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1. 发明申请

US20090015579A1 MECHANICAL RELAXATION TRACKING AND RESPONDING IN A MEMS DRIVER 审中-公开
标题翻译： MEMS驱动器中的机械放松跟踪和响应
公开(公告)号：US20090015579A1
公开(公告)日：2009-01-15
申请号：US11777123
申请日：2007-07-12
申请人： Ramez Nachman , Clarence Chui , Manish Kothari
发明人： Ramez Nachman , Clarence Chui , Manish Kothari
IPC分类号： G06F3/038
CPC分类号： G09G3/3466 , G02B26/001 , G09G3/2092 , G09G2320/041 , G09G2320/048
摘要： The invention comprises systems and methods for adjusting a driving voltage based on relaxation information of a movable reflective layer of an interferometric modulator. In one example, a device for driving a MEMS device having a movable reflective layer comprises a sensing unit configured to generate information related to one or more of time, environmental exposure, and frame rate of a movable reflective layer of at least one MEMS device, and a driver circuit configured to apply voltages to drive said at least one MEMS device, said voltages being based at least in part on said information.
摘要翻译：本发明包括基于干涉式调制器的可移动反射层的松弛信息来调节驱动电压的系统和方法。在一个示例中，用于驱动具有可移动反射层的MEMS器件的装置包括感测单元，其被配置为产生与至少一个MEMS器件的可移动反射层的时间，环境曝光和帧速率中的一个或多个相关的信息，以及被配置为施加电压以驱动所述至少一个MEMS器件的驱动器电路，所述电压至少部分地基于所述信息。

2. 发明授权

US08735225B2 Method and system for packaging MEMS devices with glass seal 有权
标题翻译：用于封装具有玻璃密封的MEMS器件的方法和系统
公开(公告)号：US08735225B2
公开(公告)日：2014-05-27
申请号：US12415986
申请日：2009-03-31
申请人： Lauren Palmateer , William J. Cummings , Brian Gally , Clarence Chui , Manish Kothari
发明人： Lauren Palmateer , William J. Cummings , Brian Gally , Clarence Chui , Manish Kothari
IPC分类号： H01L23/31
CPC分类号： B81B7/0038 , B81C2203/019 , G02B26/001
摘要： Methods and systems for packaging MEMS devices such as interferometric modulator arrays are disclosed. One embodiment of a MEMS device package structure includes a seal with a chemically reactant getter. Another embodiment of a MEMS device package comprises a primary seal with a getter, and a secondary seal proximate an outer periphery of the primary seal. Yet another embodiment of a MEMS device package comprises a getter positioned inside the MEMS device package and proximate an inner periphery of the package seal.
摘要翻译：公开了用于封装诸如干涉式调制器阵列之类的MEMS装置的方法和系统。 MEMS器件封装结构的一个实施例包括具有化学反应物吸气剂的密封。 MEMS器件封装的另一实施例包括具有吸气剂的主密封件和靠近主密封件的外周边的次级密封件。 MEMS器件封装的另一个实施例包括位于MEMS器件封装内部并且靠近封装密封件的内周边的吸气剂。

3. 发明授权

US08402647B2 Methods of manufacturing illumination systems 失效
标题翻译：制造照明系统的方法
公开(公告)号：US08402647B2
公开(公告)日：2013-03-26
申请号：US12868656
申请日：2010-08-25
申请人： Clarence Chui , Gaurav Sethi , Jonathan Charles Griffiths , Manish Kothari
发明人： Clarence Chui , Gaurav Sethi , Jonathan Charles Griffiths , Manish Kothari
IPC分类号： H05K3/30
CPC分类号： B23P11/00 , G02B6/0036 , G02B6/0038 , G02B6/0053 , G02B6/0065 , Y10T29/49002 , Y10T29/49131 , Y10T29/49155 , Y10T29/49208 , Y10T29/49826 , Y10T29/49904
摘要： Methods of manufacturing light panels having at least one re-entrant turning feature. In one embodiment, a method of manufacturing a light panel includes providing a base layer, providing a cover layer, and coupling the cover layer to the base layer to form at least one re-entrant turning feature between the base layer and the cover layer. In another embodiment, a method of manufacturing a light panel includes providing a base layer, forming at least one receiving space in the base layer, providing at least one prismatic block, and coupling at least a portion of the prismatic block into the receiving space such that re-entrant turning features are formed between the prismatic block and the base layer.
摘要翻译：制造具有至少一个重新转向特征的轻型面板的方法。在一个实施例中，制造光面板的方法包括提供基底层，提供覆盖层，以及将覆盖层耦合到基底层，以在基底层和覆盖层之间形成至少一个重复的转动特征。在另一个实施例中，一种制造光面板的方法包括提供基底层，在基底层中形成至少一个接收空间，提供至少一个棱柱形块，并将棱柱形块的至少一部分连接到接收空间中，在棱柱块和基层之间形成了转向特征。

