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    • 1. 发明授权
    • Method for coating an object with a graft polymer layer
    • 用接枝聚合物层涂覆物体的方法
    • US08318263B2
    • 2012-11-27
    • US12980920
    • 2010-12-29
    • Mark F. CarlsonSteven J. PorterSean M. StuckeRalph A. Chappa
    • Mark F. CarlsonSteven J. PorterSean M. StuckeRalph A. Chappa
    • C08F2/46B05D3/06B05C3/02
    • B05C3/109B05C9/14B05D1/18B05D3/061B05D2258/02
    • Described herein is a method for coating an object with a polymer layer. The method includes contacting the object with a first solution comprising a non-polymeric grafting initiator comprising at least one photoinitiator group capable of generating a free radical active species upon absorption of electromagnetic energy, wherein the photoinitiator group is selected from the group consisting of an initiator that is insoluble in polar solvent; and a negatively charged initiator; irradiating the first solution and the object, resulting in the grafting initiator binding to the object; removing the first solution; contacting the object with a second solution comprising a polymerizable monomer having at least one free-radical polymerizable group; and irradiating the second solution and the object, wherein the non-polymeric grafting initiator acts as a photoinitiator for a free-radical polymerization reaction.
    • 本文描述了用聚合物层涂覆物体的方法。 该方法包括使物体与第一溶液接触,所述第一溶液包含非吸收引发剂,所述非聚合接枝引发剂包含至少一种能够在吸收电磁能时产生自由基活性物质的光引发剂基团,其中所述光引发剂基团选自引发剂 不溶于极性溶剂; 和带负电的引发剂; 照射第一溶液和物体,导致接枝引发剂与物体结合; 去除第一个解决方案; 使物体与包含具有至少一个自由基可聚合基团的可聚合单体的第二溶液接触; 并照射第二溶液和物体,其中非聚合接枝引发剂用作自由基聚合反应的光引发剂。
    • 2. 发明授权
    • Coating process and apparatus
    • 涂装工艺及装置
    • US06406754B2
    • 2002-06-18
    • US09847030
    • 2001-05-01
    • Ralph A. ChappaSteven J. Porter
    • Ralph A. ChappaSteven J. Porter
    • A61L2700
    • B05C3/09B05D1/18B05D1/32B05D7/20
    • A process and apparatus for dip-coating intermediate and/or discrete discontinuous portions of longitudinal devices, including medical devices such as catheters and guidewires. The apparatus provides a chamber in which both the desired portion(s) of the device and the coating solution can be controllably contacted. A controlled coating can be achieved within the chamber by providing and controlling one or more of the following relationships: a) the manner in which a chamber (containing solution) is itself moved with respect to a static device, b) the manner in which the device is moved with respect to a fixed chamber position containing a fixed volume of solution, and/or c) the manner in which both the chamber and device are fixed in position, and the coating is achieved by adding and removing a volume of solution from the chamber. The resultant movement of solution and device is intended to mimic or replicate the relative movements involved in a conventional dip-coating procedure, at least along the length of device to be coated.
    • 用于浸涂纵向装置的中间和/或离散不连续部分的方法和装置,包括诸如导管和导丝的医疗装置。 该设备提供了一个室,其中装置的期望部分和涂覆溶液都可以可控制地接触。 通过提供和控制一个或多个以下关系,可以在室内实现受控涂层:a)室(含有溶液)本身相对于静态装置自身移动的方式,b) 装置相对于包含固定体积溶液的固定室位移动,和/或c)室和装置两者都固定就位的方式,涂层通过将一定体积的溶液从 房间。 所得到的溶液和装置的运动旨在模拟或复制常规浸涂过程中涉及的相对运动,至少沿待涂覆的装置的长度。
    • 7. 发明授权
    • Linear rail coating apparatus and method
    • 直线导轨涂装装置及方法
    • US07517547B2
    • 2009-04-14
    • US11421637
    • 2006-06-01
    • Ralph A. ChappaSteven J. Porter
    • Ralph A. ChappaSteven J. Porter
    • B05D1/02
    • B05D1/002A61L31/10B05B13/0242B05B13/0442B05B16/40
    • The invention provides an apparatus for coating a device comprising a coating chamber and a device rotator having at least one device mount wherein the apparatus allows insertion and retraction of the device on the device mount into and out of the coating chamber. In another aspect, the invention provides a method of applying a substantially uniform coating on a device comprising the steps of providing an apparatus for coating a device, mounting the device onto the device mount, purging the coating chamber to reduce humidity in the coating chamber, maintaining a reduced humidity content in the coating chamber, inserting the device into the coating chamber, disposing a coating material on the device and rotating the device mounts about the device axis.
