专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09008787B2 Active electrode state control system 有权
标题翻译：有源电极状态控制系统
公开(公告)号：US09008787B2
公开(公告)日：2015-04-14
申请号：US12771917
申请日：2010-04-30
申请人： Paul M. Carter , Torsten Lehmann , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
发明人： Paul M. Carter , Torsten Lehmann , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
IPC分类号： A61N1/36
CPC分类号： A61N1/36032 , A61N1/36036
摘要： A method and system for charge imbalance compensation in a stimulating medical device is provided. The stimulating medical device includes at least one electrode contact configured for providing stimulation to a recipient. A charge imbalance compensation system in the stimulating medical device measures any residual charge remaining on the electrode contact that may result from an imbalance in the applied stimulation. If the measured residual charge exceeds a threshold, the charge imbalance compensation system causes a compensator current to be applied to reduce the residual charge. This residual charge may be measured by measuring a potential difference between the electrode contact and a reference electrode; or, by measuring a potential difference across a capacitor in-series with the electrode contact.
摘要翻译：提供了一种刺激性医疗装置中的电荷不平衡补偿的方法和系统。刺激性医疗装置包括至少一个被配置用于向接受者提供刺激的电极接触件。刺激性医疗装置中的电荷不平衡补偿系统测量可能由所施加的刺激的不平衡引起的电极接触上残留的剩余电荷。如果测量的剩余电量超过阈值，则电荷不平衡补偿系统会引起补偿电流以减少剩余电荷。可以通过测量电极接触和参考电极之间的电位差来测量该剩余电荷; 或者通过测量与电极接触件串联的电容器的电位差来测量。

2. 发明申请

US20110125217A1 ACTIVE ELECTRODE STATE CONTROL SYSTEM 有权
标题翻译：主动电极状态控制系统
公开(公告)号：US20110125217A1
公开(公告)日：2011-05-26
申请号：US12771917
申请日：2010-04-30
申请人： Paul M. Carter , Torsten Lehmann , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
发明人： Paul M. Carter , Torsten Lehmann , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
IPC分类号： A61N1/18
CPC分类号： A61N1/36032 , A61N1/36036
摘要： A method and system for charge imbalance compensation in a stimulating medical device is provided. The stimulating medical device includes at least one electrode contact configured for providing stimulation to a recipient. A charge imbalance compensation system in the stimulating medical device measures any residual charge remaining on the electrode contact that may result from an imbalance in the applied stimulation. If the measured residual charge exceeds a threshold, the charge imbalance compensation system causes a compensator current to be applied to reduce the residual charge. This residual charge may be measured by measuring a potential difference between the electrode contact and a reference electrode; or, by measuring a potential difference across a capacitor in-series with the electrode contact.
摘要翻译：提供了一种刺激性医疗装置中的电荷不平衡补偿的方法和系统。刺激性医疗装置包括至少一个被配置用于向接受者提供刺激的电极接触件。刺激性医疗装置中的电荷不平衡补偿系统测量可能由所施加的刺激的不平衡引起的电极接触上残留的剩余电荷。如果测量的剩余电量超过阈值，则电荷不平衡补偿系统会引起补偿电流以减少剩余电荷。可以通过测量电极接触和参考电极之间的电位差来测量该剩余电荷; 或者通过测量与电极接触件串联的电容器的电位差来测量。

3. 发明授权

US08588928B2 Active electrode state control system with current compensation to reduce residual DC/LF voltage 有权
标题翻译：有源电极状态控制系统具有电流补偿功能，可减少残余DC / LF电压
公开(公告)号：US08588928B2
公开(公告)日：2013-11-19
申请号：US12682780
申请日：2008-10-10
申请人： Torsten Lehmann , Paul Carter , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
发明人： Torsten Lehmann , Paul Carter , Christopher van den Honert , Ibrahim Ibrahim , Tony M. Nygard
IPC分类号： A61N1/36
CPC分类号： A61N1/08 , A61N1/36036 , A61N1/3706
摘要： A body stimulating device operatively adapted to provide electrical stimuli within a body, the device including stimulating electrodes, stimulus generator, and electrode voltage sensors, said electrode voltage sensors operatively measuring the DC/LF voltage of the electrodes, wherein if the sensors determine that the electrode voltage for an electrode is outside a predetermined range, then a compensating current is applied to that electrode, so as to reduce the voltage.
摘要翻译：身体刺激装置可操作地适于在体内提供电刺激，所述装置包括刺激电极，刺激发生器和电极电压传感器，所述电极电压传感器可操作地测量电极的DC / LF电压，其中如果传感器确定电极的电极电压在预定范围之外，然后向该电极施加补偿电流，以便降低电压。

