专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130107276A1 DEVICE AND METHOD FOR INTERFEROMETRIC MEASURING OF AN OBJECT 有权
标题翻译：用于对象的干涉测量的装置和方法
公开(公告)号：US20130107276A1
公开(公告)日：2013-05-02
申请号：US13667309
申请日：2012-11-02
申请人： Polytec GmbH
发明人： Matthias Schussler , Christian Rembe , Alexander Drabenstedt , Robert Kowarsch , Wanja Ochs
IPC分类号： G01B9/02 , G01B11/14
CPC分类号： G01B9/02022 , G01B9/02002 , G01B9/02028 , G01B2290/45 , G01B2290/70 , G01H9/00
摘要： A device for the interferometric measuring of an object, including a light source to generate an emitted beam, a beam splitting device for splitting the emitted beam into a measuring beam and at least first and second reference beams, an optic interference device, and first and second detectors, with the interference device and the first detector being embodied cooperating such that the measuring beam, at least partially reflected by the object, and the first reference beam are interfered on at least one detector area of the first detector. The interference device and the second detector are embodied cooperating such that the measuring beam, at least partially scattered by the object, and the second reference beam are interfered on at least one detector area of the second detector. A method is also provided for the interferometric measuring of an object.
摘要翻译：一种用于干涉测量物体的装置，包括用于产生发射光束的光源，用于将发射的光束分成测量光束和至少第一和第二参考光束的光束分离装置，光学干涉装置，以及第一和第二检测器，其中所述干涉装置和第一检测器被配置为使得至少部分地被物体反射的测量光束和第一参考光束在第一检测器的至少一个检测器区域上被干扰。干涉装置和第二检测器被配置为使得至少部分地被物体散射的测量光束和第二参考光束在第二检测器的至少一个检测器区域上被干扰。还提供了用于物体的干涉测量的方法。

2. 发明授权

US10018460B2 Interferometric measuring device with detectors set at different angular ranges 有权
公开(公告)号：US10018460B2
公开(公告)日：2018-07-10
申请号：US13667309
申请日：2012-11-02
申请人： Polytec GmbH
发明人： Matthias Schussler , Christian Rembe , Alexander Drabenstedt , Robert Kowarsch , Wanja Ochs
IPC分类号： G01B9/02 , G01B11/14 , G01H9/00
CPC分类号： G01B9/02022 , G01B9/02002 , G01B9/02028 , G01B2290/45 , G01B2290/70 , G01H9/00
摘要： A device for the interferometric measuring of an object, including a light source to generate an emitted beam, a beam splitting device for splitting the emitted beam into a measuring beam and at least first and second reference beams, an optic interference device, and first and second detectors, with the interference device and the first detector being embodied cooperating such that the measuring beam, at least partially reflected by the object, and the first reference beam are interfered on at least one detector area of the first detector. The interference device and the second detector are embodied cooperating such that the measuring beam, at least partially scattered by the object, and the second reference beam are interfered on at least one detector area of the second detector. A method is also provided for the interferometric measuring of an object.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式