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    • 6. 发明授权
    • Ultra low leakage MOSFET transistor
    • 超低漏电MOSFET晶体管
    • US07202538B1
    • 2007-04-10
    • US10647604
    • 2003-08-25
    • Peter J. HopperPhilipp LindorferVladislav VashchenkoRobert Drury
    • Peter J. HopperPhilipp LindorferVladislav VashchenkoRobert Drury
    • H01L29/94
    • H01L29/4238H01L21/28123H01L21/823481H01L21/823878H01L29/0692
    • A MOSFET transistor structure is formed in a substrate of semiconductor material having a first conductivity type. The MOSFET transistor structure includes an active region that is surrounded by a perimeter isolation dielectric material formed in the substrate to define a continuous sidewall interface between the sidewall dielectric material and the active region. Spaced-apart source and drain regions are formed in the active region and are also spaced-apart from the sidewall interface. A conductive gate electrode that is separated from the substrate channel region by intervening gate dielectric material includes a first portion that extends over the substrate channel region and a second portion that extends continuously over the entire sidewall interface between the isolation dielectric material and the active region. Thus, an enclosed ring is maintained around the entire composite perimeter, thereby completely avoiding regions of high trap density and, thus, preventing any current path for gate induced drain leakage (GIDL) to occur.
    • 在具有第一导电类型的半导体材料的衬底中形成MOSFET晶体管结构。 MOSFET晶体管结构包括由形成在衬底中的周边隔离电介质材料围绕以限定侧壁电介质材料和有源区域之间的连续侧壁界面的有源区域。 间隔开的源极和漏极区域形成在有源区中并且也与侧壁界面间隔开。 通过介入栅极电介质材料与衬底沟道区分离的导电栅电极包括在衬底沟道区上延伸的第一部分和在隔离电介质材料与有源区之间的整个侧壁界面上连续延伸的第二部分。 因此,围绕整个复合材料周边保持封闭的环,从而完全避免高陷阱密度的区域,并因此防止发生栅极引起漏极泄漏(GIDL)的任何电流路径。