专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08748064B2 Charged particle beam drawing method and charged particle beam drawing apparatus 有权
标题翻译：带电粒子束拉拔法和带电粒子束拉制装置
公开(公告)号：US08748064B2
公开(公告)日：2014-06-10
申请号：US13606888
申请日：2012-09-07
申请人： Rieko Nishimura , Satoshi Nakahashi
发明人： Rieko Nishimura , Satoshi Nakahashi
IPC分类号： G03F1/44 , G03F7/20
CPC分类号： G03F1/44 , B82Y10/00 , B82Y40/00 , G03F7/2063 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： A charged particle beam drawing method according to an embodiment is a method including forming a first measurement pattern in a first measurement pattern area; in succession with processing of forming the first measurement pattern, forming a second measurement pattern in a second measurement pattern area located farthest from the first measurement pattern area in the same column as the first measurement pattern area; and in moving a charged particle beam from the second measurement pattern area to a third measurement pattern area located adjacent to the first measurement pattern area in the same column as the first and second measurement patterns to form a third measurement pattern, moving the charged particle beam to the third measurement pattern area while taking tiny shots approximately equivalent to a data resolution at the adjacent measurement pattern areas to be drawn in the same column one after another from the second measurement pattern.
摘要翻译：根据实施例的带电粒子束描绘方法是包括在第一测量图案区域中形成第一测量图案的方法; 连续地形成第一测量图案的处理，在与第一测量图案区域相同的列中距离第一测量图案区域最远的第二测量图案区域中形成第二测量图案; 并且将带电粒子束从第二测量图案区域移动到与第一和第二测量图案在同一列中与第一测量图案区域相邻的第三测量图案区域，以形成第三测量图案，移动带电粒子束到第三测量图案区域，同时从第二测量图案一个接一个地在相邻的列中绘制大致相当于相邻测量图案区域的数据分辨率的微小照片。

2. 发明申请

US20130065184A1 CHARGED PARTICLE BEAM DRAWING METHOD AND CHARGED PARTICLE BEAM DRAWING APPARATUS 有权
标题翻译：充电颗粒光束绘图方法和充电颗粒光束绘图设备
公开(公告)号：US20130065184A1
公开(公告)日：2013-03-14
申请号：US13606888
申请日：2012-09-07
申请人： Rieko Nishimura , Satoshi Nakahashi
发明人： Rieko Nishimura , Satoshi Nakahashi
IPC分类号： G03F7/20 , G21K5/10
CPC分类号： G03F1/44 , B82Y10/00 , B82Y40/00 , G03F7/2063 , H01J37/3026 , H01J37/3174 , Y10S430/143
摘要： A charged particle beam drawing method according to an embodiment is a method including forming a first measurement pattern in a first measurement pattern area; in succession with processing of forming the first measurement pattern, forming a second measurement pattern in a second measurement pattern area located farthest from the first measurement pattern area in the same column as the first measurement pattern area; and in moving a charged particle beam from the second measurement pattern area to a third measurement pattern area located adjacent to the first measurement pattern area in the same column as the first and second measurement patterns to form a third measurement pattern, moving the charged particle beam to the third measurement pattern area while taking tiny shots approximately equivalent to a data resolution at the adjacent measurement pattern areas to be drawn in the same column one after another from the second measurement pattern.
摘要翻译：根据实施例的带电粒子束描绘方法是包括在第一测量图案区域中形成第一测量图案的方法; 连续地形成第一测量图案的处理，在与第一测量图案区域相同的列中距离第一测量图案区域最远的第二测量图案区域中形成第二测量图案; 并且将带电粒子束从第二测量图案区域移动到与第一和第二测量图案在同一列中与第一测量图案区域相邻的第三测量图案区域，以形成第三测量图案，移动带电粒子束到第三测量图案区域，同时从第二测量图案一个接一个地在相邻的列中绘制大致相当于相邻测量图案区域的数据分辨率的微小照片。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式