4. 发明申请

US20110178579A1 ACTIVE ELECTRODE STATE CONTROL SYSTEM 有权
标题翻译：主动电极状态控制系统
公开(公告)号：US20110178579A1
公开(公告)日：2011-07-21
申请号：US12682780
申请日：2008-10-10
申请人： Torsten Lehmann , Paul Carter , Christopher van Den Honert , Ibrahim Ibrahim , Tony Nygard
发明人： Torsten Lehmann , Paul Carter , Christopher van Den Honert , Ibrahim Ibrahim , Tony Nygard
IPC分类号： A61N1/36
CPC分类号： A61N1/08 , A61N1/36036 , A61N1/3706
摘要： A body stimulating device operatively adapted to provide electrical stimuli within a body, the device including stimulating electrodes, stimulus generator, and electrode voltage sensors, said electrode voltage sensors operatively measuring the DC/LF voltage of the electrodes, wherein if the sensors determine that the electrode voltage for an electrode is outside a predetermined range, then a compensating current is applied to that electrode, so as to reduce the voltage.
摘要翻译：身体刺激装置可操作地适于在体内提供电刺激，所述装置包括刺激电极，刺激发生器和电极电压传感器，所述电极电压传感器可操作地测量电极的DC / LF电压，其中如果传感器确定电极的电极电压在预定范围之外，然后向该电极施加补偿电流，以便降低电压。

5. 发明申请

US20090325387A1 METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMASK PLASMA ETCHING 审中-公开
标题翻译：光电子等离子体蚀刻中的室内干燥清洁剂的方法和装置
公开(公告)号：US20090325387A1
公开(公告)日：2009-12-31
申请号：US12147341
申请日：2008-06-26
申请人： Xiaoyi Chen , Zhigang Mao , David Knick , Michael Grimbergen , Darin Bivens , Madhavi Chandrahood , Ibrahim Ibrahim , Ajay Kumar
发明人： Xiaoyi Chen , Zhigang Mao , David Knick , Michael Grimbergen , Darin Bivens , Madhavi Chandrahood , Ibrahim Ibrahim , Ajay Kumar
IPC分类号： H01L21/3065 , B44C1/22
CPC分类号： H01J37/32862 , G03F1/80
摘要： Embodiments of the invention include method for in-situ chamber dry clean after photomask plasma etching. In one embodiment, the method includes placing a photomask upon a support pedestal, introducing a process gas into a process chamber, forming a plasma from the process gas, etching a chromium containing layer disposed on the photomask in the presence of the plasma, removing the photomask from the support pedestal, placing a dummy substrate on the pedestal and performing an in-situ dry cleaning process by flowing a cleaning gas containing O2 through the process chamber while the dummy substrate is disposed on the support pedestal.
摘要翻译：本发明的实施例包括在光掩模等离子体蚀刻之后的原位室干洗的方法。在一个实施例中，该方法包括将光掩模放置在支撑基座上，将处理气体引入处理室，从处理气体形成等离子体，在存在等离子体的情况下蚀刻设置在光掩模上的含铬层，将光学掩模从支撑基座上放置，并将虚设的基板放置在基座上，并且通过使含有O 2的清洁气体通过处理室进行原位干洗处理，同时将虚设基板设置在支撑基座上。

6. 发明申请

US20070257009A1 Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator 有权
标题翻译：使用动态可调的等离子体源功率施加器在等离子体反应器中处理工件的方法
公开(公告)号：US20070257009A1
公开(公告)日：2007-11-08
申请号：US11416801
申请日：2006-05-03
申请人： Madhavi Chandrachood , Richard Lewington , Darin Bivens , Ajay Kumar , Ibrahim Ibrahim , Michael Grimbergen , Renee Koch , Sheeba Panayil
发明人： Madhavi Chandrachood , Richard Lewington , Darin Bivens , Ajay Kumar , Ibrahim Ibrahim , Michael Grimbergen , Renee Koch , Sheeba Panayil
IPC分类号： C23F1/00
CPC分类号： H01J37/321 , H01L21/67069
摘要： A method for processing a workpiece in a plasma reactor chamber having radially inner and outer source power applicators at a ceiling of the chamber facing the workpiece, the inner and outer source power applicators and the workpiece sharing a common axis of symmetry. The method includes applying RF source power to the source power applicator, and introducing a process gas into the reactor chamber so as to carry out a plasma process on the workpiece characterized by a plasma process parameter, the plasma process parameter having a spatial distribution across the surface of the workpiece. The method further includes rotating at least the outer RF source power applicator about a radial tilt axis to a position at which the spatial distribution of the plasma process parameter has at least a nearly minimal non-symmetry relative to the common axis of symmetry, and translating the inner source power applicator relative to the outer source power applicator along the axis of symmetry to a location at which the spatial distribution has at least a nearly minimal non-uniformity across the surface of the workpiece.
摘要翻译：一种用于在等离子体反应器室中处理工件的方法，该等离子体反应器腔室具有径向内部和外部源功率施加器，位于腔室的面向工件的顶板处，内部和外部源功率施加器和工件共享公共对称轴线。该方法包括将RF源功率应用于源功率施加器，以及将工艺气体引入反应室，以便在工件上进行等离子体处理，其特征在于等离子体工艺参数，等离子体工艺参数具有横跨工件表面。该方法还包括至少将外部RF源功率施加器围绕径向倾斜轴线旋转到等离子体处理参数的空间分布相对于公共对称轴线具有至少几乎最小的非对称性的位置，并且平移所述内源电源施加器相对于所述外源功率施加器沿着所述对称轴线到所述空间分布在所述工件的所述表面上具有至少几乎最小不均匀性的位置。