    • 本发明提供了一种用于涂覆装置的装置,该装置包括涂覆室和具有至少一个装置安装件的装置旋转器,其中装置允许装置在装置安装件上进出涂层室的插入和缩回。 另一方面,本发明提供了一种在装置上施加基本上均匀的涂层的方法,包括以下步骤:提供用于涂覆装置的装置,将装置安装到装置安装件上,清洗涂覆室以减少涂覆室中的湿度, 保持涂布室中的湿度降低,将装置插入涂覆室中,将涂层材料设置在装置上并使装置围绕装置轴线旋转。
    • 9. 发明授权
    • Coating apparatus and method
    • 涂布装置及方法
    • US06562136B1
    • 2003-05-13
    • US09657885
    • 2000-09-08
    • Ralph A. ChappaSteven J. Porter
    • Ralph A. ChappaSteven J. Porter
    • B05C1300
    • B05B13/0442B05B7/0416B05B13/0242B05B13/0405B05B15/70
    • The invention provides a device for holding a substrate during deposition processes that includes a rotation member rotatable about a first, central axis, and a plurality of substrate holders positioned on the rotation member, the substrate holders being rotatable about second axes. In another aspect, the invention provides a method of applying a substantially uniform coating on a substrate including the steps of providing a device of the invention; mounting a substrate onto the substrate mounts; providing at least one substrate coating station in spaced relation to the substrate mounts; rotating the rotation member about a central axis to position one or more of the substrate mounts at the substrate coating station; supplying the coating through the nozzle; moving the nozzle of the coating station in a direction parallel to the substrate at a predetermined rate to apply a uniform coating on the substrate; and rotating the substrate mounts about the second axes during the coating process.
    • 本发明提供了一种用于在沉积过程期间保持基板的装置,其包括可围绕第一中心轴线旋转的旋转构件和位于旋转构件上的多个基板保持器,所述基板保持器可围绕第二轴线旋转。 另一方面,本发明提供了一种在基材上施加基本均匀的涂层的方法,包括提供本发明的装置的步骤; 将衬底安装到衬底安装件上; 提供与衬底安装件间隔开的至少一个衬底涂覆站; 使所述旋转构件围绕中心轴旋转以将所述衬底安装件中的一个或多个位于所述衬底涂覆站处; 通过喷嘴供应涂层; 以预定的速率沿着平行于基板的方向移动涂布站的喷嘴以在基板上施加均匀的涂层; 并且在涂覆过程中围绕第二轴旋转衬底安装件。
    • 10. 发明授权
    • Coating method
    • 涂布方法
    • US06709712B2
    • 2004-03-23
    • US10429019
    • 2003-05-01
    • Ralph A. ChappaSteven J. Porter
    • Ralph A. ChappaSteven J. Porter
    • B05D102
    • B05B13/0442B05B7/0416B05B13/0242B05B13/0405B05B15/70
    • The invention provides a device for holding a substrate during deposition processes that includes a rotation member rotatable about a first, central axis, and a plurality of substrate holders positioned on the rotation member, the substrate holders being rotatable about second axes. In another aspect, the invention provides a method of applying a substantially uniform coating on a substrate including the steps of providing a device of the invention; mounting a substrate onto the substrate mounts; providing at least one substrate coating station in spaced relation to the substrate mounts; rotating the rotation member about a central axis to position one or more of the substrate mounts at the substrate coating station; supplying the coating through the nozzle; moving the nozzle of the coating station in a direction parallel to the substrate at a predetermined rate to apply a uniform coating on the substrate; and rotating the substrate mounts about the second axes during the coating process.
    • 本发明提供了一种用于在沉积过程期间保持基板的装置,其包括可围绕第一中心轴线旋转的旋转构件和位于旋转构件上的多个基板保持器,所述基板保持器可围绕第二轴线旋转。 另一方面,本发明提供了一种在基材上施加基本均匀的涂层的方法,包括提供本发明的装置的步骤; 将衬底安装到衬底安装件上; 提供与衬底安装件间隔开的至少一个衬底涂覆站; 使所述旋转构件围绕中心轴旋转以将所述衬底安装件中的一个或多个位于所述衬底涂覆站处; 通过喷嘴供应涂层; 以预定的速率沿着平行于基板的方向移动涂布站的喷嘴以在基板上施加均匀的涂层; 并且在涂覆过程中围绕第二轴旋转衬底安装件。