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    • 1. 发明申请
    • METHOD FOR RECYCLING SILANE (SiH4)
    • 回收硅烷(SiH4)的方法
    • US20110011129A1
    • 2011-01-20
    • US12920956
    • 2009-02-18
    • Pierre BriendBruno AlbanHenri ChevrelDenis Jahan
    • Pierre BriendBruno AlbanHenri ChevrelDenis Jahan
    • F25J3/08
    • C23C16/45593C01B33/043C01B33/046C23C16/24C23C16/4412
    • The invention relates to a method for recycling silane that comprises the following consecutive steps: a) injecting a mixture of pure silane/pure hydrogen (SiH4/H2) in a reaction chamber for making silicon-containing thin layers; b) extracting from the mixture the excess of silane not used during step a)/hydrogen (SiH4/H2) via a pump using a supply gas; c) discharging from said pump, at a pressure close to the atmospheric pressure, a mixture containing at least silane (SiH4), hydrogen (H2) and an amount different from zero of said supply gas; d) separating the silane (SiH4) from the hydrogen/supply gas mixture resulting from the mixture from step c), the silane thus obtained containing less than 100 ppm of supply gas, preferably less than 10 ppm of supply gas and more preferably less than 1 ppm of supply gas; characterised in that at least 50%, preferably 70%, and more preferably 80% of the silane (SiH4) from step b) is reused after step d) for a new step a).
    • 本发明涉及一种回收硅烷的方法,包括以下连续步骤:a)在用于制造含硅薄层的反应室中注入纯硅烷/纯氢(SiH4 / H2)的混合物; b)通过使用供给气体的泵,从步骤a)/氢(SiH 4 / H 2)中从混合物中提取未使用的过量的硅烷; c)在接近大气压的压力下从所述泵排出至少包含硅烷(SiH 4),氢(H 2)和与所述供应气体不同于零的量的混合物; d)从由步骤c)的混合物得到的氢/供应气体混合物中分离硅烷(SiH 4),所得到的硅烷含有少于100ppm的供应气体,优选小于10ppm的供应气体,更优选小于 1 ppm供气; 其特征在于,在步骤d)之后,再次使用来自步骤b)的至少50%,优选70%,更优选80%的硅烷(SiH 4)用于新的步骤a)。
    • 2. 发明申请
    • Refrigeration Method and Apparatus with a Pulsating Load
    • 具有脉动负载的制冷方法和装置
    • US20130014518A1
    • 2013-01-17
    • US13636539
    • 2011-02-28
    • Gerald AigouyPierre BriendCindy DeschildreEric FauveJean-Marc BernhardtFranck Delcayre
    • Gerald AigouyPierre BriendCindy DeschildreEric FauveJean-Marc BernhardtFranck Delcayre
    • F25B9/00
    • F25B9/00H01F6/04H02K9/10H02K55/00
    • A method for the pulsating load refrigeration of a component of a Tokamak, said method using a refrigeration device subjecting a working fluid such as helium to a working cycle, the Tokamak comprising at least one operating mode called “periodic and symmetrical,” according to the method, the refrigerating power produced by the refrigeration device being increased to a relatively high level when the Tokamak is in a plasma generating phase (Dp) whereas the refrigerating power produced by the refrigeration device is reduced to a relatively low level when the Tokamak is no longer in a plasma generating phase (Dnp), characterized in that during the “periodic and symmetrical” operating phase of the Tokamak, the refrigerating power of the refrigeration device is regulated according to a forced variation also of the “periodic and symmetrical” type, that is one wherein the respective durations of generation of a high level of refrigeration and of generation of a low level of refrigerating power differ at most by 30%, and in that the variation in refrigerating power brings about gradual increases and reductions in refrigerating power, and in that the increase in refrigerating power produced by the refrigeration device is triggered in advance, in response to a signal (S) generated during a plasma starting step in the Tokamak, that is before the thermal load on the component increases.
    • 一种托卡马克的部件的脉动负载制冷方法,所述方法使用将诸如氦等工作流体进行工作循环的制冷装置,该托卡马克根据该方法包括至少一种称为周期性和对称性的操作模式, 当托卡马克处于等离子体生成阶段(Dp)时,由制冷装置产生的制冷功率增加到相对较高的水平,而当托卡马克不再处于等离子体生成阶段时,由制冷装置产生的制冷功率降低到相对较低的水平 等离子体产生相(Dnp),其特征在于,在托卡马克的周期性和对称运行阶段期间,根据周期性和对称型的强制变化来调节制冷装置的制冷功率,即相应的 产生高水平制冷的持续时间和产生低水平的制冷功率差异 r最多为30%,并且由于制冷功率的变化导致制冷力的逐渐增加和降低,并且由于响应于信号(S(S)),事先触发由制冷装置产生的制冷功率的增加 )在托卡马克的等离子体启动步骤期间产生,即组件上的热负荷增加之前。