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1. 发明授权

US6015644A Process for device fabrication using a variable transmission aperture 有权
标题翻译：使用可变传输孔径的器件制造工艺
公开(公告)号：US6015644A
公开(公告)日：2000-01-18
申请号：US190351
申请日：1998-11-12
申请人： Raymond Andrew Cirelli , Masis Mkrtchyan , Lee Edward Trimble , George Patrick Watson , David Lee Windt
发明人： Raymond Andrew Cirelli , Masis Mkrtchyan , Lee Edward Trimble , George Patrick Watson , David Lee Windt
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70191
摘要： A process for device fabrication is disclosed. In the process, optical lithography is used to introduce an image of a desired pattern into an energy sensitive material. In the process, a filter element is provided. The filter element has at least two regions of different transmittance, each region denominated an aperture. The regions are selected by obtaining information about the desired pattern and an optical lithographic tool that will be used to introduce the image of the desired pattern into the energy sensitive resist material. A filter element that provides an image that, when developed, will provide features with dimensions within acceptable process tolerances is then designed. The filter element is designed by modeling the effects of each aperture of the filter element on the intensity profile of an image of the desired pattern. The combined effect of the apertures is then determined. If required, an aspect (transmittance, orientation, dimension) of the one or more of the proposed apertures is adjusted to provide a modeled intensity profile that more closely corresponds to the desired lithographic result. Once the aspects of all apertures is determined, the filter element is fabricated and used in the optical lithographic process by placing the filter element in the optical lithography tool.
摘要翻译：公开了一种用于器件制造的工艺。在该过程中，使用光学光刻技术将期望图案的图像引入到能量敏感材料中。在该过程中，提供过滤元件。滤光元件具有不同透射率的至少两个区域，每个区域指定孔径。通过获得关于期望图案的信息和将用于将期望图案的图像引入能量敏感抗蚀剂材料的光学光刻工具来选择区域。然后设计一种过滤元件，其提供在开发时将提供尺寸在可接受的工艺公差内的特征的图像。过滤器元件通过对滤波器元件的每个孔的影响对期望图案的图像的强度分布进行建模来设计。然后确定孔的组合效果。如果需要，调整所提出的一个或多个孔的一个方面（透射率，取向，尺寸）以提供更接近于所需光刻结果的建模强度分布。一旦确定了所有孔的方面，则通过将滤光元件放置在光刻工具中，在光学平版印刷工艺中制造和使用滤光元件。

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