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    • 7. 发明申请
    • ROTARY SPUTTERING TARGET AND APPARATUS FOR MANUFACTURE
    • 旋转飞溅目标和制造装置
    • US20110168555A1
    • 2011-07-14
    • US13052484
    • 2011-03-21
    • Al NolettePaul CarterDean PlaistedAlan Plaisted
    • Al NolettePaul CarterDean PlaistedAlan Plaisted
    • C23C14/34
    • C23C14/3407H01J37/34H01J37/342H01J37/3491
    • The process that is the subject of this invention is a method of making a rotary sputtering target having the steps of providing a cylinder of sputtering target material having an adhesion-wetting layer on its inside surface; providing a stainless steel sputtering target backing tube having an outside diameter smaller than the sputtering target material inside diameter, the backing tube having an adhesion-wetting layer on its outside surface; welding an upper and lower stainless steel retaining ring to the backing tube adjacent to the sputtering target material so that the target material is in compression and the backing tube in tension; and introducing molten bonding material into the annulus between the backing tube and the sputtering target material.The apparatus that is the subject of the present invention is a rotary sputtering target apparatus having a cylinder of sputtering target material; a backing tube having a smaller outside diameter than the inside diameter of the sputtering target material; and bonding material disposed between the target material and backing tube, the bonding material bonding them together.
    • 作为本发明的主题的方法是制造旋转溅射靶的方法,其具有以下步骤:在其内表面上设置具有粘附润湿层的溅射靶材料的圆筒; 提供具有小于溅射靶材料内径的外径的不锈钢溅射靶背衬管,所述背衬管在其外表面上具有粘附润湿层; 将上下不锈钢保持环焊接到与溅射靶材料相邻的背衬管上,使得目标材料处于压缩状态并使背衬管张紧; 并将熔融粘合材料引入到背衬管和溅射靶材料之间的环形空间中。 作为本发明的主题的装置是具有溅射靶材料的圆筒的旋转溅射靶装置, 具有比溅射靶材料的内径小的外径的背衬管; 以及设置在目标材料和背衬管之间的接合材料,所述粘合材料将它们结合在一起。