4. 发明授权

US08278726B2 Controlling electromechanical behavior of structures within a microelectromechanical systems device 失效
标题翻译：控制微机电系统设备内结构的机电行为
公开(公告)号：US08278726B2
公开(公告)日：2012-10-02
申请号：US12861778
申请日：2010-08-23
申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/84
CPC分类号： B81B3/0086 , B81C2201/0109 , B81C2201/014 , B81C2201/053 , G02B26/001
摘要： In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
摘要翻译：在一个实施例中，本发明提供一种用于制造微机电系统装置的方法。该方法包括制造包括具有特征机电响应的膜的第一层和特征光学响应，其中特征光学响应是期望的，并且特征机电响应是不期望的; 以及通过在所述微机电系统装置的启动期间至少减少其上的电荷积累来修改所述第一层的特征机电响应。

5. 发明授权

US08120125B2 MEMS devices having overlying support structures 有权
标题翻译：具有上覆支撑结构的MEMS器件
公开(公告)号：US08120125B2
公开(公告)日：2012-02-21
申请号：US13012538
申请日：2011-01-24
申请人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
发明人： Teruo Sasagawa , SuryaPrakash Ganti , Mark W. Miles , Clarence Chui , Manish Kothari , Ming-Hau Tung
IPC分类号： H01L29/82
CPC分类号： G02B26/001 , B81B3/007 , B81B2201/047 , B81B2203/0307 , B81B2203/053
摘要： Embodiments of MEMS devices comprise a conductive movable layer spaced apart from a conductive fixed layer by a gap, and supported by rigid support structures, or rivets, overlying depressions in the conductive movable layer, or by posts underlying depressions in the conductive movable layer. In certain embodiments, portions of the rivet structures extend through the movable layer and contact underlying layers. In other embodiments, the material used to form the rigid support structures may also be used to passivate otherwise exposed electrical leads in electrical connection with the MEMS devices, protecting the electrical leads from damage or other interference.
摘要翻译： MEMS器件的实施例包括通过间隙与导电固定层间隔开的导电可移动层，并且由导电可移动层中的上凹部的刚性支撑结构或铆钉支撑，或由导电可移动层中的凹陷下方的柱支撑。在某些实施例中，铆钉结构的部分延伸穿过可移动层并接触下面的层。在其他实施例中，用于形成刚性支撑结构的材料也可以用于钝化与MEMS装置电连接的其它暴露的电引线，保护电引线免受损坏或其他干扰。

6. 发明申请

US20120002266A1 METHOD AND DEVICE FOR PACKAGING A SUBSTRATE 失效
标题翻译：用于包装基板的方法和装置
公开(公告)号：US20120002266A1
公开(公告)日：2012-01-05
申请号：US13231640
申请日：2011-09-13
申请人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
发明人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
IPC分类号： G02B26/00 , H01J9/26
CPC分类号： G02B26/007 , B81B2201/047 , B81C1/00285 , B81C1/00333 , B81C2203/0136 , B81C2203/0145 , G02B26/001 , G02B26/0825 , G02B26/0833
摘要： A package structure and method of packaging for an interferometric modulator. A thin film material is deposited over an interferometric modulator and transparent substrate to encapsulate the interferometric modulator. A gap or cavity between the interferometric modulator and the thin film provides a space in which mechanical parts of the interferometric modulator may move. The gap is created by removal of a sacrificial layer that is deposited over the interferometric modulator.
摘要翻译：用于干涉式调制器的封装结构和封装方法。在干涉式调制器和透明衬底上沉积薄膜材料以封装干涉式调制器。干涉式调制器和薄膜之间的间隙或腔提供干涉式调制器的机械部分可以移动的空间。通过去除沉积在干涉式调制器上的牺牲层产生间隙。

7. 发明授权

US08045835B2 Method and device for packaging a substrate 有权
标题翻译：包装基材的方法和装置
公开(公告)号：US08045835B2
公开(公告)日：2011-10-25
申请号：US12192908
申请日：2008-08-15
申请人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
发明人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
IPC分类号： G02B6/00
CPC分类号： G02B26/007 , B81B2201/047 , B81C1/00285 , B81C1/00333 , B81C2203/0136 , B81C2203/0145 , G02B26/001 , G02B26/0825 , G02B26/0833
摘要： A package structure and method of packaging for an interferometric modulator. A thin film material is deposited over an interferometric modulator and transparent substrate to encapsulate the interferometric modulator. A gap or cavity between the interferometric modulator and the thin film provides a space in which mechanical parts of the interferometric modulator may move. The gap is created by removal of a sacrificial layer that is deposited over the interferometric modulator.
摘要翻译：用于干涉式调制器的封装结构和封装方法。在干涉式调制器和透明衬底上沉积薄膜材料以封装干涉式调制器。干涉式调制器和薄膜之间的间隙或腔提供干涉式调制器的机械部分可以移动的空间。通过去除沉积在干涉式调制器上的牺牲层产生间隙。

