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    • 5. 发明申请
    • CAPACITIVE TOUCH SCREEN AND STRATEGIC GEOMETRY ISOLATION PATTERNING METHOD FOR MAKING TOUCH SCREENS
    • 用于制作触摸屏的电容触摸屏和策略几何隔离模式
    • US20100117985A1
    • 2010-05-13
    • US12614072
    • 2009-11-06
    • Bahar Wadia
    • Bahar Wadia
    • G06F3/044H05K3/02B23K26/36
    • G06F3/044G06F2203/04103Y10T29/49156
    • A new patterning technique, known as Strategic Geometry Isolation (SGI), is used to pattern conductive film structures using laser ablation. In addition to ITO films, SGI may also be used to pattern any other conductive film amenable to ablation with a laser or other directed energy beam. Instead of ablating large areas of ITO to create an ITO void through which underlying layers in a MIPC can project a capacitive field, the SGI patterning technique involves leaving in place, but electrically isolating, the areas that would have been ablated. The electrical isolation of these areas may be accomplished with a single pass of the ablation path. In use, the electrically isolated areas behave similarly to the ITO voids/ablated areas, allowing the underlying capacitive field to project through them. The coupling provided by the electrically isolated areas for the combined layers enhances the capacitive field of the underlying layers.
    • 被称为战略几何隔离(SGI)的新的图案化技术被用于使用激光烧蚀来对导电膜结构进行图案化。 除了ITO膜之外,还可以使用SGI来利用激光或其它定向能量束来适应烧蚀的任何其它导电膜。 代替消除大面积的ITO以产生ITO空隙,通过该ITO空隙,MIPC中的下层可以投射电容场,SGI图案化技术涉及将已经烧蚀的区域留在原位,但是电隔离。 这些区域的电隔离可以通过消融路径的单次通过来实现。 在使用中,电隔离区域与ITO空隙/烧蚀区域类似,允许底层电容场通过它们突出。 由组合层的电隔离区域提供的耦合增强了下层的电容场。