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    • 3. 发明申请
    • Space environmentally durable polyimides and copolyimides
    • 空间环保的聚酰亚胺和共聚酰亚胺
    • US20050137383A1
    • 2005-06-23
    • US10988407
    • 2004-11-08
    • John ConnellJoseph SmithPaul HergenrotherKent WatsonCraig Thompson
    • John ConnellJoseph SmithPaul HergenrotherKent WatsonCraig Thompson
    • C08G73/10C08G69/26
    • C08G73/1071C08G73/10C08G73/1014C08G73/1039C08G73/1057C08G73/1067
    • Polyimides displaying low color in thin films, atomic oxygen resistance, vacuum ultraviolet radiation resistance, solubility in organic solvents in the imide form, high glass transition (Tg) temperatures, and high thermal stability are provided. The poly(amide acid)s, copoly(amide acid)s, polyimides and copolyimides are prepared by the reaction of stoichiometric ratios of an aromatic dianhydride with diamines which contain phenylphosphine oxide groups in polar aprotic solvents. Controlled molecular weight oligomeric (amide acid)s and imides can be prepared by offsetting the stoichiometry according to the Carothers equation using excess diamine and endcapping with aromatic anhydrides The polyimide materials can be processed into various material forms such as thin films, fibers, foams, threads, adhesive film, coatings, dry powders, and fiber coated prepreg, and uses include thin film membranes on antennas, second-surface mirrors, thermal optical coatings, and multi-layer thermal insulation (MLI) blanket materials.
    • 提供在薄膜中显示低色的聚酰亚胺,原子氧电阻,真空紫外线辐射抗性,在酰亚胺形式的有机溶剂中的溶解度,高玻璃化转变温度和高热稳定性。 聚(酰胺酸),共聚(酰胺酸),聚酰亚胺和共聚酰亚胺通过芳族二酐与极性非质子溶剂中含有苯基氧化膦基团的二胺的化学计量比的反应来制备。 控制分子量低聚(酰胺酸)和酰亚胺可以通过使用过量的二胺和用芳族酸酐封端根据Carothers方程来抵消化学计量来制备。聚酰亚胺材料可以加工成各种材料形式,例如薄膜,纤维,泡沫, 螺纹,粘合剂膜,涂料,干粉和纤维涂层预浸料,并且包括天线上的薄膜膜,第二表面反射镜,热光学涂层和多层保温(MLI)覆盖材料。
    • 6. 发明申请
    • CHEMICAL MECHANICAL PLANARIZATION CONDITIONER
    • 化学机械平面调节器
    • US20140113532A1
    • 2014-04-24
    • US14004152
    • 2012-03-06
    • Joseph SmithAndrew GalpinChristopher Wargo
    • Joseph SmithAndrew GalpinChristopher Wargo
    • B24B53/017
    • B24B53/017
    • A pad conditioner for a CMP polishing pad is disclosed that includes a substrate that has a matrixical arrangement of protrusions that have a layer of poly crystalline diamond on at least their top surfaces. The protrusions may have varying shapes and elevations and may comprise a first set of protrusions and a second set of protrusions, the first set of protrusions have a first average height and the second set of protrusions have a second average height, the first average height different from the second average height, a top of each protrusion in the first set of protrusions has a non-flat surface and a top of each protrusion in the second set of protrusions has a non-flat surface.
    • 公开了一种用于CMP抛光垫的衬垫调节器,其包括在至少其顶表面上具有多晶金刚石层的突起的矩阵排列的衬底。 突起可以具有不同的形状和高度,并且可以包括第一组突起和第二组突起,第一组突起具有第一平均高度,第二组突起具有第二平均高度,第一平均高度不同 从第二平均高度,第一组突起中的每个突起的顶部具有非平坦表面,并且第二组突起中的每个突起的顶部具有非平坦表面。