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    • 1. 发明授权
    • Method for manufacturing a gate-control diode semiconductor memory device
    • 栅极控制二极管半导体存储器件的制造方法
    • US08574958B2
    • 2013-11-05
    • US13535032
    • 2012-06-27
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • H01L21/00
    • H01L29/7391H01L29/8616
    • This invention belongs to semiconductor device manufacturing field and discloses a method for manufacturing a gate-control diode semiconductor storage device. When the floating gate voltage is relatively high, the channel under the floating gate is of n type and a simple gate-control pn junction structure is configured; by controlling effective n-type concentration of the ZnO film through back-gate control, inverting the n-type ZnO into p-type through a floating gate and using NiO as a p-type semiconductor, an n-p-n-p doping structure is formed while the quantity of charges in the floating gate determines the device threshold voltage, thus realizing memory functions. This invention features capacity of manufacturing gate-control diode memory devices able to reduce the chip power consumption through advantages of high driving current and small sub-threshold swing. This invention is applicable to semiconductor devices manufacturing based on flexible substrate and flat panel displays and floating gate memories, etc.
    • 本发明属于半导体器件制造领域,并且公开了一种用于制造栅极控制二极管半导体存储器件的方法。 当浮动栅极电压相对较高时,浮动栅极下的沟道为n型,并配置了简单的栅极控制pn结结构; 通过背栅控制来控制ZnO膜的有效n型浓度,通过浮栅将n型ZnO反转为p型,并使用NiO作为p型半导体,形成npnp掺杂结构, 浮动门中的电荷决定了器件的阈值电压,从而实现了存储器的功能。 本发明具有制造栅极控制二极管存储器件的能力,其能够通过高驱动电流和小的次级阈值摆动的优点来降低芯片功耗。 本发明适用于基于柔性基板和平板显示器和浮动栅极存储器等的半导体器件制造。
    • 2. 发明申请
    • METHOD FOR MANUFACTURING A GATE-CONTROL DIODE SEMICONDUCTOR DEVICE
    • 制造门控二极管半导体器件的方法
    • US20130178012A1
    • 2013-07-11
    • US13534973
    • 2012-06-27
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • H01L21/336
    • H01L29/7391H01L29/267H01L29/66356
    • This invention belongs to semiconductor device manufacturing field and discloses a method for manufacturing a gate-control diode semiconductor device. When the gate voltage is relatively high, the channel under the gate is of n-type and the device is of a simple gate-control pn junction structure; by way of controlling the effective n-type concentration of the ZnO film through back-gate control, inverting the n-type ZnO into p-type through the gate, and using NiO as a p-type semiconductor, an n-p-n-p doping structure is formed. The method features capacity of manufacturing gate-control diode devices able to reduce chip power consumption through the advantages of high driving current and small sub-threshold swing. The present invention using a low temperature process production is especially applicable to the manufacturing of semiconductor devices based on flexible substrates and reading & writing devices that have a flat panel display and phase change memory.
    • 本发明属于半导体器件制造领域,并且公开了一种用于制造栅极控制二极管半导体器件的方法。 当栅极电压相对较高时,栅极下的沟道为n型,器件具有简单的栅极控制pn结结构; 通过背栅控制来控制ZnO膜的有效n型浓度,通过栅极将n型ZnO转换为p型,并且使用NiO作为p型半导体,形成npnp掺杂结构 。 该方法具有制造栅极控制二极管器件的能力,能够通过高驱动电流和小次阈值摆幅的优点降低芯片功耗。 使用低温工艺生产的本发明特别适用于基于柔性基板和具有平板显示器和相变存储器的读写装置的半导体器件的制造。
    • 3. 发明申请
    • METHOD FOR MANUFACTURING A GATE-CONTROL DIODE SEMICONDUCTOR MEMORY DEVICE
    • 制造门控二极管半导体存储器件的方法
    • US20130178014A1
    • 2013-07-11
    • US13535032
    • 2012-06-27
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • Pengfei WangXiaoyong LiuQingqing SunWei Zhang
    • H01L21/441
    • H01L29/7391H01L29/8616
    • This invention belongs to semiconductor device manufacturing field and discloses a method for manufacturing a gate-control diode semiconductor storage device. When the floating gate voltage is relatively high, the channel under the floating gate is of n type and a simple gate-control pn junction structure is configured; by controlling effective n-type concentration of the ZnO film through back-gate control, inverting the n-type ZnO into p-type through a floating gate and using NiO as a p-type semiconductor, an n-p-n-p doping structure is formed while the quantity of charges in the floating gate determines the device threshold voltage, thus realizing memory functions. This invention features capacity of manufacturing gate-control diode memory devices able to reduce the chip power consumption through advantages of high driving current and small sub-threshold swing. This invention is applicable to semiconductor devices manufacturing based on flexible substrate and flat panel displays and floating gate memories, etc.
    • 本发明属于半导体器件制造领域,并且公开了一种用于制造栅极控制二极管半导体存储器件的方法。 当浮动栅极电压相对较高时,浮动栅极下的沟道为n型,并配置了简单的栅极控制pn结结构; 通过背栅控制来控制ZnO膜的有效n型浓度,通过浮栅将n型ZnO反向为p型,并使用NiO作为p型半导体,形成npnp掺杂结构, 浮动门中的电荷决定了器件的阈值电压,从而实现了存储器的功能。 本发明具有制造栅极控制二极管存储器件的能力,其能够通过高驱动电流和小的次级阈值摆动的优点来降低芯片功耗。 本发明适用于基于柔性基板和平板显示器和浮动栅极存储器等的半导体器件制造。
    • 10. 发明申请
    • Automatic or Semi-Automatic Turning Method and Device
    • 自动或半自动车削方法和装置
    • US20080282904A1
    • 2008-11-20
    • US11813718
    • 2005-01-09
    • Xiaoyong Liu
    • Xiaoyong Liu
    • A47J43/04
    • A47J37/108A47J36/165A47J43/0722
    • The present invention provides an automatic or semi-automatic method for turning over and/or stirring the cooking material of a cooking container in an automatic or semi-automatic cooking utensil. The method can comprise the following steps: (1) limiting the cooking material in a cooking container within a desired area in its main direction or all directions by a limiting means, and (2) turning over or stirring the cooking material limited in the desired area of the cooking container through the movement of the cooking container and/or by a turning-over/stirring means. The present invention also provides a turning-over/stirring device with a limiting means and an automatic or semi-automatic cooking utensil with such a turning-over/stirring device.
    • 本发明提供了一种用于在自动或半自动炊具中翻转和/或搅拌烹饪容器的烹饪材料的自动或半自动方法。 该方法可以包括以下步骤:(1)通过限制装置将烹饪容器中的烹饪容器在其主要方向或所有方向上的期望区域内限制,以及(2)翻转或搅拌限定在期望的烹饪材料 通过烹饪容器的移动和/或通过翻转/搅拌装置的烹饪容器的区域。 本发明还提供一种具有限制装置的翻转/搅拌装置和具有这种翻转/搅拌装置的自动或半自动烹饪器具。