8. 发明授权

US07952788B2 Method and device for selective adjustment of hysteresis window 有权
标题翻译：用于选择性调整滞后窗的方法和装置
公开(公告)号：US07952788B2
公开(公告)日：2011-05-31
申请号：US12499004
申请日：2009-07-07
申请人： Clarence Chui , Manish Kothari
发明人： Clarence Chui , Manish Kothari
IPC分类号： G02B26/00 , H01L29/84
CPC分类号： G02B26/001
摘要： The width and location of a hysteresis window of an interferometric modulator may be altered by adjusting various physical characteristics of the interferometric modulator. Thus, depending on the particular application for which the interferometric modulators are manufactured, the width and location of the hysteresis window may be altered. For example, in some applications, reducing the power required to operate an array of interferometric modulators may be an important consideration. In other applications, the speed of the interferometric modulators may be of more importance, where the speed of an interferometric modulator, as used herein, refers to the speed of actuating and relaxing the moveable mirror. In other applications, the cost and ease of manufacturing may be of most importance. Systems and methods are introduced that allow selection of a width and location of a hysteresis window by adjusting various physical characteristics.
摘要翻译：可以通过调整干涉式调制器的各种物理特性来改变干涉式调制器的滞后窗的宽度和位置。因此，根据制造干涉式调制器的特定应用，可以改变滞后窗口的宽度和位置。例如，在某些应用中，降低操作干涉式调制器阵列所需的功率可能是重要的考虑因素。在其他应用中，干涉式调制器的速度可能更为重要，其中如本文所使用的干涉式调制器的速度是指致动和放松可移动反射镜的速度。在其他应用中，制造的成本和易用性可能是最重要的。引入了通过调整各种物理特性来选择滞后窗口的宽度和位置的系统和方法。

9. 发明授权

US07936497B2 MEMS device having deformable membrane characterized by mechanical persistence 有权
标题翻译： MEMS器件具有以机械持久性为特征的可变形膜
公开(公告)号：US07936497B2
公开(公告)日：2011-05-03
申请号：US11192438
申请日：2005-07-28
申请人： Clarence Chui , Manish Kothari
发明人： Clarence Chui , Manish Kothari
IPC分类号： G02B26/00
CPC分类号： G02B26/001 , G09G3/3466
摘要： An interferometric modulator is provided having a faster deformation time constant on actuation than relaxation time constant upon release from actuation. In some embodiments, apertures are formed in a mechanical membrane to decrease pressure, including liquid and/or gas pressures, on the membrane when actuated. In other embodiments, a dampening layer is disposed in close proximity above the membrane to apply greater downward pressure on the membrane and therefore slow the motion of the membrane when released from an actuated state. Other embodiments comprise structures, such as a heating element or vacuum device, to manipulate pressures above and/or below the mechanical membrane to affect the mechanical persistence of the display device.
摘要翻译：提供了一种干涉式调制器，其在致动时具有更快的变形时间常数，而不是从致动释放时的松弛时间常数。在一些实施例中，在机械膜中形成孔，以在致动时减小膜上的压力，包括液体和/或气体压力。在其它实施例中，阻尼层设置在膜附近，以便在膜上施加更大的向下的压力，并且因此在从致动状态释放时减慢膜的运动。其他实施例包括诸如加热元件或真空装置的结构，以操纵机械膜上方和/或下方的压力以影响显示装置的机械持久性。

10. 发明授权

US07928940B2 Drive method for MEMS devices 有权
公开(公告)号：US07928940B2
公开(公告)日：2011-04-19
申请号：US11511908
申请日：2006-08-28
申请人： Clarence Chui , Manish Kothari , Marc Mignard , Mithran C. Mathew , Jeffrey B. Sampsell
发明人： Clarence Chui , Manish Kothari , Marc Mignard , Mithran C. Mathew , Jeffrey B. Sampsell
IPC分类号： G09G3/20 , G09G3/34
CPC分类号： G09G3/3466 , G02B26/001 , G09G3/3618 , G09G2300/0473 , G09G2300/06 , G09G2310/0254 , G09G2310/0267 , G09G2310/0275 , G09G2310/0278 , G09G2310/06 , G09G2320/029 , G09G2330/021 , G09G2330/12
摘要： Embodiments of exemplary MEMS interferometric modulators are arranged at intersections of rows and columns of electrodes. In certain embodiments, the column electrode has a lower electrical resistance than the row electrode. A driving circuit applies a potential difference of a first polarity across electrodes during a first phase and then quickly transition to applying a bias voltage having a polarity opposite to the first polarity during a second phase. In certain embodiments, an absolute value of the difference between the voltages applied to the row electrode is less than an absolute value of the difference between the voltages applied to the column electrode during the first and second phases.

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