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    • 9. 发明申请
    • METHOD OF PATTERNING PILLARS
    • 图案方法
    • US20150251917A1
    • 2015-09-10
    • US14301192
    • 2014-06-10
    • Qualcomm MEMS Technologies, Inc.
    • Brandon John HongJian MaJohn Hyunchul HongBing WenTallis Young Chang
    • C01B33/113G02B5/00
    • C01B33/113B81C1/00031G02B5/00
    • The disclosed technology relates to methods of patterning elongated structures. In one aspect, a method of forming pillars includes providing a substrate and providing a plurality of beads on a surface of the substrate. Regions of the surface without a directly overlying bead are exposed. The method additionally includes selectively etching the exposed regions of the substrate between the beads such that a plurality of pillars is formed under areas masked by the beads. Selectively etching completely removes at least some of the beads. The pillars that are not covered by beads are etched, thereby leaving some pillars taller than others, with the pillar height pending on the amount of time a pillar was left exposed to etchant by a removed bead.
    • 所公开的技术涉及图案化细长结构的方法。 一方面,形成支柱的方法包括提供基底并在基底的表面上提供多个珠粒。 暴露出没有直接覆盖珠的表面区域。 该方法还包括选择性地蚀刻珠之间的衬底的暴露区域,使得多个柱形成在由珠掩蔽的区域之下。 选择性蚀刻完全除去珠粒中的至少一些。 没有被珠子覆盖的柱子被蚀刻,从而留下一些比其他柱子更高的柱子,其中柱子高度等待通过移除的珠子将柱子暴露于蚀刻剂的时间量。