7. 发明申请

US20050008177A1 Audio path diagnostics 有权
标题翻译：音频路径诊断
公开(公告)号：US20050008177A1
公开(公告)日：2005-01-13
申请号：US10887893
申请日：2004-07-12
申请人： Ibrahim Ibrahim
发明人： Ibrahim Ibrahim
IPC分类号： A61N1/36 , H04R25/00 , H04R29/00
CPC分类号： H04R25/30 , A61N1/36036
摘要： In accordance with one aspect of the present invention, a method for detecting a change in the performance of an audio signal processing path is disclosed. The method comprises: selecting a characteristic of a received audio signal indicative of its energy content; determining first and second predetermined values of the selected energy characteristic at respective first and second audio signal frequency bands; calculating a ratio of the first and second predetermined values for a reference time period and a test time period; and comparing the ratio at the reference time period with the ratio of the test time period to determine a performance change in the audio path.
摘要翻译：根据本发明的一个方面，公开了一种用于检测音频信号处理路径的性能变化的方法。该方法包括：选择指示其能量含量的接收到的音频信号的特性; 确定在相应的第一和第二音频信号频带的所选能量特性的第一和第二预定值; 计算参考时间段和测试时间段中的第一和第二预定值的比率; 以及将参考时间段的比率与测试时间周期的比率进行比较，以确定音频路径中的性能变化。

8. 发明授权

US07991355B2 Voltage overshoot protection 有权
标题翻译：电压过冲保护
公开(公告)号：US07991355B2
公开(公告)日：2011-08-02
申请号：US12625356
申请日：2009-11-24
申请人： Ibrahim Ibrahim
发明人： Ibrahim Ibrahim
IPC分类号： H04B5/00
CPC分类号： A61N1/3787 , A61N1/36036
摘要： A transmission circuit for an RF inductive link, particularly for an implanted device such as a cochlear implant. In a preferred form, the transmission circuit 1 includes a transmitter coil 24 and a damping device, including an auxiliary coil 4 and switch 6. The switch is operated to close the coil circuit when data zeros are transmitted. This has the advantage of improving modulation depth without placing stress on the RF driver output switches.
摘要翻译：用于RF感应链路的传输电路，特别是用于诸如人工耳蜗植入物的植入装置。在优选形式中，传输电路1包括发射器线圈24和包括辅助线圈4和开关6的阻尼装置。当传输数据零时，该开关被操作以闭合线圈电路。这具有改善调制深度而不在RF驱动器输出开关上施加应力的优点。

9. 发明授权

US07860572B2 Method for conducting signals in a medical device 有权
标题翻译：在医疗器械中进行信号的方法
公开(公告)号：US07860572B2
公开(公告)日：2010-12-28
申请号：US10887894
申请日：2004-07-12
申请人： Ibrahim Ibrahim
发明人： Ibrahim Ibrahim
IPC分类号： A61N1/372
CPC分类号： A61N1/36036
摘要： In accordance with one aspect of the present invention, a cable for communicably connecting a first component and a second component of a cochlear implant system is disclosed. The cable comprises: a first conductor for conducting at least one analog-domain signal; a second conductor for conducting at least one digital-domain signal; and at least one ground conductor electrically coupled to the first and second conductors.
摘要翻译：根据本发明的一个方面，公开了一种用于可通信地连接耳蜗植入系统的第一部件和第二部件的电缆。电缆包括：用于传导至少一个模拟域信号的第一导体; 用于进行至少一个数字域信号的第二导体; 以及电耦合到第一和第二导体的至少一个接地导体。

10. 发明申请

US20050033383A1 Medical device with magnetically-responsive control switch 失效
标题翻译：具有磁响应控制开关的医疗设备
公开(公告)号：US20050033383A1
公开(公告)日：2005-02-10
申请号：US10910591
申请日：2004-08-04
申请人： Ibrahim Ibrahim , Peter Single
发明人： Ibrahim Ibrahim , Peter Single
IPC分类号： A61N1/05 , A61N1/08 , A61N1/36 , A61N1/372
CPC分类号： A61N1/37217 , A61N1/36036 , A61N1/372
摘要： In one embodiment of the present invention, an acoustic prosthesis is disclosed. The acoustic prosthesis comprises: an external speech processor unit comprising electronic components and a power source contained within a housing, wherein the power source provides power to the electronic components via a power line; and a magnetically-responsive switch disposed along the power line to switchingly connect the power source to the electronic components in response to the presence of a magnetic field.
摘要翻译：在本发明的一个实施例中，公开了一种声学假体。声学假体包括：外部语音处理器单元，其包括电子部件和容纳在壳体内的电源，其中所述电源经由电力线向所述电子部件提供电力; 以及沿着电力线设置的磁响应开关，以响应于磁场的存在而将电源切换地连接到电子部件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式