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1. 发明授权

US07239373B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07239373B2
公开(公告)日：2007-07-03
申请号：US11546394
申请日：2006-10-12
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

2. 发明授权

US07126672B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07126672B2
公开(公告)日：2006-10-24
申请号：US11020642
申请日：2004-12-27
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans , Laurentius Catrinus Jorritsma
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70558 , G03F7/70275 , G03F7/70291 , G03F7/70466 , G03F7/70475
摘要： A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

3. 发明授权

US08508715B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US08508715B2
公开(公告)日：2013-08-13
申请号：US12915566
申请日：2010-10-29
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

4. 发明申请

US20110043778A1 Lithographic Apparatus and Device Manufacturing Method Utilizing Data Filtering 有权
标题翻译：利用数据过滤的平版印刷设备和器件制造方法
公开(公告)号：US20110043778A1
公开(公告)日：2011-02-24
申请号：US12915566
申请日：2010-10-29
申请人： Patricius Aloysius Jacobus TINNEMANS , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus TINNEMANS , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/72 , G03B27/52 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

5. 发明授权

US07403265B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US07403265B2
公开(公告)日：2008-07-22
申请号：US11093259
申请日：2005-03-30
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The comprise a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams of radiation. The patterning device modulates the sub-beams of radiation to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters for pattern sharpening, image log slope control, and/or CD biasing can also be used.
摘要翻译：使用装置和方法在基板上形成图案。包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为辐射子束阵列。图案形成装置调制辐射的子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，还可以使用用于图案锐化，图像对数斜率控制和/或CD偏置的滤波器。

6. 发明授权

US09250536B2 Lithographic apparatus and method 有权
公开(公告)号：US09250536B2
公开(公告)日：2016-02-02
申请号：US12076732
申请日：2008-03-21
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Greevenbroek , Patricius Aloysius Jacobus Tinnemans , Paul Van Der Veen , Wilfred Edward Endendijk
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

7. 发明授权

US07864295B2 Lithographic apparatus and device manufacturing method utilizing data filtering 有权
标题翻译：利用数据滤波的平版印刷设备和器件制造方法
公开(公告)号：US07864295B2
公开(公告)日：2011-01-04
申请号：US12166837
申请日：2008-07-02
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
摘要： An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
摘要翻译：使用装置和方法在基板上形成图案。该装置包括投影系统，图案形成装置，低通滤波器和数据操作装置。投影系统将辐射束投射到基板上作为子光束阵列。图案形成装置调制子光束以在衬底上基本上产生所要求的剂量图案。低通滤波器对从所请求的剂量图案导出的图形数据进行操作，以便形成仅包含低于选定阈值频率的空间频率分量的限幅目标剂量模式。数据处理装置基于斑点曝光强度与限幅目标剂量图案的直接代数最小二乘拟合，产生包括由图案形成装置产生的点曝光强度的控制信号。在各种示例中，也可以使用过滤器。

8. 发明授权

US07230677B2 Lithographic apparatus and device manufacturing method utilizing hexagonal image grids 有权
标题翻译：利用六角形图像网格的平版印刷设备和器件制造方法
公开(公告)号：US07230677B2
公开(公告)日：2007-06-12
申请号：US11018929
申请日：2004-12-22
申请人： Johannes Jacobus Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans , Willem Jurrianus Venema
发明人： Johannes Jacobus Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans , Willem Jurrianus Venema
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70291
摘要： An apparatus and system that form a hexagonal exposed spot grid on a substrate. This is accomplished by using a patterning device that directs a patterned beam onto a microlens array, which forms Fourier transformed spots of the pattered beam at the substrate. Through at least one of (a) moving of the substrate that is patterned by the patterning device and/or changing a frequency of a beam of radiation or (b) through a hexagonal configuration of the patterning device and the microlens array, the spots from the microlens array form the hexagonal exposed spot grid on the substrate.
摘要翻译：在基板上形成六边形曝光斑点的装置和系统。这是通过使用将图案化的光束引导到微透镜阵列上的图案形成装置来实现的，微透镜阵列在衬底上形成图示光束的傅里叶变换光斑。通过以下中的至少一个：（a）通过图案形成装置图案化的衬底的移动和/或改变辐射束的频率或（b）通过图案形成装置和微透镜阵列的六边形构造，微透镜阵列形成衬底上的六边形曝光斑点。

9. 发明授权

US08817235B2 Lithographic apparatus and method involving a pockels cell 有权
标题翻译：涉及斑纹细胞的平版印刷设备和方法
公开(公告)号：US08817235B2
公开(公告)日：2014-08-26
申请号：US12436604
申请日：2009-05-06
申请人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
发明人： Patricius Aloysius Jacobus Tinnemans , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/72 , G03B27/54 , G03B27/32
CPC分类号： G03F7/70141 , G03F7/70108 , G03F7/70116 , G03F7/70566
摘要： A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam.
摘要翻译：公开了一种光刻设备，其包括被配置为调节辐射束的照明系统，所述照明系统具有设置成控制辐射束的偏振的Pockels单元，以及布置成控制瞳孔平面分布的单独可控反射元件的阵列的辐射束。

10. 发明授权

US07738077B2 Patterning device utilizing sets of stepped mirrors and method of using same 失效
标题翻译：利用台阶反射镜的图案化装置及其使用方法
公开(公告)号：US07738077B2
公开(公告)日：2010-06-15
申请号：US11495881
申请日：2006-07-31
申请人： Johannes Jacobus Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans
发明人： Johannes Jacobus Matheus Baselmans , Patricius Aloysius Jacobus Tinnemans
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70283
摘要： A system and method are used to independently control multiple parameters of a patterned beam. This can be performed using a patterning device configured to pattern a beam of radiation comprising a controller and an array of stepped mirrors. The array comprises a plurality of sets of four of the stepped mirrors that are controlled with respect to each other. Adjacent ones of the stepped mirrors in each of the sets have perpendicular axes of rotation and perpendicular steps. In one example, the patterning device is used to patterned the beam of radiation, which patterned beam is projected onto an object. For example, the object can be a substrate (e.g., semiconductor substrate or flat panel display substrate) or a display device.
摘要翻译：系统和方法用于独立控制图案化束的多个参数。这可以使用构造成对包括控制器和阶梯式反射镜阵列的辐射束进行图案化的图案形成装置来执行。阵列包括相对于彼此控制的多组四个阶梯式反射镜组。每组中相邻的阶梯式反射镜具有垂直的旋转轴线和垂直方向的轴线。在一个示例中，图案形成装置用于对辐射束进行图案化，该图案束被投影到物体上。例如，该物体可以是基板（例如，半导体基板或平板显示基板）或显示装置。

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