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    • 3. 发明授权
    • Structure and system-on-chip integration of a two-transistor and two-capacitor memory cell for trench technology
    • 用于沟槽技术的双晶体管和双电容器存储单元的结构和片上系统集成
    • US06845033B2
    • 2005-01-18
    • US10248954
    • 2003-03-05
    • Toshiaki KirihataJohn W. Golz
    • Toshiaki KirihataJohn W. Golz
    • H01L27/108G11C11/24G11C11/401G11C11/404H01L21/8242
    • G11C11/404H01L27/108H01L27/10829
    • A two-port dynamic random access memory (DRAM) cell consisting of two transistors and two trench capacitors (2T and 2C DRAM cell) connecting two one transistor and one capacitor DRAM cell (1T DRAM cell) is described. The mask data and cross-section of the 2T 2C DRAM and 1T DRAM cells are fully compatible to each other except for the diffusion connection that couples two storage nodes of the two 1T DRAM cells. This allows a one-port memory cell with 1T and 1C DRAM cell and a two-port memory cell with 2T and 2C DRAM cell to be fully integrated, forming a true system-on chip architecture. Alternatively, by halving the capacitor, the random access write cycle time is further reduced, while still maintaining the data retention time. The deep trench process time is also reduced by reducing by one-half the trench depth.
    • 描述了连接两个晶体管和一个电容器DRAM单元(1T DRAM单元)的两个晶体管和两个沟槽电容器(2T和2C DRAM单元)组成的双端口动态随机存取存储器(DRAM)单元。 除了连接两个1T DRAM单元的两个存储节点的扩散连接之外,2T 2C DRAM和1T DRAM单元的掩模数据和横截面彼此完全兼容。 这允许具有1T和1C DRAM单元的单端口存储器单元和具有2T和2C DRAM单元的双端口存储器单元被完全集成,形成真正的片上系统体系结构。 或者,通过将电容器减半,随机存取写周期时间进一步降低,同时仍然保持数据保留时间。 深沟槽加工时间也减少了沟槽深度的一半。
    • 4. 发明授权
    • Bi-directional read write data structure and method for memory
    • 双向读写数据结构和存储方法
    • US06816397B1
    • 2004-11-09
    • US10448776
    • 2003-05-29
    • John W. GolzDavid R. HansonHoki Kim
    • John W. GolzDavid R. HansonHoki Kim
    • G11C502
    • G11C7/1057G11C7/1051G11C7/1078G11C7/1084G11C11/4093
    • As disclosed herein, an integrated circuit memory is provided which includes primary sense amplifiers coupled for access to a multiplicity of storage cells, second sense amplifiers, and pairs of input/output data lines (IODLs), each IODL pair being coupled to a primary sense amplifier, and each IODL pair carrying complementary signals representing a storage bit. The memory further includes pairs of bi-directional primary data lines (BPDLs), each BPDL pair being coupled to a second sense amplifier and each BPDL pair being adapted to carry other complementary signals representing a storage bit. Local buffers are adapted to transfer, in accordance with control input, the complementary signals carried by the IODLs to the BPDLs, and vice versa.
    • 如本文所公开的,提供集成电路存储器,其包括被耦合用于访问多个存储单元,第二读出放大器和输入/输出数据线对(IODL)的初级读出放大器,每个IODL对被耦合到主感测 放大器和每个IODL对承载表示存储位的互补信号。 存储器还包括成对的双向主数据线(BPDL),每个BPDL对被耦合到第二读出放大器,并且每个BPDL对适于承载表示存储位的其他互补信号。 本地缓冲器适于根据控制输入将IODL携带的互补信号传送到BPDL,反之亦然。
    • 8. 发明授权
    • Gain cell structure with deep trench capacitor
    • 具有深沟槽电容器的增益单元结构
    • US06747890B1
    • 2004-06-08
    • US10249347
    • 2003-04-02
    • Toshiaki KirihataSubramanian S. IyerJohn W. Golz
    • Toshiaki KirihataSubramanian S. IyerJohn W. Golz
    • G11C1124
    • H01L27/10844G11C2207/104H01L27/108H01L27/11
    • Gain cells adapted to trench capacitor technology and memory array configured with these gain cells are described. The 3T and 2T gain cells of the present invention include a trench capacitor attached to a storage node such that the storage voltage is maintained for a long retention time. The gate of the gain transistor and the trench capacitor are placed alongside the read and write wordline. This arrangement makes it possible to have the gain transistor directly coupled to the trench capacitor, resulting in a smaller cell size. The memory cell includes a first transistor provided with a gate, a source, and a drain respectively coupled to a read wordline, a first node, and a read bitline; a second transistor having a gate, a source, and a drain respectively coupled to a storage node, to a voltage source, and to the first node; a third transistor having a gate, a source, and a drain respectively coupled to a write wordline, the storage node, and a write bitline; and a capacitor having a first terminal connected to the storage node and a second terminal connected to a voltage source.
    • 描述适用于沟槽电容器技术的增益单元和配置有这些增益单元的存储器阵列。 本发明的3T和2T增益单元包括连接到存储节点的沟槽电容器,使得存储电压保持长的保留时间。 增益晶体管的栅极和沟槽电容器放置在读写字线旁边。 这种布置使得可以使增益晶体管直接耦合到沟槽电容器,导致更小的单元尺寸。 存储单元包括:第一晶体管,其设置有分别耦合到读字线,第一节点和读位线的栅极,源极和漏极; 第二晶体管,其具有分别耦合到存储节点的栅极,源极和漏极,电压源以及所述第一节点; 第三晶体管,具有分别耦合到写入字线,存储节点和写入位线的栅极,源极和漏极; 以及电容器,其具有连接到存储节点的第一端子和连接到电压源的第二端子。