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    • 2. 发明授权
    • Photoinitiators
    • 光引发剂
    • US07642296B2
    • 2010-01-05
    • US11578595
    • 2005-04-11
    • Rinaldo HüslerThomas HorniAndré FuchsTunja JungReinhard H. Sommerlade
    • Rinaldo HüslerThomas HorniAndré FuchsTunja JungReinhard H. Sommerlade
    • C08F2/50C03C25/10C07C49/84
    • C07C45/46B33Y70/00C07C45/58C07C45/63C07C45/64C07C45/71C07C45/74C07C49/792C07C49/82C07C49/83C07C49/84C07C69/96C07C271/12C07C317/24C07D295/108C07D295/112C07D493/08C08F2/50C07C49/76C07C49/80C07C49/813
    • The invention relates to novel photoinitators of formulae (I), (II), (III), (IV), (V) and (VI) wherein R1 and R2 are each independently of the other C1-C8alkyl; C1-C4alkyl substituted by OH, C1-C4alkoxy, —COO(C1-C8alkyl), (C1-C4alkyl)-COO—, —CN, benzyl, phenyl or by —N(R15)(R16); C3-C6alkerlyl, benzyl, —CH2—C6H4—(C1-C4alkyl) or phenyl; or R1 and R2 together are unbranched or branched C2-C9alkylene or C3-C6-oxa- or -azaalkylene; R3, R4, R5 and R6 are each independently of the others hydrogen, C1-C8alkyl, C3-C6alkenyl, benzyl, —CH2—C6H4—(C1-C4alkyl) or phenyl; R3 and R4 together and/or R5 and R6 together are unbranched or branched C2-C9alkylene; A is CI, Br, —O—R9, —N(R11)(R12) or —S—R18, A′ is —O—, —NH— or —NR11—; A″ is CI, Br, —O—R9, —N(R11)(R12) or —S—R18 or hydrogen, X is —O—R10 or —N(R13)(R14), n is an integer from 1 to 10, preferably an integer from 1 to 4, especially 1, 2 or 3; R7 is a linker; R8 is a bivalent C2-C3alkylele radical.
    • 本发明涉及式(I),(II),(III),(IV),(V)和(VI)的新型光引发剂,其中R 1和R 2各自独立地为C 1 -C 8烷基; 被OH,C1-C4烷氧基,-COO(C1-C8烷基),(C1-C4烷基)-COO-,-CN,苄基,苯基或-N(R15)(R16)取代的C1-C4烷基; C3-C6链烯基,苄基,-CH2-C6H4-(C1-C4烷基)或苯基; 或R 1和R 2一起是非支链或支链C 2 -C 9亚烷基或C 3 -C 6 - 氧杂 - 或 - 亚烷基; R 3,R 4,R 5和R 6各自独立地为氢,C 1 -C 8烷基,C 3 -C 6烯基,苄基,-CH 2 -C 6 H 4 - (C 1 -C 4烷基)或苯基; R 3和R 4一起和/或R 5和R 6一起是非支链或支链C 2 -C 9亚烷基; A是Cl,Br,-O-R9,-N(R11)(R12)或-S-R18,A'是-O - , - NH-或-NR11-; A“是Cl,Br,-O-R9,-N(R11)(R12)或-S-R18或氢,X是-O-R10或-N(R13)(R14),n是 1至10,优选1至4的整数,特别是1,2或3; R7是连接体; R8是二价C2-C3烷基基团。
    • 8. 发明授权
    • Surface-active photoinitiators
    • 表面活性光引发剂
    • US07001644B2
    • 2006-02-21
    • US10450228
    • 2001-12-06
    • Gisèle BaudinTunja Jung
    • Gisèle BaudinTunja Jung
    • C08J3/24C08J3/28C08F2/46C08F2/50
    • G03F7/031B33Y70/00C07C45/54C07C45/64C07C45/71C07C49/825C07C49/84C08F2/50Y10T428/12097Y10T428/12104
    • A process for the production of coatings with scratch-resistant durable surfaces that comprise as photoinitiator (B) in a photocurable formulation at least one surface-active photoinitiator, concentrated at the surface of the formulation, of formula (Ia) or (Ib), wherein Ra is a radical of formula (IIa), Rb is a radical of formula (IIb)), or Ra and Rb are naphthyl, anthracyl, phenanthryl or a heterocyclic radical each of which is unsubstituted or substituted; R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 are, for example, each independently of the others hydrogen; A-Y; C1–C12alkyl, halogen or phenyl; R11 and R12 are, for example, C1–C12 alkyl; X is —OR20 or —N(R21)(R22); R20 is, for example, hydrogen or C1–C4alkyl; R21 and R22 are, for example, hydrogen or C1–C12 alkyl; X1 is, for example, —O—; Y is, for example, a single bond or —O—; Y1 is, for example, a single bond; and A is, for example, C6–C30alkyl.
    • 一种用于生产具有抗划伤耐久表面的涂层的方法,其在光固化制剂中包含作为光引发剂(B)的至少一种表面活性光引发剂,其在制剂的表面浓缩,式(Ia)或(Ib), 其中R a a是式(IIa)的基团,R b b是式(IIb)的基团)或R a a和R a b是萘基,蒽基,菲基或杂环基,其各自为未取代或取代的; R 1,R 2,R 3,R 4,R 5, R 6,R 7,R 8,R 9和R 10是 ,例如,各自独立地为氢; A-Y; C 1 -C 12烷基,卤素或苯基; R 11和R 12是例如C 1 -C 12烷基; X是-OR 20或-N(R 21)(R 22); R 20是例如氢或C 1 -C 4烷基; R 21和R 22是例如氢或C 1 -C 12烷基; X 1是例如-O-; Y是例如单键或-O-; Y 1是例如单键; A是例如C 6 -C 30烷基。