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1. 发明授权

US6161877A Conduit interlock assembly 有权
标题翻译：导管联锁总成
公开(公告)号：US6161877A
公开(公告)日：2000-12-19
申请号：US318680
申请日：1999-05-25
申请人： Paul Le , Phong Pham , Larry Meehan , Long Nguyen
发明人： Paul Le , Phong Pham , Larry Meehan , Long Nguyen
IPC分类号： F16L35/00
CPC分类号： F16L35/00
摘要： A conduit interlock assembly for being clamped to portions of a pair of conduits which portions are adjacent an end-to-end interconnection between the two conduits and which conduit interlock assembly is for surrounding a conduit fastener or fasteners fastening the conduits together in the end-to-end connection. The conduit interlock assembly includes a normally open switch for being closed upon the conduit interlock assembly being clamped to the conduits to provide an indication that the conduits are in the end-to-end interconnection and which switch is opened upon the conduit interlock assembly being unclamped from the conduits to provide an indication that the conduits possibly are not in the end-to-end interconnection.
摘要翻译：一种用于夹紧在一对管道的部分上的管道互锁组件，该部分与两个管道之间的端对端互连相邻，并且该管道互锁组件用于围绕导管紧固件或紧固件将紧固件固定在一起，端到端连接。导管互锁组件包括常开开关，用于在管道互锁组件被夹紧到导管上时关闭，以提供导管处于端对端互连中的指示，以及哪个开关在导管互锁组件被松开时打开从导管提供导管可能不在端对端互连中的指示。

2. 发明授权

US06387207B1 Integration of remote plasma generator with semiconductor processing chamber 有权
标题翻译：远程等离子体发生器与半导体处理室的集成
公开(公告)号：US06387207B1
公开(公告)日：2002-05-14
申请号：US09561325
申请日：2000-04-28
申请人： Karthik Janakiraman , Kelly Fong , Chen-An Chen , Paul Le , Rong Pan , Shankar Venkataraman
发明人： Karthik Janakiraman , Kelly Fong , Chen-An Chen , Paul Le , Rong Pan , Shankar Venkataraman
IPC分类号： H01L2100
CPC分类号： H01J37/3244 , H01J37/32357 , H01J37/32458
摘要： A compact, self-contained remote plasma generator is mounted on the lid of a semiconductor processing chamber to form an integrated substrate processing system. The remote plasma generator is activated in a clean operation to generate cleaning plasma species to provide better cleaning of the chamber and lower perfluorocarbon emissions than in situ plasma clean processes. A three-way valve is adjustable to control gas flow to the chamber. During the clean operation, the three-way valve directs a cleaning plasma precursor from a first gas line to the remote plasma generator to generate cleaning plasma species which are flowed to the chamber for cleaning deposits therein. During a deposition process, the three-way valve directs a first process gas from the flat gas line to the chamber, bypassing the remote plasma generator. The first process gas is typically mixed with a second process gas supplied from a second gas line in a mixing device prior to entering the chamber for depositing a layer on a substrate disposed therein.
摘要翻译：紧凑的独立式远程等离子体发生器安装在半导体处理室的盖上以形成集成的基板处理系统。远程等离子体发生器在清洁操作中被激活以产生清洁等离子体物质，以提供比原位等离子体清洁过程更好的清洁室和降低全氟化碳排放。三通阀是可调节的，以控制气体流向腔室。在清洁操作期间，三通阀将清洁等离子体前体从第一气体管线引导到远程等离子体发生器，以产生清洗等离子体物质，其流入室以清除其中的沉积物。在沉积过程中，三通阀将来自平坦气体管线的第一工艺气体引导到旁路远程等离子体发生器。在进入室之前，第一工艺气体通常与从混合装置中的第二气体管线供应的第二工艺气体混合，以在其上设置的衬底上沉积一层。

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