pitches and discretize the probability density function of the space width.
摘要翻译：一种用于微光刻的方法和装置。该方法和装置包括基于特定掩模图案的特性来优化照明模式。通过基于掩模版的衍射级确定适当的照明模式和投影光学器件的自相关来优化照明。通过消除对调制没有影响的照明图案的部分，可以减少过量的DC光，从而提高焦点的深度。掩模图案的优化包括添加子分辨率特征以减少间距并离散空间宽度的概率密度函数。

10. 发明授权

US08640058B2 Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process 有权
标题翻译：用于多重曝光过程中用于基于模型的几何分解的方法，程序产品和装置
公开(公告)号：US08640058B2
公开(公告)日：2014-01-28
申请号：US13244127
申请日：2011-09-23
申请人： Robert John Socha
发明人： Robert John Socha
IPC分类号： G06F17/50 , G03F1/00
CPC分类号： G03F7/70466 , G03F1/36 , G03F1/70 , G03F7/70433 , G03F7/705
摘要： A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: segmenting a plurality of the features into a plurality of polygons; determining the image log slope (ILS) value for each of the plurality of polygons; determining the polygon having the minimum ILS value, and defining a mask containing the polygon; convolving the defined mask with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and, assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned.
摘要翻译：一种分解具有要在基底上成像的特征的目标图案的方法，以便允许所述特征在多曝光过程中成像。该方法包括以下步骤：将多个特征分割成多个多边形; 确定所述多个多边形中的每一个的图像对数斜率（ILS）值; 确定具有最小ILS值的多边形，并且定义包含多边形的掩模; 将所定义的掩模与传输交叉系数的本征函数进行卷积，以产生干涉图，其中传输交叉系数定义要用于对目标图案成像的照明系统; 并且基于在与所述多边形相对应的位置处的所述干涉图的值将相位分配给所述多边形，其中所述相位定义在所述多曝光处理中指定所述多边形的哪个曝光。

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