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    • 4. 发明申请
    • Structure of a structure release and a method for manufacturing the same
    • 结构释放的结构及其制造方法
    • US20040240027A1
    • 2004-12-02
    • US10725585
    • 2003-12-03
    • PRIME VIEW INTERNATIONAL CO., LTD.
    • Wen-Jian LinHsiung-Kuang Tsai
    • G02F001/03G02F001/07
    • G02B26/001
    • A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.
    • 提供了结构释放的结构和制造方法。 该结构和制造方法适用于干涉显示单元。 干涉显示单元的结构包括第一电极,第二电极和至少一个支撑件。 第二电极具有至少一个孔并且与第一电极大致平行地布置。 支撑件位于第一电极和第二电极之间,并且形成空腔。 在制造结构的释放蚀刻工艺中,蚀刻剂可以穿过该孔以蚀刻第一和第二电极之间的牺牲层以形成空腔; 因此,该过程所需的时间变短。