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    • 1. 发明授权
    • Electrochemical fabrication method for producing multi-layer three-dimensional structures on a porous dielectric
    • 在多孔电介质上制造多层三维结构的电化学制造方法
    • US07527721B2
    • 2009-05-05
    • US10841378
    • 2004-05-07
    • Pavel B. LembrikovDennis R. SmalleyAdam L. Cohen
    • Pavel B. LembrikovDennis R. SmalleyAdam L. Cohen
    • C25D5/10
    • C25D5/022B33Y10/00C25D5/10C25D5/48
    • Multi-layer structures are electrochemically formed on porous dielectric substrates. In some embodiments, the substrates have at least one surface which is infiltrated with a sacrificial conductive material, all pores (e.g. openings in between dielectric regions of the substrate) or selected pores near the surface of the substrate are opened, and a structural material is deposited to fill at least a portion of the opened pores. If more pores are opened than have been filled or will be filled by the structural material a sacrificial material may be deposited to fill the additional pores. After completing formation of an initial patterned surface on the substrate, a plurality of layers are formed on the substrate (e.g. via electrodeposition operations) and after layer formation is complete, the conductive sacrificial material filling the pores is removed.
    • 多层结构在多孔电介质基片上电化学形成。 在一些实施例中,衬底具有至少一个被牺牲导电材料渗透的表面,所有孔(例如衬底的电介质区域之间的开口)或衬底表面附近的选定孔被打开,结构材料是 沉积以填充至少一部分打开的孔。 如果比已经填充的孔更多的孔被打开,或者将被结构材料填充,则可以沉积牺牲材料以填充附加的孔。 在衬底上形成初始图案化表面之后,在衬底上形成多个层(例如通过电沉积操作),并且在层形成完成之后,去除填充孔的导电牺牲材料。